A method for preparing a transferable bonded PDMS-based nanostructure
A nanostructure and bonding technology, applied in the direction of nanotechnology, photoplate making process coating equipment, optomechanical equipment, etc., can solve the problems of increasing process complexity and cost, time-consuming, cumbersome steps, etc., and achieve easy cycle and occupation Empty ratio, reduce operation difficulty, and ensure the effect of flatness
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[0017] The PDMS film of the nanoscale grating is prepared by using the novel method for separating the PDMS film and the rigid substrate proposed by the present invention, and the specific implementation method is as follows:
[0018] S1 configures PDMS, Sylagrd 184 silicone elastomer: the two components are mixed at a ratio of 10:1 (w / w).
[0019] S2 Place the ITO glass substrate (3) on the glue-spinning machine, throw off a layer of photoresist (2) as a sacrificial layer, turn it forward at 1000r / min, turn it back at 1500r / min, and dry the photoresist to obtain Dried photoresist.
[0020] S3 drops the configured PDMS on the dried photoresist, and spin-coats again, the forward rotation is 1000r / min, and the back rotation is 2500r / min. The coated PDMS is left to stand for 2-3 hours to make it more smooth, and then placed on a hot plate at 100° C., and cured for 35 minutes to obtain a cured PDMS film (1).
[0021] In S4, the cured PDMS film (1) is fabricated into a nanoscale ...
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