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Preparation method of patterned metal film

A patterned metal and metal thin film technology, which is applied in metal material coating technology, gaseous chemical plating, and manufacturing microstructure devices, etc., can solve problems that are not conducive to the health of experimenters, increase the cost of material preparation, and complicate the preparation process. , to achieve the effects of environmental protection in the preparation process, reduction of chemical waste, and simple preparation process

Active Publication Date: 2019-01-11
SHANDONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0016] (2) The preparation process of the prior art needs to use two wet etching methods, that is, to use alkaline and acidic solutions to etch respectively, which will not only produce more experimental waste liquid, cause environmental pollution, but also improve the preparation of materials. cost
[0017] (3) The wet etching process takes a long time, and the etching time needs to be strictly controlled, so the preparation process is complicated
[0018] (4) Experimenters use chemical reagents for a long time, which is not conducive to the health of experimenters

Method used

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  • Preparation method of patterned metal film

Examples

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Embodiment Construction

[0055] In conjunction with accompanying drawing, a kind of preparation method of patterned metal thin film comprises the following steps:

[0056] (1) Vacuum evaporation metal silver film

[0057] Turn on the cold water circulation system 21 of the vacuum evaporation device, fix the silicon substrate face down on the sample stage 22, place the metal silver target in the evaporation boat 23, and close the vacuum cover 24 to form a closed chamber. Evacuate the airtight chamber until the vacuum degree is less than 5×10 -4 Pa; after the pressure in the vacuum cover 24 reaches the required value, the evaporation boat 23 is heated and evaporated, the evaporation current is 120A, and the thickness of the metal silver film 11 is 10nm; The valve is deflated in the vacuum cover 24, then the vacuum cover is opened, and the sample of the vapor-deposited metallic silver film is taken out.

[0058] The above-mentioned vacuum evaporation device can adopt existing conventional equipment, su...

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Abstract

The invention discloses a preparation method of a patterned metal film. The preparation method comprises the following steps: (1) plating the surface of a silicon substrate with a layer of metal filmby using a vacuum evaporation technology; (2) spin-coating the surface of the metal film with a layer of UV adhesive; (3) curing the UV adhesive by using a lithography technology, and then, removing the uncured UV adhesive by using a developing solution; (4) pouring a prepolymer on the surface of a sample, curing the prepolymer under the condition of negative pressure, and tightly combining the prepolymer with an exposed metal film; and (5) vertically stripping a polymer film from the silicon substrate to transfer a patterned metal silver film from the surface of the silicon substrate to the surface of a PDMS (polydimethylsiloxane) film. By using the preparation method, the controllability of a preparation process can be improved, and the patterning precision can be improved, so that the preparation process is simple and easy; the consumption of a chemical reagent and the generation of chemical wastes are reduced, so that the preparation process is more environment-friendly, and the environment for operation performed by experimental persons is more healthy; and the reagent required by preparation is reduced, so that the cost is reduced.

Description

technical field [0001] The invention relates to the field of strain sensing materials, in particular to a method for preparing a patterned metal thin film. Background technique [0002] Strain sensors are used in many industrial systems, such as touch screens, air pressure monitors for vacuum instruments, and atmospheric pressure monitors for aircraft, all of which require the ability to sense pressure-generating strain and convert it into an electrical signal. Moreover, strain sensors have been extended to wearable electronics and biomedical devices, advancing the development of wearable, biocompatible, and implantable devices. [0003] However, most of these applications use inelastic strain-sensing materials. Even if a high pressure is applied to the surface of this sensing material, the strain of the material is very small and the sensitivity of the sensing system is insufficient. In addition, the use of interlayer stacking adhesive materials makes the strained material...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00C23C14/16C23C14/24C23C14/58
CPCB81C1/0038B81C1/00388B81C1/00539C23C14/16C23C14/24C23C14/5873
Inventor 王清郑旭栾金津王宁
Owner SHANDONG UNIV OF SCI & TECH
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