A preparation method of high-performance sintered Nd-Fe-B permanent magnet material
A permanent magnet material, NdFeB technology, used in magnetic materials, inductor/transformer/magnet manufacturing, magnetic objects, etc., can solve problems such as coating, improve wettability, promote grain boundary diffusion process, reduce temperature Effect
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Embodiment 1
[0023] Example 1 4mm thick N50 magnet surface sputtering Pr 60 Tb 10 Cu 15 A1 l5 (at.%) alloy film followed by heat treatment.
[0024] Select a commercial magnet N50 with a magnet size of Cylinder, the target composition is Pr 60 Tb 10 Cu 15 A1 l5 (at.%). The surface of the magnet is treated, the surface roughness of the pretreated magnet is Ra≤0.1μm, the surface is clean and free of oil; the cavity of the magnetron sputtering equipment is evacuated to 1×10 -3 Pa, into high-purity argon, adjust the working vacuum to 6×10 -2 Pa, the target power is 100W, the bias voltage is 100V, and the working time is 5min, the magnet to be treated is activated; then, turn on the DC power supply, bombard the surface of the target for 15min, remove the oxide layer and pollutants covered by the target surface, and bombard the target During the process, the baffle is used to block the substrate; the rare earth alloy film is deposited on the surface of the magnet by DC magnetron sputt...
Embodiment 2
[0027] Example 2 4mm thick 52M magnet surface sputtering Pr 60 Tb 10 Fe 15 Al l5 (at.%) alloy film followed by heat treatment.
[0028] Select a commercially available magnet 52M with a magnet size of Cylinder, the target composition is Pr 60 Tb 10 Fe 15 Al l5 (at.%). Surface treatment of the magnet, the surface roughness of the pretreated magnet is Ra≤0.1μm, the surface is clean and free of oil; the chamber of the magnetron sputtering equipment is evacuated to 1×10 -3 Pa, into high-purity argon, adjust the working vacuum to 6×10 -2 Pa, the sputtering power is 100W, the bias voltage is 100V, and the working time is 5min, the magnet to be treated is activated; then, the DC power is turned on, and the target surface is bombarded for 15min to remove the oxide layer and pollutants covered by the target surface. In the target process, the baffle is used to cover the substrate; the alloy film of the target composition is deposited on the surface of the magnet by DC magnet...
Embodiment 3
[0031]Example 3 4mm thick 48SH magnet surface sputtering Pr 50 Tb 20 Cu 10 Fe l5 Al 5 (at.%) alloy film followed by heat treatment.
[0032] Select a commercial magnet 48SH with a magnet size of Cylinder, the target composition is Pr 60 Tb 10 Cu 10 Fe l5 Al 5 (at.%). The surface of the magnet is treated, the surface roughness of the pretreated magnet is Ra≤0.1μm, the surface is clean and free of oil; the cavity of the magnetron sputtering equipment is evacuated to 1×10 -3 Pa, into high-purity argon, adjust the working vacuum to 6×10 -2 Pa, the target power is 100W, the bias voltage is 100V, and the working time is 5min, the magnet to be treated is activated; then, turn on the DC power supply, bombard the surface of the target for 15min, remove the oxide layer and pollutants covered by the target surface, and bombard the target In the process, the baffle is used to block the substrate; the rare earth alloy film of the target composition is deposited on the surface ...
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