A preparation method of high-performance sintered Nd-Fe-B permanent magnet material
A permanent magnet material, NdFeB technology, used in magnetic materials, inductor/transformer/magnet manufacturing, magnetic objects, etc., can solve problems such as coating, improve wettability, promote grain boundary diffusion process, reduce temperature Effect
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Example Embodiment
[0023] Example 1 Pr sputtering on the surface of 4mm thick N50 magnet 60 Tb 10 Cu 15 A1 l5 (at.%) The alloy film is heat treated.
[0024] Choose commercial magnet N50, magnet size is Cylinder, target composition is Pr 60 Tb 10 Cu 15 A1 l5 (at.%). Surface treatment of the magnet, the pre-processed magnet surface roughness Ra≤0.1μm, the surface is clean and oil-free; vacuum the magnetron sputtering equipment cavity to 1×10 -3 Pa, pass high-purity argon gas, adjust the working vacuum to 6×10 -2 Pa, target power is 100W, bias voltage is 100V, working time is 5min, the magnet to be treated is activated; then, the DC power is turned on and the target surface is bombarded for 15min to remove the oxide layer and pollutants covered by the target surface, and bomb the target The process uses a baffle to shield the substrate; deposits a rare earth alloy film on the surface of the magnet by DC magnetron sputtering, and adjusts the process parameters to control the rare earth alloy film to a...
Example Embodiment
[0027] Example 2 Pr sputtered on the surface of a 4mm thick 52M magnet 60 Tb 10 Fe 15 Al l5 (at.%) The alloy film is heat treated.
[0028] Choose a commercial magnet 52M, the magnet size is Cylinder, target composition is Pr 60 Tb 10 Fe 15 Al l5 (at.%). Surface treatment of the magnet, the pre-processed magnet surface roughness Ra≤0.1μm, the surface is clean and oil-free; vacuum the magnetron sputtering equipment cavity to 1×10 -3 Pa, pass high-purity argon gas, adjust the working vacuum to 6×10 -2 Pa, the sputtering power is 100W, the bias voltage is 100V, the working time is 5min, and the magnet to be treated is activated; then, the DC power supply is turned on and the target surface is bombarded for 15min to remove the oxide layer and pollutants covered by the target surface. The target process uses a baffle to shield the substrate; the alloy film of the target composition is deposited on the surface of the magnet by the DC magnetron sputtering method, and the alloy film is c...
Example Embodiment
[0031] Example 3 Pr sputtered on the surface of a 4mm thick 48SH magnet 50 Tb 20 Cu 10 Fe l5 Al 5 (at.%) The alloy film is heat treated.
[0032] Choose commercial magnet 48SH, magnet size is Cylinder, target composition is Pr 60 Tb 10 Cu 10 Fe l5 Al 5 (at.%). Surface treatment of the magnet, the pre-processed magnet surface roughness Ra≤0.1μm, the surface is clean and oil-free; vacuum the magnetron sputtering equipment cavity to 1×10 -3 Pa, pass high-purity argon gas, adjust the working vacuum to 6×10 -2 Pa, target power is 100W, bias voltage is 100V, working time is 5min, the magnet to be treated is activated; then, the DC power is turned on and the target surface is bombarded for 15min to remove the oxide layer and pollutants covered by the target surface, and bomb the target The process uses a baffle to shield the substrate; deposits a rare earth alloy film of target composition on the surface of the magnet by DC magnetron sputtering, and adjusts the process parameters to con...
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