Preparation method of tungsten oxide-cuprous oxide heterojunction photoelectrode material as well as product thereof and application thereof
A cuprous oxide, tungsten oxide technology, applied in metal/metal oxide/metal hydroxide catalysts, chemical instruments and methods, physical/chemical process catalysts, etc., can solve the problem of expensive reference electrodes, the influence of tungsten oxide films, problems such as high energy consumption, to achieve the effect of easy mass production, large-scale mass production, and simple and easy-to-control preparation process
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Embodiment 1
[0026] After cutting the commercially available FTO glass, it was ultrasonicated with acetone and isopropanol for 15 minutes, rinsed with alcohol and deionized water, and dried with a nitrogen gun;
[0027] Weigh 0.2g of potassium oxalate and 2g of sodium tungstate, dissolve them in 50mL of deionized water, stir magnetically at room temperature at a speed of 1000r / min for 1 hour, slowly add 10mL of 2M hydrochloric acid and continue stirring for 10 minutes, and clean the mixed solution The final FTO glass pieces were transferred to the reaction kettle together, reacted at 160ºC for 24 hours, and took out after natural cooling; rinsed alternately with deionized water and absolute ethanol, and dried at 50ºC;
[0028] Put the dried sample into the magnetron sputtering chamber, and the background vacuum is 10 -5 After the order of Pa, adjust the working pressure to 3Pa with argon and oxygen at a ratio of 4:1; use a copper target to reactively sputter Cu with a thickness of 10nm at ...
Embodiment 2
[0031] After cutting the commercially available FTO glass, it was ultrasonicated with acetone and isopropanol for 15 minutes, rinsed with alcohol and deionized water, and dried with a nitrogen gun;
[0032] Weigh 0.2g of potassium oxalate and 2.2g of sodium tungstate, dissolve them in 50mL of deionized water, stir magnetically at room temperature at a speed of 800r / min for 1 hour, slowly add 12mL of 2M hydrochloric acid and continue stirring for 10 minutes, and dissolve the mixed solution The cleaned FTO glass slides were transferred to the reaction kettle together, reacted at 140ºC for 18 hours, and taken out after natural cooling; alternately rinsed with deionized water and absolute ethanol, and dried at 40ºC;
[0033] Put the dried sample into the magnetron sputtering chamber, and the background vacuum is 10 -5 After the order of Pa, adjust the working pressure to 4Pa according to the ratio of argon and oxygen to 4.5:1; use a copper target to reactively sputter Cu with a th...
Embodiment 3
[0035] After cutting the commercially available FTO glass, it was ultrasonicated with acetone and isopropanol for 15 minutes, rinsed with alcohol and deionized water, and dried with a nitrogen gun;
[0036] Weigh 0.2g of potassium oxalate and 2.4g of sodium tungstate, dissolve them in 50mL of deionized water, stir magnetically at room temperature at a speed of 1200r / min for 1 hour, slowly add 8mL of 2M citric acid and continue stirring for 10 minutes, and mix The FTO glass slides cleaned by the solution were transferred to the reaction kettle together, reacted at 120ºC for 24 hours, took out after natural cooling; rinsed alternately with deionized water and absolute ethanol, and dried at 60ºC;
[0037] Put the dried sample into the magnetron sputtering chamber, and the background vacuum is 10 -5 After the order of Pa, adjust the working pressure to 3Pa with argon and oxygen at a ratio of 5:1; use a copper target to reactively sputter Cu with a thickness of 15nm at a power of 20W...
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