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A broadband photodetector based on a topological insulator bismuth selenide electrode

A technology of photodetectors and topological insulators, applied in semiconductor devices, electrical solid devices, semiconductor/solid device manufacturing, etc., can solve the problems of complex graphene electrode fabrication and transfer process, hindering charge carrier transport, poor flexibility of ITO electrodes, etc. , to achieve the effects of long charge diffusion length, low defect density and good device performance

Active Publication Date: 2022-04-26
HEFEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The selection of electrode materials plays an important role in photodetectors. Traditional photodetector electrode materials, such as noble metals such as gold, silver, and platinum, are expensive, and there are considerable dangling bonds on their irregular surfaces, which may lead to Severe carrier scattering and impeded transport of charge carriers
At present, some oxide electrodes (such as ITO) or graphene electrodes are more and more applied to optoelectronic devices because of their own advantages, but due to the poor flexibility of ITO electrodes and low transmittance in the infrared region, the production of graphene electrodes The complexity of the transfer process also limits the application of both

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  • A broadband photodetector based on a topological insulator bismuth selenide electrode
  • A broadband photodetector based on a topological insulator bismuth selenide electrode
  • A broadband photodetector based on a topological insulator bismuth selenide electrode

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Embodiment 1

[0031] see figure 1 , the photodetector of the present invention is provided with Bi on the sapphire substrate 1 2 Se 3 Thin film electrode 2, in Bi 2 Se 3 A layer of FA is arranged on the thin film electrode 2 0.85 Cs 0.15 PB 3 Perovskite thin films3.

[0032] Concrete: Bi of the present embodiment 2 Se 3 The thin-film electrode is firstly grown a layer of Bi on the sapphire substrate by the molecular beam epitaxy method. 2 Se 3 thin film, and then etched by UV exposure lithography and oxygen plasma cleaner, the Bi 2 Se 3 Obtained after the thin film is etched into the desired electrode pattern. Bi 2 Se 3 The thickness of the thin film electrode is between 80nm and 90nm.

[0033] Specifically: the FA of this embodiment 0.85 Cs 0.15 PB 3 The perovskite film is made of lead iodide PbI 2 , cesium iodide CsI, formamidine hydroiodic acid FAI dissolved in dimethyl sulfoxide DMSO and N,N-dimethylformamide DMF to form a precursor solution, through a homogenizer in ...

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Abstract

The invention discloses a wide-band photodetector based on a perovskite film of a topological insulator bismuth selenide electrode and a preparation method thereof, which is provided with a Bi 2 Se 3 Thin film electrode, in Bi 2 Se 3 A layer of FA is set on the thin film electrode 0.85 Cs 0.15 PB 3 perovskite thin film. The present invention utilizes the characteristics of the large specific surface area of ​​the perovskite thin film, combined with the special conductive surface state of the topological insulator, and the prepared photodetector is sensitive in the range of ultraviolet-visible-near-infrared light; and the detector preparation process of the present invention The simplicity and good device performance open up new prospects for the application of topological insulator materials in photodetectors.

Description

technical field [0001] The invention belongs to the field of semiconductor photodetectors, in particular to a topological insulator Bi 2 Se 3 Electrodes of perovskite thin films for broadband high-performance photodetectors. Background technique [0002] Photodetectors are widely used in optical communication, imaging, and biosensing because they can convert optical signals into electrical output signals. The selection of electrode materials plays an important role in photodetectors. Traditional photodetector electrode materials, such as noble metals such as gold, silver, and platinum, are expensive, and there are considerable dangling bonds on their irregular surfaces, which may lead to Severe carrier scattering and impede charge carrier transport. At present, some oxide electrodes (such as ITO) or graphene electrodes are more and more applied to optoelectronic devices because of their own advantages, but due to the poor flexibility of ITO electrodes and low transmittanc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L51/42H01L51/44H01L51/46H01L51/48
CPCH10K71/12H10K85/30H10K30/00H10K30/81Y02E10/549
Inventor 梁凤霞梁林赵兴远罗林保张致翔
Owner HEFEI UNIV OF TECH