A broadband photodetector based on a topological insulator bismuth selenide electrode
A technology of photodetectors and topological insulators, applied in semiconductor devices, electrical solid devices, semiconductor/solid device manufacturing, etc., can solve the problems of complex graphene electrode fabrication and transfer process, hindering charge carrier transport, poor flexibility of ITO electrodes, etc. , to achieve the effects of long charge diffusion length, low defect density and good device performance
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[0031] see figure 1 , the photodetector of the present invention is provided with Bi on the sapphire substrate 1 2 Se 3 Thin film electrode 2, in Bi 2 Se 3 A layer of FA is arranged on the thin film electrode 2 0.85 Cs 0.15 PB 3 Perovskite thin films3.
[0032] Concrete: Bi of the present embodiment 2 Se 3 The thin-film electrode is firstly grown a layer of Bi on the sapphire substrate by the molecular beam epitaxy method. 2 Se 3 thin film, and then etched by UV exposure lithography and oxygen plasma cleaner, the Bi 2 Se 3 Obtained after the thin film is etched into the desired electrode pattern. Bi 2 Se 3 The thickness of the thin film electrode is between 80nm and 90nm.
[0033] Specifically: the FA of this embodiment 0.85 Cs 0.15 PB 3 The perovskite film is made of lead iodide PbI 2 , cesium iodide CsI, formamidine hydroiodic acid FAI dissolved in dimethyl sulfoxide DMSO and N,N-dimethylformamide DMF to form a precursor solution, through a homogenizer in ...
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