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Manufacturing method and device used for preparing rare earth metal target material through lanthanum thermal reduction

A rare earth metal and manufacturing method technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of complex separation of target and mold, inconsistent target density, and only the screen can only be discarded. The effect of reducing metal oxidation links, containing less impurities, and reducing pollution opportunities

Inactive Publication Date: 2019-01-22
包头市镧系新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The current production process uses rare earth metals as raw materials for secondary reduction distillation, and the process is long. In this process, the raw materials are very easy to oxidize, and the oxidation of raw materials has a fatal impact on the target. The vacuum hot pressing method is used to press to meet the available density requirements, but the density of the target material extruded by this method is inconsistent, and the separation of the target material and the mold is also relatively complicated. Each separation needs to use a milling machine to destroy the mold for separation, so that not only the mold It can only be used once, and it is very easy to cause target contamination. The material of the mold is easy to stick to the target. When using it, especially in the production of OLED screens, as long as one pixel is polluted by debris on the target, The entire screen can only be discarded, and the manufacturing cost is high, waste is generated, it is difficult to recycle, and the efficiency is low

Method used

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  • Manufacturing method and device used for preparing rare earth metal target material through lanthanum thermal reduction
  • Manufacturing method and device used for preparing rare earth metal target material through lanthanum thermal reduction
  • Manufacturing method and device used for preparing rare earth metal target material through lanthanum thermal reduction

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Experimental program
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Effect test

Embodiment 1

[0025] 1. High-purity rare earth metal oxide ytterbium Yb 2 0 3 / TRE0≥99.999% and high-purity metal lanthanum La 2 0 3 / TRE0≥99.999% debris After mixing evenly in a ratio of 1:1.25 by weight;

[0026] 2. Put it into a stainless steel mold, use 6000×10 5 The pressure of Pa is compressed into a block;

[0027] 3. Put the bulk raw material into the tantalum crucible of the vacuum reduction furnace, and vacuum the vacuum to a degree of 10 -3 Pa, heating at 1200°C for reduction distillation, using crucible 4 to collect metal on the top to obtain rare earth high-purity metal ytterbium embryo body;

[0028] 4. Surface processing the formed rare earth metal blank to obtain a rare earth metal target;

[0029] The detection results of rare earth metal targets prepared by this method are as follows: table unit: ppm

[0030]

[0031]

Embodiment 2

[0033] The preparation method of the rare earth metal Sm target material, the specific steps are as follows:

[0034] 1. High-purity rare earth metal samarium oxide Sm 2 0 3 / TRE0≥99.999% and high-purity metal lanthanum La 2 0 3 After / TRE0≥99.999% debris is mixed evenly at a weight ratio of 1:1.35;

[0035] 2. Put it into a stainless steel mold, use 8000×10 5 The pressure of Pa is pressed into blocks;

[0036] 3. Put the bulk raw material into the molybdenum crucible of the vacuum reduction furnace, and vacuum the vacuum to a degree of 10 -3 Pa, heating at 1280°C for reduction distillation, using a special target mold to collect metals on the top to obtain rare earth high-purity metal samarium embryos;

[0037] 4. Surface processing the formed rare earth metal blank to obtain a rare earth metal target;

[0038] The detection results of rare earth metal targets prepared by this method are as follows: table unit: ppm

[0039]

[0040]

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Abstract

The invention discloses a manufacturing method used for preparing a rare earth metal target material through lanthanum thermal reduction. The manufacturing method comprises following steps: a high purity rare earth oxide and high purity metal lanthanum chip prepared through calcium reduction method are mixed at a certain ratio, an obtained mixture is introduced into a stainless steel die for pressing so as to obtain blocks; the blocks are introduced into a vacuum reducing furnace crucible, vacuum-pumping heating distillation is carried out, top preset of a special target die is adopted for collecting so as to obtain a rare earth high purity metal blank; and the blank is subjected to surface processing so as to obtain the rare earth metal target material. The preparation process of the rareearth metal target material is short; the purity is high; and the cost is low.

Description

technical field [0001] The invention relates to a manufacturing method and device for preparing a rare earth high-purity metal target by adopting a lanthanum thermal reduction method. Background technique [0002] In recent years, with the rapid development of new technologies and new materials, especially the rapid development of new devices and new materials in the microelectronics industry, high-tech materials have shifted from bulk materials to thin films. Various functional films are formed on the substrate by sputtering deposition of metal targets. Due to the high density of the sputtering source film and good adhesion to the substrate, it can be applied to decoration, tooling, glass, and electronic devices. , semiconductor, magnetic recording, flat panel display, solar cell and many other fields. It is predicted that in the next five years, the global target market demand will grow at a rate of 20% per year, and the market size will exceed 16 billion US dollars. [...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C22B5/04
CPCC23C14/3414C22B5/04
Inventor 贾胜利张振宇郝志庆杜德操
Owner 包头市镧系新材料科技有限公司
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