Method for preparing non-masked P-type full back electrode contact crystalline silicon solar cell
A technology of full back electrode contact and crystalline silicon solar cells, which is applied in the field of solar cells, can solve the problems of cumbersome and complicated process and high cost, and achieve simplified preparation process, suitable for large-scale industrial application, and good conductivity Effect
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[0025] The present invention is described in further detail now in conjunction with accompanying drawing. These drawings are all simplified schematic diagrams, which only illustrate the basic structure of the present invention in a schematic manner, so they only show the configurations related to the present invention.
[0026] figure 1 It is a schematic structural diagram of a P-type full-back electrode-contact crystalline silicon solar cell without a mask in the present invention.
[0027] A method for preparing a maskless p-type full back electrode contact crystalline silicon solar cell, comprising the following steps:
[0028] (1) Texturing: Use P-type monocrystalline silicon wafers as the silicon substrate, and first perform texturing treatment. The solution used is usually KOH solution, and the KOH solution is generally based on KOH: Additive: H 2 The ratio of O=20:3:160 is prepared, and the temperature is 80°C. Then wash in 2-5% HF solution to clean the surface of th...
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