Unlock instant, AI-driven research and patent intelligence for your innovation.

A kind of production technology of preservative-free facial mask

A preservative-free, production technology technology, applied in skin care preparations, medical preparations containing active ingredients, disinfection, etc.

Active Publication Date: 2020-07-07
广州华大生物科技有限公司
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Therefore, still lack on the market a kind of production process is simple and easy, does not need to add the facial mask of preservative

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of production technology of preservative-free facial mask
  • A kind of production technology of preservative-free facial mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Embodiment 1, the preparation of chitosan oligosaccharide essence fiber

[0032] The preparation method of described chitosan oligosaccharide essence fiber is as follows:

[0033] A: Add chitosan oligosaccharide into water, add acetic acid dropwise to adjust the pH to 4, stir and dissolve, configure an aqueous solution of chitosan oligosaccharide with a mass concentration of 8%, and add epoxy chlorine with a mass ratio of 0.3:1 to chitosan oligosaccharide Propane, heated to 70°C, stirred for 2.5 hours to obtain material A;

[0034] B adjusts the pH of the material A to be 8, adds it to the viscose fiber with a mass ratio of 2.5:1 to oligochitosaccharide, stirs and reacts for 2 hours, removes epichlorohydrin by suction filtration under reduced pressure, and obtains material B;

[0035] C spread material B flat with a thickness of 2±0.5cm 60 Co-γ-ray irradiation, the dose of irradiation is 3.0kGy-5.0kGy, adding to distilled water with a mass ratio of 50:1 to material B,...

Embodiment 2

[0036] Embodiment 2, the production technology of antiseptic facial mask

[0037] The production process steps of described preservative-free facial mask are as follows:

[0038] S1: Preparation of modified non-woven facial mask: weave the chitosan oligosaccharide essence fiber obtained in Example 1 into a net shape with a thickness of 0.2mm, dry it, and cut it into a circular mask with a length of 17cm and a width of 16cm to obtain the final product ;

[0039] S2: Preparation of mask essence: add 5 parts of hydroxyethyl chitosan, 5 parts of β-glucan, and 2.5 parts of cell growth factor into 30 parts of 40°C water, stir and dissolve evenly, and then add sodium hyaluronate 0.5 parts, stir evenly to get;

[0040] S3: After soaking the modified non-woven fabric mask prepared in step S1 in the 20mL mask essence prepared in step S2, put it into a mask bag, spread it flat, pack it into a box, and place it in an oxygen-free environment at 35°C 60 Co-γ-ray irradiation, the irradiat...

Embodiment 3

[0041] Embodiment 3, the production technology of preservative-free facial mask

[0042] The production process steps of described preservative-free facial mask are as follows:

[0043] S1: Preparation of modified non-woven facial mask: weave the oligochitosan essence fiber obtained in Example 1 into a net shape with a thickness of 0.5 mm, dry it, cut it into a circular mask with a length of 23 cm and a width of 20 cm, to obtain ;

[0044]S2: Preparation of facial mask essence: Add 4 parts of hydroxyethyl chitosan, 6 parts of β-glucan, and 3 parts of cell growth factor into 30 parts of 50°C water, stir and dissolve evenly, and then add sodium hyaluronic acid 0.8 parts, stir evenly to get;

[0045] S3: Soak the modified non-woven fabric mask prepared in step S1 in the 20mL mask essence prepared in step S2, put it into a mask bag, spread it flat, pack it into a box, and place it in an oxygen-free environment at 40°C 60 Co-γ-ray irradiation, the irradiation dose is 5.0kGy-8.0k...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of daily cosmetics, in particular to a production process of a preservative-free facial mask. Utilize in the production technology of the antiseptic facial mask provided by the invention 60 Co-γ-ray irradiation can effectively kill microorganisms, ensure that the active ingredients of the mask essence in the mask are not destroyed, store it at room temperature in the dark for 2-3 years, the mask will not deteriorate or fail, and overcome the traditional stick-on mask using high-pressure steam Sterilization has the shortcomings of incomplete sterilization, repeated operations and easy destruction of active ingredients, which can realize mass production and sterilization, is simple and easy, and saves resources. In addition, in the preparation of the preservative-free facial mask of the present invention, the chitosan oligosaccharide mucus fiber passes through 60 Co-γ rays, irradiated with a radiation dose of 3kGy-8kGy, can also increase the adherence, hygroscopicity and softness of the mask, and promote water absorption.

Description

technical field [0001] The invention relates to the technical field of daily cosmetics, in particular to a production process of a preservative-free facial mask. Background technique [0002] With the improvement of people's quality of life, especially those who love beauty, they pursue a facial mask every day to maintain the luster, smoothness and whitening of the skin. Therefore, the demand for daily skin care products such as facial masks is increasing. Docile and moisturizing effects, the water content in mask products is very high, making it susceptible to bacterial and fungal contamination, because the main functional ingredients in the mask are polysaccharides, amino acids and polypeptides, etc. If the growth of microorganisms cannot be prevented, it will Affect the activity of active ingredients and deteriorate. [0003] In order to protect the product from microbial contamination and deterioration, and prolong the shelf life of the product, preservatives are often ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A61K8/73A61K8/64A61K8/02A61Q19/00A61Q17/00A61L2/08
CPCA61K8/0212A61K8/64A61K8/73A61K8/735A61K8/736A61K2800/30A61L2/081A61Q17/005A61Q19/00
Inventor 邹伟权万利秀辜英杰
Owner 广州华大生物科技有限公司