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A magnetic circuit structure of a sputtering ion pump and the sputtering ion pump

An ion pump and magnetic circuit technology, applied in the direction of ion diffusion discharge tube, particle separation tube, etc., can solve the problems of difficult to achieve ideal magnetic field conditions, lack of magnetic circuit optimization, and insufficient use of magnetic field, and achieve dense and uniform distribution of magnetic lines of force. , The effect of reducing the processing difficulty and the requirement of magnet size

Active Publication Date: 2020-05-19
NORTHEASTERN UNIV LIAONING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This magnetic field enables the ion pump to obtain a high pumping speed even at a high vacuum degree, reducing size, weight and processing costs; but the system does not have a magnetic yoke for magnetic conduction, the magnetic field is not fully utilized, and it is difficult to To achieve the desired ideal magnetic field conditions
[0009] Through the understanding of the above magnetic circuits of sputtering ion pumps, although the structure, processing technology, and installation methods have their own significant advantages, the optimization of the magnetic circuits is still lacking.

Method used

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  • A magnetic circuit structure of a sputtering ion pump and the sputtering ion pump
  • A magnetic circuit structure of a sputtering ion pump and the sputtering ion pump
  • A magnetic circuit structure of a sputtering ion pump and the sputtering ion pump

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Embodiment 1

[0080] An improved sputtering ion pump magnetic circuit structure is used to provide the necessary magnetic field environment for the pumping components, such as figure 1 As shown, it includes an air extraction assembly 6, a pair of stepped yokes (stepped yoke A 1 and stepped yoke B 2), a pair of magnets (magnet A3 and magnet B 4) and a lower yoke 5. Among them, a pair of stepped yokes and a pair of magnets distributed below them, and a yoke is placed under the magnets, and the magnets and the yokes are connected by screws. The bottom of the stepped yoke is wide and the top is narrow, and the vertical surfaces of a pair of stepped yokes are oppositely arranged, and an air extraction assembly is arranged between them. The upper right-angled trapezoidal table-shaped magnetic yoke conducts the magnetic force lines to the surface facing the entire air extraction assembly, then passes through the air extraction assembly evenly to the right yoke, and then recovers all the magnetic f...

Embodiment 2

[0084] This embodiment is based on Embodiment 1, and further designs the magnetic circuit structure of the sputtering ion pump, wherein the structure of the anode cylinder is as follows figure 2 As shown, the diameter of the large-diameter anode cylinder 7 is 24mm, the diameter of the small-diameter anode cylinder 8 is 16mm, and the length is 25mm. The two anode cylinders are formed into an anode cylinder group by spot welding, and the large-diameter anode copper is set Above and below, the small-diameter anode cylinder is set in the middle, and the structure is as image 3 shown. The insulating block is divided into insulating block A 9 and insulating block B 10, and its structure is as follows Figure 4 As shown, the wall thickness is 2mm, and the inner wall of the insulating block A and the insulating block A are provided with four brackets with a rounded corner diameter of 24mm, which are distributed at the four corners of the insulating block to support the anode cylind...

Embodiment 3

[0087] A magnet and a yoke are placed outside the air extraction assembly to provide it with a magnetic field. The difference in the placement of the magnet and the yoke will cause changes in the magnetic circuit around the air extraction assembly, thereby changing the magnetic field distribution in the air extraction assembly. In this embodiment, software simulation is used to determine the field distribution type. Four arrangement types of magnets and yokes will be selected to simulate the magnetic field. The specific structure is as follows: Figure 10shown. The number 6 in the figure is the air extraction assembly, the number 18 is the magnet material, and the number 19 is the yoke material. Figure (a) shows the ordinary magnetic field distribution. Only two magnets are placed on both sides of the air extraction component. The magnetic field has no constraints. This type mainly serves as a comparison with other types of magnetic field distribution. Figure (b) shows the m...

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Abstract

The invention relates to a sputtering ion pump magnetic circuit structure and a sputtering ion pump, which include an air extraction component, a pair of ladder-type magnetic yokes, a magnet and a lower magnetic yoke. The two ends of the lower magnetic yoke are respectively provided with The magnet has a ladder-type magnetic yoke fixed on the upper surface of the magnet, the ladder-type magnetic yoke is wider at the bottom and narrower at the top, the vertical surfaces of the pair of ladder-type magnetic yokes are arranged oppositely, and the air extraction assembly is fixed on Between the two ladder-type magnetic yokes, as the distance from the magnet increases, the thickness of the ladder-type magnetic yoke gradually decreases, shrinking the magnetic lines of force therein, so that a uniform magnetic field with constant magnetic induction intensity is formed in the space of the air extraction assembly. . In this magnetic circuit structure, the magnetic yoke bundles a large number of magnetic lines. The magnetic induction intensity at the axis of the anode cylinder in the air extraction assembly with the magnetic yoke is generally higher than that of the air extraction assembly without the magnetic yoke. The magnetic field utilization rate is high, the improvement effect is obvious, and the structure is simple. , effectively reducing the volume and weight of the pump and reducing processing costs.

Description

technical field [0001] The invention relates to a magnetic circuit structure of a sputtering ion pump and the sputtering ion pump, belonging to the technical field of vacuum pumps. Background technique [0002] Sputtering ion pump is an ultra-high vacuum pump, mainly composed of four parts: anode, cathode, magnetic field and power supply. In the case of low pressure, a DC high voltage is applied between the cathode plate and the anode cylinder, and electrons are released from the cold cathode and move closer to the anode, resulting in field emission. Before the electrons enter the anode, they undergo spiral motion under the dual action of electric field and magnetic field, and oscillate between the cathode plates. During the oscillating process, they collide with gas molecules, ionize the gas, and generate positive ions and secondary electrons. And produce an avalanche phenomenon. The generated positive ions bombard the cathode titanium plate with negative potential, and s...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J41/18
Inventor 刘坤臧浩天杜广煜刘晓杰宁久鑫王晓东巴德纯
Owner NORTHEASTERN UNIV LIAONING
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