A magnetic circuit structure of a sputtering ion pump and the sputtering ion pump
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- NORTHEASTERN UNIV LIAONING
- Publication Date
- 2020-05-19
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Abstract
Description
technical field
[0001] The invention relates to a magnetic circuit structure of a sputtering ion pump and the sputtering ion pump, belonging to the technical field of vacuum pumps. Background technique
[0002] Sputtering ion pump is an ultra-high vacuum pump, mainly composed of four parts: anode, cathode, magnetic field and power supply. In the case of low pressure, a DC high voltage is applied between the cathode plate and the anode cylinder, and electrons are released from the cold cathode and move closer to the anode, resulting in field emission. Before the electrons enter the anode, they undergo spiral motion under the dual action of electric field and magnetic field, and oscillate between the cathode plates. During the oscillating process, they collide with gas molecules, ionize the gas, and generate positive ions and secondary electrons. And produce an avalanche phenomenon. The generated positive ions bombard the cathode titanium plate with negative potential, and s...