Water-based cerium oxide polishing solution for polishing glass, and preparation method thereof

A cerium oxide, water-based technology, applied in the field of polishing liquid, can solve the problems of short storage time of slurry, limited popularization and application, suspension and dispersion effect cannot be well guaranteed, etc.

Inactive Publication Date: 2019-06-25
LENS TECH CHANGSHA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The finished product made in the form of slurry has the advantages of high selectivity in polishing and high product precision, but at the same time, the contact area between nano-cerium oxide particles in the prepared slurry is greatly increased, and the suspension and dispersion effec

Method used

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  • Water-based cerium oxide polishing solution for polishing glass, and preparation method thereof
  • Water-based cerium oxide polishing solution for polishing glass, and preparation method thereof
  • Water-based cerium oxide polishing solution for polishing glass, and preparation method thereof

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preparation example Construction

[0037] The present invention provides a method for preparing a water-based polishing liquid for glass polishing described in the above technical solution, comprising the following steps:

[0038] uniformly mixing water, complex surfactant and lubricant to obtain the first mixture;

[0039] mixing the first mixture with cerium oxide powder, stirring, and standing still to obtain a second mixture;

[0040] uniformly mixing the second mixture with a dispersant, complexing agent, preservative and grinding aid to obtain a third mixture;

[0041] The third mixture is mixed with the pH regulator to obtain a water-based polishing liquid for glass polishing.

[0042] In the present invention, the type, amount and source of the water, complex surfactant, lubricant, cerium oxide mill powder, dispersant, complexing agent, preservative, grinding aid and pH regulator are the same as those described above The type, consumption and source of water, composite surfactant, lubricant, cerium ox...

Embodiment 1

[0049] Formula (percentage by weight):

[0050]

[0051]

[0052] Preparation Process:

[0053] a. Add deionized water into a container with a certain capacity, add compound surfactant and lubricant respectively, and keep stirring at 300-700rpm until uniformly dispersed;

[0054] b. Then slowly add cerium oxide mill powder, stop stirring after stirring for 1 hour, and let the solution stand for 5 hours;

[0055] c. Turn on the stirring, add dispersant, complexing agent, preservative and grinding aid respectively, and stir until evenly dispersed;

[0056] d. Add a pH adjuster to adjust the pH to 8-11, stir until evenly dispersed, and obtain a water-based polishing liquid for glass polishing.

[0057] At present, a kind of polishing powder is commonly used in the process, its model: XJH-1008, manufacturer: Shenzhen Xinjiahang Abrasives Co., Ltd.

[0058] The present invention analyzes and compares the suspension dispersibility of the water-based polishing liquid for gla...

Embodiment 2

[0084] formula

[0085]

[0086]

[0087] Preparation Process:

[0088] a. Add deionized water into a container with a certain capacity, add compound surfactant and lubricant respectively, and keep stirring at 300-700rpm until uniformly dispersed;

[0089] b. Then slowly add cerium oxide mill powder, stop stirring after stirring for 1 hour, and let the solution stand for 5 hours;

[0090] c. Turn on the stirring, add dispersant, complexing agent, preservative and grinding aid respectively, and stir until evenly dispersed;

[0091] d. Add a pH adjuster to adjust the pH to 8-11, stir until evenly dispersed, and obtain a water-based polishing liquid for glass polishing.

[0092] The present invention tests the suspension dispersibility of the water-based polishing liquid for glass polishing prepared in Example 2 and the average yield, removal rate and roughness of the polished product:

[0093] (1) Observation of suspension and dispersibility of polishing fluid

[0094]...

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PUM

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Abstract

The invention provides a water-based cerium oxide polishing solution for polishing glass, and a preparation method thereof. The polishing solution comprises 20-55% of ground cerium oxide, 0.1-3% of acompound surfactant, 1-8% of a dispersant, 0.1-2% of a lubricant, 0.01-3% of a complexing agent, 0.01-5% of a grinding aid, 0.01-1% of a pH regulator, 0.01-2% of a preservative, and the balance of water, wherein the compound surfactant is a compound of a nonionic surfactant and an anionic surfactant; the nonionic surfactant is one or more of polyvinylpyrrolidone, alkylphenol polyoxyethylene ether,fatty alcohol polyoxyethylene ether and fatty acid glyceride; the anionic surfactant is one or more of sodium dodecylbenzenesulfonate, sodium laurate, sodium stearate and sodium succinate; and the dispersant is one or more of sodium oxalate, sodium hexametaphosphate, sodium pyrophosphate, sodium nitrate, sodium polyacrylate and sodium lauryl sulfate. The polishing solution has a good suspending dispersibility, and products polished with the polishing solution have a high yield.

Description

technical field [0001] The invention relates to the technical field of polishing liquid, in particular to a water-based cerium oxide polishing liquid for glass polishing and a preparation method thereof. Background technique [0002] Chemical Mechanical Polishing (CMP) technology organically combines the mechanical grinding effect of nanoparticles and the chemical corrosion effect of polishing liquid to carry out precision machining on the surface of materials. Today, chemical mechanical polishing technology is recognized as the only global planarization technology, which is widely used in the manufacture of advanced electronic products such as computer hard disks, integrated circuit silicon wafers, and optical glass. In the polishing liquid market, excellent chemical mechanical polishing liquids mainly rely on imports from the United States, Japan and other countries. Domestic products are mainly polishing powder, and polishing liquids with good suspension and dispersion st...

Claims

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Application Information

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IPC IPC(8): C09G1/02
Inventor 周群飞何金名
Owner LENS TECH CHANGSHA
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