Preparation method for forest nanostructure and regulation and control method for forest nanostructure

Abstract

The invention provides a preparation method for a forest nanostructure and a regulation and control method for the forest nanostructure. The preparation method for the forest nanostructure comprises the following steps: S1. employing a mixture comprising a couplant and a polymer to form a film layer on a substrate; and carrying out plasma bombardment on the film layer, thereby forming the forest nanostructure. Through carrying out bombardment on a polymer layer by adopting plasma, part of products produced by the polymer can be repolymerized to form a forest nanostructure; and the couplant isadded on the basis of the polymer, during plasma bombardment, groups of the polymer and the couplant in the film layer are activated, organic groups and inorganic groups of the couplant are interconnected with organic groups and inorganic groups of the polymer separately, and meanwhile, the organic groups of the couplant are in a crosslinked action, so that active groups produced from plasma bombardment are repolymerized, an original mixture layer disappears, and similarly, the forest nanostructure is formed.

Description

Technical field [0001] The invention relates to the field of nanotechnology, in particular to a method for preparing a nano forest structure and a method for regulating the nano forest structure. Background technique [0002] Nano forest structure is widely used in biological detection and photoelectric detection devices due to its special surface effects such as large surface-to-body ratio and multiple pores, which directly affects the working performance, preparation cost and application range of the device. A nano-forest structure with simple preparation process and controllable characteristics and morphology can effectively improve the performance of integrated devices, reduce the preparation cost, and broaden the application range. [0003] At present, a variety of nano-forest structure preparation methods have been reported, including electron beam exposure, nano-bead etching, and VLS (Vapor Liquid Solid) chemical synthesis growth technology. However, these technologies still...

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Problems solved by technology

Among them, the electron beam exposure technology method needs to rely on expensive equipment and belongs to serial processing, which makes the preparation of large-area nano-forest structures costly and time-consuming, and it is difficult to achieve large-scale promotion; nano-sphere etching technology combined with anisotropic etching The nanoforest structure can be prepared in parallel, but the patterning of single-layer nanospheres requires strict control conditions, and it is difficult to achieve large-area single-layer arrangement of small balls, which increases the difficulty of the process and limits the application of this technology. device application

Although the VLS chemical synthesis technology is a parallel preparation process with simple process steps, it can prepare nano-forest structures in large areas, but the direction and size parameters of the nano-forest structures prepared by this technology are difficult to control well, which in turn affects the characteristics of the nano-forest structures. , In addition, this technology is difficult to be compatible with conventional MEMS processes, thus further limiting the application of this technology in devices

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