A quantum dot light-emitting layer and its preparation method, quantum dot device
A quantum dot device and quantum dot light-emitting technology, applied in the field of quantum dot light-emitting layer and its preparation, quantum dot device field, can solve problems such as charge injection imbalance, achieve the effect of carrier injection balance, improve efficiency and lifespan
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[0046] The preparation of the quantum dot light-emitting layer includes the preparation of the quantum dot composite structure 10a, the third quantum dot layer 31 and the third polymer bridging layer 32, wherein the preparation method of the quantum dot composite structure 10a can refer to the preparation method of the first embodiment, For the third quantum dot layer 31 and the third polymer bridging layer 32 , reference may be made to the preparation methods of the first quantum dot layer 11 and the first polymer bridging layer 12 in the first embodiment, which will not be repeated here.
[0047] In the third embodiment of the quantum dot light-emitting layer, such as image 3 As shown, the quantum dot light-emitting layer includes a quantum dot composite structure 10b, and the quantum dot composite structure 10b includes a first polymer bridging layer 12, a first quantum dot layer 11 and a second quantum dot layer 13 arranged in sequence, and the first polymer The bridging ...
Embodiment 1
[0067] The preparation of QLED positive device comprises the following steps:
[0068] S1, cleaning of ITO glass
[0069] Put the ITO glass sheet with the number engraved on the back into a glass dish filled with ethanol solution, scrub the ITO surface with a cotton swab, and then use acetone, deionized water, and ethanol to sonicate for 10 minutes respectively, and blow dry with a nitrogen gun. Finally, Place the cleaned ITO glass sheet in oxygen plasma and continue cleaning for 10 minutes;
[0070] S2, preparation of hole injection layer (Pedot:PSS)
[0071] The cleaned ITO glass sheet was spin-coated with Pedot:PSS in the air, the rotation speed was 3000r / min, and the spin-coating time was 45 seconds. After the spin-coating was completed, it was placed in the air for annealing. The annealing temperature was 150°C, and the annealing time was 30 minutes. After the annealing is completed, quickly transfer the sheet to a glove box with a nitrogen atmosphere;
[0072] S3, pre...
Embodiment 2
[0084] The preparation of QLED positive device comprises the following steps:
[0085] S1, cleaning of ITO glass
[0086] Put the ITO glass sheet with the number engraved on the back into a glass dish filled with ethanol solution, scrub the ITO surface with a cotton swab, and then use acetone, deionized water, and ethanol to sonicate for 10 minutes respectively, and blow dry with a nitrogen gun. Finally, Place the cleaned ITO glass sheet in oxygen plasma and continue cleaning for 10 minutes;
[0087] S2, preparation of hole injection layer (Pedot:PSS)
[0088] The cleaned ITO glass sheet was spin-coated with Pedot:PSS in the air, the rotation speed was 3000r / min, and the spin-coating time was 45 seconds. After the spin-coating was completed, it was placed in the air for annealing. The annealing temperature was 150°C, and the annealing time was 30 minutes. After the annealing is completed, quickly transfer the sheet to a glove box with a nitrogen atmosphere;
[0089] S3, pre...
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