A kind of lead iodide nano material and its preparation method and application
A technology of nanomaterials and lead iodide, applied in the direction of lead halide, nanotechnology, analytical materials, etc., can solve the problem of crystal shape regularity, shape controllability, crystal quality needs to be improved, solvent volatilization process is difficult to control, and operation steps are complicated to achieve excellent detection performance, improve preparation efficiency and yield, and achieve low preparation costs
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Embodiment 1
[0047] 1. Cut the silicon wafer with 300nm oxide layer into several square pieces of 1cm×1cm, wash and set aside;
[0048] 2. Place the treated silicon wafer in a small petri dish without a lid, and then put it into a large petri dish with a small amount of deionized water;
[0049] 3. Insulate the large Petri dish at 20°C;
[0050] 4. Use a pipette gun to draw 50 μL of a supersaturated aqueous solution of 2 mg / mL lead iodide powder and drop it on the above-mentioned silicon wafer substrate;
[0051] 5. Cover the above-mentioned large petri dish, let it stand for about 10 minutes, wait for the solvent to evaporate completely, and get as follows: image 3 The two-dimensional lead iodide nanosheets shown.
[0052] image 3 The twists and turns in the photo are due to the phenomenon of metal probe jumping needles caused by rough particles on the surface of the sample.
Embodiment 2
[0054] 1. Cut the silicon wafer with 300nm oxide layer into several square pieces of 1cm×1cm, wash and set aside;
[0055] 2. Place the treated silicon wafer in a small petri dish without a lid, and then put it into a large petri dish with a small amount of deionized water;
[0056] 3. Insulate the large Petri dish at 50°C;
[0057] 4. Use a pipette gun to draw 50 μL of a supersaturated aqueous solution of 2 mg / mL lead iodide powder and drop it on the above-mentioned silicon wafer substrate;
[0058] 5. Cover the above-mentioned large petri dish, let it stand for about 10 minutes, wait for the solvent to evaporate completely, and get as follows: Figure 4 The two-dimensional lead iodide nanosheets shown.
[0059] Figure 4 The twists and turns in the photo are due to the phenomenon of metal probe jumping needles caused by rough particles on the surface of the sample.
Embodiment 3
[0061] 1. Cut the silicon wafer with 300nm oxide layer into several square pieces of 1cm×1cm, wash and set aside;
[0062] 2. Place the treated silicon wafer in a small petri dish without a lid, and then put it into a large petri dish with a small amount of deionized water;
[0063] 3. Insulate the large Petri dish at 30°C;
[0064] 4. Use a pipette gun to draw 50 μL of a supersaturated aqueous solution of 2 mg / mL lead iodide powder and drop it on the above-mentioned silicon wafer substrate;
[0065] 5. Cover the above-mentioned large petri dish, let it stand for about 10 minutes, wait for the solvent to evaporate completely, and get as follows: Figure 5 Two-dimensional lead iodide nanosheets on a silicon wafer are shown.
[0066] 6. Use glass, PET film and copper mesh carbon film as the target substrates respectively, repeat the above steps, keep warm at 30°C, and evaporate the solvent to obtain the two substrates on the glass, on the PET film and on the copper mesh carbon...
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