Method for imprinting multiple nano-patterns based on photoresponsive polymer

A nano-pattern and polymer technology, applied in the fields of nanotechnology, optics, opto-mechanical equipment, etc., can solve problems such as inability to imprint nanostructures, and achieve the effect of simple and convenient method and expanding the scope of application.
CN110320744AActive Publication Date: 2019-10-11PEKING UNIV
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
PEKING UNIV
Publication Date
2019-10-11

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Abstract

The invention discloses a method for imprinting multiple nanopatterns based on a photoresponsive polymer. The glass transition temperature (Tg) of the used polymer has the property of light regulationand control; a substrate is coated with a layer of polymer film; illumination of relatively short wavelength is applied to the substrate, so that the glass transition temperature is reduced; a thermoplastic nano-imprinting method is used for patterning the substrate; then illumination of relatively long wavelength is applied to the substrate, so that the glass transition temperature is restored;and curing is realized. The process can be repeated for unlimited times under the condition of an optical mask; and repeated illumination, imprinting and curing are carried out to finally obtain a thin film containing multiple nanostructures. The method can be applied to the fields of anti-counterfeiting identification, information storage, semiconductor chip manufacturing technologies and the like, so that the application range of a nanoimprinting lithography technology is expanded.
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Description

technical field

[0001] The invention relates to the technical fields of polymer material technology and nanoimprint lithography (Nanoimprint Lithography, NIL), in particular to a method for preparing multiple nanometer patterns on the surface of a light-responsive polymer by utilizing thermoplastic nanoimprint technology. Background technique

[0002] The preparation of nanopatterns is a very important research field at present. According to the preparation method, it can be divided into top-down and bottom-up. The imprinting method described in the present invention is a top-down type. The imprinting method can be divided into hundreds of nanometers, ten nanometers, nanometers and so on according to the pattern size. If the size of the pattern is on the order of hundreds of nanometers, the structure has the properties of a photonic crystal, which can be used in optical modulators, anti-counterfeiting identification and other fields. If the pattern is in the order of ten ...

Claims

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