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Method for imprinting multiple nano-patterns based on photoresponsive polymer

A nano-pattern and polymer technology, applied in the fields of nanotechnology, optics, opto-mechanical equipment, etc., can solve problems such as inability to imprint nanostructures, and achieve the effect of simple and convenient method and expanding the scope of application.

Active Publication Date: 2019-10-11
PEKING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method can only act globally, and cannot accurately imprint specific nanostructures in specific regions.

Method used

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  • Method for imprinting multiple nano-patterns based on photoresponsive polymer
  • Method for imprinting multiple nano-patterns based on photoresponsive polymer
  • Method for imprinting multiple nano-patterns based on photoresponsive polymer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] 1. Selection of materials

[0059]

[0060] For the azobenzene homopolymer shown in formula I, when R 1 is methyl, R 3 , R 4 , R 5 and R 6 Both are H atoms, when n is about 40 (molecular weight is about 20,000), different spacer m and end group R 2 The photoinduced glass transition temperature of the polymer (T g ) transformation results are shown in Table 1.

[0061] Table 1. Trans / cis state glass transition temperature of some azobenzene homopolymers

[0062]

[0063] This embodiment adopts m=6, end group R 2 It is a n-butyl azobenzene homopolymer whose main chain is methyl methacrylate type, recorded as PM6AzC4, with a molecular weight of 32 000 and a dispersity of 1.91. The glass transition temperature measured by DSC is 78°C. The post glass transition temperature is 15°C.

[0064] 2. Film Preparation

[0065] The silicon wafer is cleaned and dried, and a layer of PM6AzC4 polymer (4wt%, solvent is tetrahydrofuran) is spin-coated on the silicon wafer....

Embodiment 2

[0073] 1. Selection of materials

[0074] With embodiment 1.

[0075] 2. Film Preparation

[0076] Select a commercial PET film with a thickness of about 10 microns, drop-coat a layer of PM6AzC4 polymer (4wt%, solvent is tetrahydrofuran) on the PET film to obtain a polymer film with a thickness of about 1 micron, and store it away from light.

[0077] 3. First impression

[0078] Same as Example 1, except that the template for imprinting is changed to a nickel template.

[0079] 4. Second impression

[0080] Same as Example 1, except that the template for imprinting is changed to a nickel template. The embossing effect is the same as in Example 1, and the structural color effect is as follows Figure 7 As shown, the pattern color changes with the azimuth angle and polar angle simultaneously (same as embodiment 1).

Embodiment 3

[0082] 1. Selection of materials

[0083] Adopt m=6, end group R 2 It is an ethoxy group, the main chain is azobenzene homopolymer of methyl methacrylate type, recorded as PM6AzOC2, the molecular weight is 59 000, and the dispersion is 2.12.

[0084] 2. Film Preparation

[0085] With embodiment 1.

[0086] 3. First impression

[0087] Same as Example 1, except that the whole process is carried out on a hot stage at 50°C.

[0088] 4. Second impression

[0089] Same as Example 1, except that the whole process is carried out on a hot stage at 50°C. The embossing effect and structural color effect are the same as in Example 1.

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Abstract

The invention discloses a method for imprinting multiple nanopatterns based on a photoresponsive polymer. The glass transition temperature (Tg) of the used polymer has the property of light regulationand control; a substrate is coated with a layer of polymer film; illumination of relatively short wavelength is applied to the substrate, so that the glass transition temperature is reduced; a thermoplastic nano-imprinting method is used for patterning the substrate; then illumination of relatively long wavelength is applied to the substrate, so that the glass transition temperature is restored;and curing is realized. The process can be repeated for unlimited times under the condition of an optical mask; and repeated illumination, imprinting and curing are carried out to finally obtain a thin film containing multiple nanostructures. The method can be applied to the fields of anti-counterfeiting identification, information storage, semiconductor chip manufacturing technologies and the like, so that the application range of a nanoimprinting lithography technology is expanded.

Description

technical field [0001] The invention relates to the technical fields of polymer material technology and nanoimprint lithography (Nanoimprint Lithography, NIL), in particular to a method for preparing multiple nanometer patterns on the surface of a light-responsive polymer by utilizing thermoplastic nanoimprint technology. Background technique [0002] The preparation of nanopatterns is a very important research field at present. According to the preparation method, it can be divided into top-down and bottom-up. The imprinting method described in the present invention is a top-down type. The imprinting method can be divided into hundreds of nanometers, ten nanometers, nanometers and so on according to the pattern size. If the size of the pattern is on the order of hundreds of nanometers, the structure has the properties of a photonic crystal, which can be used in optical modulators, anti-counterfeiting identification and other fields. If the pattern is in the order of ten ...

Claims

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Application Information

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IPC IPC(8): G03F7/00B82Y40/00
CPCB82Y40/00G03F7/0002
Inventor 于海峰杨博闻王文忠
Owner PEKING UNIV
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