A self-assembly preparation method of a micro-nano multi-level column structure

A multi-level column, self-assembly technology, applied in microstructure devices, manufacturing microstructure devices, microstructure technology and other directions, can solve the problems of high processing cost, difficult to obtain nanostructure, high cost, and achieve the effect of excellent performance

Active Publication Date: 2022-06-17
BEIHANG UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Some researchers use traditional lithography technology to achieve higher resolution nano-lithography by continuously shortening the exposure wavelength, but the processing cost is very high; there are also technologies such as electron beam and focused ion beam for scanning processing, which are costly And the efficiency is low; some researchers also use nanoimprint technology to prepare nanostructures, but due to the limitation of release factors, it is difficult to obtain nanostructures with high aspect ratio and good structure; some researchers also use sacrificial template method to prepare polymer nanopillar arrays

Method used

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  • A self-assembly preparation method of a micro-nano multi-level column structure
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  • A self-assembly preparation method of a micro-nano multi-level column structure

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preparation example Construction

[0029] The invention provides a self-assembly preparation method of a micro-nano multi-level column structure, comprising the following steps:

[0030] After cleaning the aluminum-based AAO template, an organic film is evaporated on the surface of the aluminum-based AAO template, and then the prepolymer is poured onto the surface of the aluminum-based AAO template and cured to obtain a cured sample; the prepolymer is poured to exceed the hole height of the aluminum-based AAO template;

[0031] removing the aluminum-based AAO template in the cured sample to obtain a nanopillar array;

[0032] The nano-pillar array is washed with an organic solvent to obtain a nano-pillar array wetted by an organic solvent;

[0033] The organic solvent-wetted nano-pillar array is sequentially pre-frozen and freeze-dried to obtain the micro-nano multi-level column structure.

[0034] After cleaning the aluminum-based AAO template, an organic film is evaporated on the surface of the aluminum-bas...

Embodiment 1

[0062] Step 1: After ultrasonically cleaning the aluminum-based AAO template in deionized water, ethanol and acetone in sequence, a Parylene film (with a thickness of 50 nm) was evaporated on the surface of the aluminum-based AAO template; Dow Corning 184 The prepolymer and the curing agent are fully stirred at a mass ratio of 10:1 and then degassed to obtain a prepolymer; the prepolymer is poured onto the aluminum-based AAO template surface ( The degree of pouring of the polymer fluid exceeds the height of the hole by 5 mm), then it is put into a vacuum desiccator for 20 minutes of vacuuming, taken out and placed in a hot oven with a temperature of 75 ° C, and heated and cured for 1.5 hours to obtain a cured sample;

[0063] Step 2: Immerse the cured sample in NaOH solution with a mass fraction of 5%, let it stand for 10 minutes, take out the cured sample and rinse with deionized water; then immerse the sample in CuCl with a mass fraction of 70% 2 The solution was dissolved i...

Embodiment 2

[0068] The difference from Example 1 is that the nano-pillar array wetted with tert-butanol in step 4 is pre-frozen in a refrigerator with a temperature of -18 ° C to obtain a PDMS micro-nano-pillar array surface with a self-assembly scale of about 5-10 μm. Micro-nano multi-level pillar structure.

[0069] Image 6 The electron microscope photograph under 5200 magnifications of the micro-nano multi-level column structure obtained in this embodiment; Figure 7 The electron microscope photograph of the micro-nano multi-level column structure obtained in this example at a magnification of 19,000. from Image 6 and Figure 7 It can be seen that the nanopillar array self-assembles during the freeze-drying process to form many micron-scale columnar structures with an average size of 6μm×6μm area, and there are certain gaps between the nanopillars, and no clusters are very close.

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Abstract

The invention provides a self-assembly preparation method of a micro-nano multi-level column structure, and relates to the technical field of micro-nano material preparation. The method comprises the following steps: evaporating an organic film on the surface of the aluminum-based AAO template, then pouring the prepolymer onto the surface of the aluminum-based AAO template, and curing to obtain a cured sample; removing the aluminum-based AAO template in the cured sample by etching, and using an organic solvent Washing to obtain a nano-column array wetted with an organic solvent; finally pre-freezing and freeze-drying to form a micro-nano multi-level column structure. The present invention directly converts the organic solvent from a solid state to a gaseous state through freeze-drying, which can reduce the influence of surface tension on the morphology of the nano-column array when the liquid volatilizes during the drying process, that is, the nano-columns will not pull each other and the clusters are very tight; By controlling the pre-freezing temperature of the organic solvent, the size of the nanocolumn self-assembly scale can be adjusted.

Description

technical field [0001] The invention relates to the technical field of micro-nano material preparation, in particular to a self-assembly preparation method of a micro-nano multi-level column structure. Background technique [0002] In recent years, polymer structures have shown wide application prospects in the fields of organic semiconductor devices, biosensors, and biomimetic adhesive functional surfaces. Therefore, how to construct polymer structures has become a research hotspot. [0003] Some researchers use traditional lithography technology to achieve higher resolution nanolithography by continuously shortening the exposure wavelength, but the processing cost is very high; there are also scanning processing through electron beam and focused ion beam technology, which is costly And the efficiency is low; some researchers use nanoimprint technology to prepare nanostructures, but due to the limitation of demolding factors, it is difficult to obtain nanostructures with hi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B81B1/00B81B7/04B81C1/00
CPCB81B1/00B81B7/04B81C1/00031
Inventor 陈华伟郭雨润张力文
Owner BEIHANG UNIV
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