A self-assembly preparation method of a micro-nano multi-level column structure

A multi-level column, self-assembly technology, applied in microstructure devices, manufacturing microstructure devices, microstructure technology and other directions, can solve the problems of high processing cost, difficult to obtain nanostructure, high cost, and achieve the effect of excellent performance
CN110371919BActive Publication Date: 2022-06-17BEIHANG UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
BEIHANG UNIV
Publication Date
2022-06-17

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Abstract

The invention provides a self-assembly preparation method of a micro-nano multi-level column structure, and relates to the technical field of micro-nano material preparation. The method comprises the following steps: evaporating an organic film on the surface of the aluminum-based AAO template, then pouring the prepolymer onto the surface of the aluminum-based AAO template, and curing to obtain a cured sample; removing the aluminum-based AAO template in the cured sample by etching, and using an organic solvent Washing to obtain a nano-column array wetted with an organic solvent; finally pre-freezing and freeze-drying to form a micro-nano multi-level column structure. The present invention directly converts the organic solvent from a solid state to a gaseous state through freeze-drying, which can reduce the influence of surface tension on the morphology of the nano-column array when the liquid volatilizes during the drying process, that is, the nano-columns will not pull each other and the clusters are very tight; By controlling the pre-freezing temperature of the organic solvent, the size of the nanocolumn self-assembly scale can be adjusted.
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Description

technical field

[0001] The invention relates to the technical field of micro-nano material preparation, in particular to a self-assembly preparation method of a micro-nano multi-level column structure. Background technique

[0002] In recent years, polymer structures have shown wide application prospects in the fields of organic semiconductor devices, biosensors, and biomimetic adhesive functional surfaces. Therefore, how to construct polymer structures has become a research hotspot.

[0003] Some researchers use traditional lithography technology to achieve higher resolution nanolithography by continuously shortening the exposure wavelength, but the processing cost is very high; there are also scanning processing through electron beam and focused ion beam technology, which is costly And the efficiency is low; some researchers use nanoimprint technology to prepare nanostructures, but due to the limitation of demolding factors, it is difficult to obtain nanostructures with hi...

Claims

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