Photocurable resin composition, optical filter and photoresist
A technology of photocurable resin and composition, which is applied in the field of optical materials, can solve the problems of difficult to meet the requirements of solvent resistance and unsatisfactory photocuring rate, etc., to improve solvent resistance, increase reactivity and curing rate, and reduce acid value Effect
Active Publication Date: 2022-05-10
CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD +1
View PDF7 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0003] The main purpose of the present invention is to provide a kind of photocurable resin composition, optical filter and photoresist, to solve the unsatisfactory photocuring rate, alkali-resistant solubility, solvent resistance of photocurable resin composition in the prior art Difficult to meet the problem
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0021] It should be noted that the embodiments in the present application and the features of the embodiments may be combined with each other in the case of no conflict. The present invention will be described in detail below with reference to the embodiments.
[0022] As analyzed in the background art of the present application, the photo-curing rate of the photo-curable resin composition in the prior art is not ideal, and it is difficult to meet the requirements in the formability of micro-patterns, the adhesion to the substrate, the resistance to alkali dissolution, and the solvent resistance. In order to solve the problem that the photocuring rate is not ideal, the present application provides a photocurable resin composition, a filter and a photoresist.
[0023] In a typical embodiment of the present application, a photocurable resin composition is provided, comprising a photosensitive resin, an initiator and a photopolymerizable monomer, and the photosensitive resin has ...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
| Property | Measurement | Unit |
|---|---|---|
| acid value | aaaaa | aaaaa |
| acid value | aaaaa | aaaaa |
Login to View More
Abstract
The invention provides a photocurable resin composition, a light filter and a photoresist. Photocurable resin composition, comprising photosensitive resin, initiator and photopolymerizable monomer, photosensitive resin has following structural formula I: the carboxylic acid group with above-mentioned structural formula I photosensitive resin is relative to conventional similar photosensitivity in the prior art The content of carboxylic acid groups in the resin is less, and the content of active groups such as side chain alcoholic hydroxyl groups or epoxy groups is increased, which further reduces the acid value of the photosensitive resin, improves the reactivity and curing performance, and makes the obtained modified photosensitive The photocuring performance of the permanent resin, the adhesion to the substrate, the alkali solvent resistance, and the solvent resistance have been further improved.
Description
technical field [0001] The present invention relates to the field of optical materials, in particular, to a photocurable resin composition, an optical filter and a photoresist. Background technique [0002] The photocurable resin composition is an important raw material for preparing optical filters, and the quality of its performance directly determines the quality of the optical filter, which in turn affects the performance of liquid crystal (LCD) displays. In order to ensure the properties of heat resistance and chemical corrosion resistance during the manufacturing process of the optical filter, higher requirements are placed on the properties of the photosensitive resin composition. The polymer compound with fluorene skeleton has excellent properties such as high heat resistance, high transparency, high refractive index, low expansion coefficient, etc., such as patent documents CN100564349C, CN101965375A, etc. respectively disclose: the polymer compound containing fluor...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/027G02B5/20
CPCG03F7/004G03F7/027G02B5/20
Inventor 钱晓春胡春青葛庆余
Owner CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD