The invention provides a photosensitive resin composition and a
photoresist. The photosensitive resin composition comprises resin, and the resin comprises at least two kinds of photosensitive resin, wherein the two kinds of photosensitive resin independently have the structure shown in the
structural formula I, one kind of photosensitive resin is high-molecular-weight photosensitive resin, the weight-average molecular weight of the photosensitive resin is 6,300-7,800, and the weight-average molecular weight of the photosensitive resin is 5,000-5,500; the
structural formula I is shown in the specification, and the photosensitive resin with the
structural formula I has the photocuring performance, wherein the adhesiveness to a substrate, the alkali
solvent resistance and the
solvent resistance are high; and the two photosensitive resins with the advantages are compounded, so the molecular weight of each photosensitive resin is further controlled; the resolution and the
adhesive force canbe improved by utilizing the high molecular weight
photosensitivity, and the developability is improved and the residual film rate is reduced by utilizing the low molecular weight photosensitive resin, so a
black matrix with high sensitivity and uniform CD can be prepared.