Nano invisible mask and manufacturing process thereof

An invisible and nano technology, applied in the field of beauty and skin care products, which can solve the problems of easily deteriorating nutrients, susceptible to bacteria, and unable to guarantee the nutrients of nanofibers.

Active Publication Date: 2019-11-12
HANGZHOU LONG BEACH TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, electrospinning technology is used to make dry nanofiber masks. The mask nutrient solution is mixed with organic or inorganic solvents to prepare the electrospinning solution. The electrospinning process is used to prepare the nanofiber membrane. When used, it is sprayed with water, and the mask is dissolved on the skin. In water, it is defined as an invisible mask, without a film and without a sense of firmness. Although this dry mask is easy to carry, during the production and preparation process, the mask nutrient solution is formed into filaments by electrospinning to prepare membrane

Method used

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  • Nano invisible mask and manufacturing process thereof
  • Nano invisible mask and manufacturing process thereof
  • Nano invisible mask and manufacturing process thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0058] A preparation method based on nano invisible mask, comprising the following steps:

[0059] Step 1): In terms of mass fraction, polyamide (PA6) with 15% mass fraction as the solute is dissolved in a mixed solvent of formic acid and acetic acid with a mass fraction of 84% to form an electrospinning liquid, and the ratio of formic acid and acetic acid is 1:2 (ie " The mass ratio of formic acid and acetic acid is 1:2"), fully stirred evenly, and left to defoam, wherein, the stirring speed was 500r / min, and the stirring time was 4h;

[0060] Step 2): then add the nanometer SiO of 1% mass fraction 2 The particles are stirred by ultrasonic vibration in the above-mentioned electrospinning liquid, the stirring speed of ultrasonic vibration is 500r / min, and the stirring time is 4h; the nano-SiO 2 The particle size is 45nm;

[0061] Step 3) The solution obtained after step 2) is spun with an Elmarco electrospinning machine, and the non-woven fabric substrate is used as the bott...

Embodiment a

[0067] A kind of preparation method based on nano invisible mask comprises the following steps:

[0068] Step 1): In terms of mass fraction, 30% mass fraction of polyamide (PA66) is used as a solute, dissolved in 65% mass fraction of formic acid solvent to form an electrospinning solution, fully stirred evenly, and left to stand for defoaming, wherein, stirring Speed ​​600r / min, stirring time 6h;

[0069] Step 2): then add the nano-SiO of 5% mass fraction 2 The particles are stirred by ultrasonic vibration in the above-mentioned electrospinning liquid, the stirring speed of ultrasonic vibration is 500r / min, and the stirring time is 4h; the nano-SiO 2 The particle size is 100nm;

[0070]Step 3) The solution obtained after step 2) is spun with an Elmarco electrospinning machine, and the non-woven fabric substrate is used as the bottom layer of the substrate, and the nanofiber layer is obtained by spinning on the bottom layer of the substrate, and then in the nanometer The fib...

Embodiment b

[0075] A kind of preparation method based on nano invisible mask comprises the following steps:

[0076] Step 1): In terms of mass fraction, 3% mass fraction of polyamide (PA46) is used as the solute, dissolved in 96.9% mass fraction of acetic acid solvent to form an electrospinning solution, fully stirred evenly, and left to stand for defoaming, wherein, stirring Speed ​​300r / min, stirring time 2h;

[0077] Step 2): then add the nanometer SiO of 0.1% mass fraction 2 The particles are stirred by ultrasonic vibration in the above electrospinning solution, the stirring speed of ultrasonic vibration is 200r / min, and the stirring time is 4h; the nano-SiO 2 The particle size is 300nm;

[0078] Step 3) The solution obtained after step 2) is spun with an Elmarco electrospinning machine, and the non-woven fabric substrate is used as the bottom layer of the substrate, and the nanofiber layer is obtained by spinning on the bottom layer of the substrate, and then in the nanometer The ...

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Abstract

The invention discloses a nano invisible mask including the following raw material components by mass percentage: 3% to 30% of polyamide, 65% to 96.9% of organic acids, and 0.1% to 5% of silicon particles; the above materials are mixed, and a nanofiber layer is electrostatically spun and formed between a substrate bottom layer and a protective layer. The nano invisible mask made from the above materials has excellent skin applicability, long time of water-holding and moisturizing, good skin firming and anti-wrinkle effect, strong adsorption ability, cleaning and removing of facial dirt, and good invisible effect, and is convenient in public places use. The invention also discloses the nano invisible mask, which includes the following raw material components, based on mass percentage, 3% to30% of polyamide, 60% to 96.8% of organic acid, and 0.1% to 5% of silica particles and 0.1% to 5% of titanium dioxide particles, the above materials are mixed, and the nanofiber layer is electrostatically spun and formed between the substrate bottom layer and the protective layer. In addition to the above-mentioned effects, the prepared nano invisible mask has the effect of preventing UV and sun.

Description

technical field [0001] The invention relates to the field of beauty and skin care products, in particular to a nano-invisible facial mask and a manufacturing process thereof. Background technique [0002] With the improvement of living standards, people pay more and more attention to facial skin maintenance. Mask is to use the short time covered on the face to temporarily isolate external air pollution, replenish moisture and nutrients to the skin, and make the skin naturally bright and elastic. At present, the facial mask paper on the market mainly includes non-woven fabric, silk cloth and bio-cellulose paper. The main feature is to absorb a certain amount of facial mask liquid through the membrane paper and apply it on the face, so that the skin can achieve the absorption effect. The traditional facial mask paper is thick and uneven in texture. The size of the holes is different, so it cannot fit perfectly with the human face, and the visual sense is very bad. [0003] Ho...

Claims

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Application Information

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IPC IPC(8): A61K8/02A61K8/25A61K8/88A61Q17/04A61Q19/00D01D5/00
CPCA61K8/88A61K8/25A61K8/0212A61Q19/00A61Q17/04D01D5/0092D01D5/003A61K2800/82
Inventor 闫晓宇曹晨张维
Owner HANGZHOU LONG BEACH TECH CO LTD
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