Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

High-haze conductive film and preparation method thereof

A conductive film, high haze technology, used in the manufacture of cables/conductors, conductive layers on insulating carriers, circuits, etc., can solve the problems of uneven surface conductivity, low production yield, low transparency, etc., and achieve convenient operation. , The effect of stable electrical conductivity and high light transmittance

Active Publication Date: 2019-11-15
SUZHOU UNIV
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In short, the disadvantages of the existing process for preparing conductive films mainly include: 1. High energy consumption and high cost; 2. Uneven surface conductivity of the film; 3. Low transparency; 4. Low production yield

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-haze conductive film and preparation method thereof
  • High-haze conductive film and preparation method thereof
  • High-haze conductive film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] This embodiment provides a method for preparing a polyimide composite film with high light transmittance and high haze, comprising the following steps:

[0043] 1) Preparation of brown-yellow polyimidic acid solution: Dissolve 0.02mol of HFBAPP in 8.7g of DMF under a nitrogen atmosphere, stir evenly on a stirring table, then add 0.02mol of ODPA to it, at a temperature of 20-30°C Stir for more than 12 hours to obtain a yellow-brown polyimidic acid solution;

[0044] 2) Centrifuge to obtain PS microspheres: take a certain amount of PS microsphere dispersion system (the diameter of PS microspheres is 2 μm, the dispersion system is water, and the mass fraction of PS microspheres is 5%), and centrifuge at 10000rpm in a centrifuge to obtain a centrifuged product. The centrifuged product is dispersed in DMF, centrifuged again at 10,000 rpm, and the centrifuged product is PS microspheres;

[0045] 3) Coating of conductive silver nanowires: Dilute the aqueous dispersion of silver...

Embodiment 2

[0048] A flexible polyimide conductive film with high haze silver nanowires was prepared according to the method of Example 1, except that the diameter of the silver nanowires in step 3) was 20 nm, and other conditions were the same as in Example 1.

[0049] Using the above conditions, the square resistance of the silver wire electrode prepared in step 3) is 11Ω / □, thus, the square resistance of the prepared flexible polyimide conductive film with high haze nano-silver wire is 11Ω / □. It shows that silver wires with a diameter of 20nm are also suitable for this kind of flexible polyimide conductive film with high haze nano-silver wires.

Embodiment 3

[0051] According to the method of Example 1, a flexible polyimide conductive film with high haze nano-silver wires was prepared, except that the amount of PS microspheres in step 4) was changed to 15 mg, and other conditions were the same as in Example 1.

[0052] Using the above conditions, the square resistance of the flexible polyimide conductive film with high haze silver nanowires in this embodiment is 10Ω / □, the highest transmittance in the visible light region is 83.0%, and the haze can reach up to 54%.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
particle diameteraaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to a high-haze conductive film and a preparation method thereof. The method comprises steps that an electrode is prepared on a surface of a substrate, secondly, polyimide solution mixed with PS microspheres is coated on a surface of the electrode, after heating curing and dehydration condensation, a polyimide film is formed, the temperature is lowered to the room temperature,and the high-haze conductive film is formed on the surface of the substrate. A high-haze flexible transparent polyimide film substrate with the good light control effect is utilized, total light transmission of the electrode can be increased, a method of embedding the electrode in the polyimide film is utilized, the square resistance remains low, however, roughness of a conductive surface of theelectrode is significantly reduced. The method is advantaged in that the preparation process of the conductive film is simple, operation is convenient, cost is low, and the method is suitable for popularization and application.

Description

technical field [0001] The invention relates to the technical field of conductive films, in particular to a high-haze conductive film and a preparation method thereof. Background technique [0002] At present, the industrial production of transparent conductive films is still dominated by oxides. Oxide transparent conductive films are widely used as transparent electrodes in flat-panel displays and solar energy due to their excellent photoelectric properties, such as low resistivity and high visible light transmittance. Batteries, touch screens, heatable glass windows, etc. At present, ITO (tin-doped indium oxide) thin film is the most widely used in practice, and its target preparation and film formation process are relatively mature. However, due to the In 2 o 3 The price is expensive, the cost is high, and indium is highly toxic, which will be harmful to the human body during preparation and application; in addition, the atomic weights of Sn and In are large, and they ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01B13/00H01B5/14
CPCH01B5/14H01B13/00H01B13/0016
Inventor 唐建新屈天一李艳青陈敬德
Owner SUZHOU UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products