The invention relates to a method for depositing a thermochromic
vanadium dioxide layer on a glass substrate (101) inside a
processing chamber, wherein a) the glass substrate (101) is guided past a
coating device (103) inside the working chamber; b)
oxygen is introduced into the working chamber through at least one inlet (106); c) the glass substrate (101) is heated by means of at least one heating device (105) prior to the layer deposition; d) a target made of
vanadium or
vanadium oxide is sputtered by means of at least one magnetron inside the
coating device (103); e) after the layer deposition, light
radiation, which is visible to the
human eye, is emitted by means of at least one illumination device (108) positioned on one side of the glass substrate (101); a first actual value for the transmission of the light
radiation is detected by means of a first sensor (109) on the other side of the glass substrate (101); the first actual value for the transmission is compared inside an evaluation device with a first
setpoint value for the transmission and, depending on said first comparison result, the
oxygen flow through the at least one inlet (106) into the working chamber is regulated, and wherein f) after the layer deposition but before reaching the first sensor (109), a second actual value for the temperature of the glass substrate (101) is detected by means of a second sensor (110), is compared with a second
setpoint value inside the evaluation device, and the
oxygen flow through the at least one inlet (106) into the working chamber is regulated depending on the second comparison result.