Manufacturing method of surface embossment grating structure

A technology of grating structure and manufacturing method, which is applied in the direction of diffraction grating, optics, optical elements, etc., can solve the problems of laser direct writing that cannot accurately control the contour depth, low work efficiency, contour depth error, etc., to reduce the exposure and development process, Increased productivity and wide-ranging effects
CN110632689AActive Publication Date: 2019-12-31AAC OPTICS (CHANGZHOU) CO LTD

Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
AAC OPTICS (CHANGZHOU) CO LTD
Publication Date
2019-12-31

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Abstract

The invention provides a manufacturing method of a surface embossment grating structure. The manufacturing method of a surface embossment grating structure comprises a grating mother board manufacturing process and a grating structure transferring process. In the grating mother board manufacturing process, a mother board coating process is added, and a metal film layer with the etching rate different from that of a substrate base material is selected. In the mother board etching process, the power of an ion beam can be controlled, and therefore, the etching depth of the substrate base materialcan be accurately controlled. The included angle between the emission line of the ion beam and one end surface of the developed substrate base material is not a right angle, so that the etching groove surface is inclined, and a grating mother board with a trapezoidal crack is obtained. The method has high ion beam etching efficiency, is suitable for large-area processing and mass production, andis widely applied. Compared with a laser direct writing method, ion beam etching parameters confirmed in advance are set, one-time forming is achieved, efficiency and controllability are high, the target grating structure can better meet the size requirement, and the operation is simpler.
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Description

【Technical field】

[0001] The invention relates to the field of grating production, in particular to a method for making a surface relief grating structure. 【Background technique】

[0002] Gratings are important components of various spectral analysis instruments, and are increasingly used in emerging fields such as metrology, imaging, information processing, inherited optics, and optical communications. In recent years, with the rapid development of semiconductor technology, a new type of optical application products has also developed, which is AR (Augmented Reality) products. AR is an augmentation of reality, a fusion of virtual images and real images. At present, head-mounted AR devices on the market mostly use the principle of optical projection, that is, the fusion of real scenes and virtual scenes is realized through lenses installed in front of the eyes. Among them, the Hololens product launched by Microsoft is currently on the market and has the best experience. I...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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