37 results about "Surface relief grating" patented technology

A head up display include an image source, and a waveguide. The waveguide has a first diffraction grating and a first end and a second diffraction grating at a second end. The waveguide is positioned as a combiner and allows viewing of an outside scene and information from the image source. The first and second diffraction gratings are surface relief gratings having a high index of modulation.

Calibration of holographic data storage systems (HDSS) is provided by utilizing holographic media (4) having calibration features which can be read, written, or read and written by a HDSS (30). Calibration features may represent for example, surface-relief gratings, holographic recordings, amplitude varying regions, or magnetic regions, or a combination thereof, at locations on or within the media. One or more of the calibration features along media region (302) are media calibration features with media and format information, and other calibration features along region (301) are system calibration features for optically and mechanically aligning HDSS optics. The media (4) may have performance calibration features along region (307) which can be recorded by a HDSS and then read back to determine characteristics of the media. Different HDSS systems can read the calibration features of the media (4) when installed in each HDSS to obtain information about the media, and to optically and mechanically align the media for optimal operation with the media.

In addition to having color, light waves have the attribute of polarization. An apparatus and method to convert circular polarized light into linearly polarized light over a wide range of wavelengths is provided by utilizing a first surface-relief grating functioning as a quarter-wave waveplate and a second surface-relief grating functioning as a half-wave waveplate. A plurality of such devices are arranged in a two-dimensional array and combined with an array of linear polarizers and an array of photodetectors to form a polarization imaging sensor. Such a sensor could have applications in automobiles to alert drivers of the presence of other vehicles, especially at night, in fog, or in rain. Military applications include the detection of vehicles placed among trees and shrubs. Another advantage of using circular polarization images is that the sign and magnitude of the circular polarization can potentially be used to reveal the spatial orientation, material, and surface roughness of the object's surface.

An ophthalmic endoilluminator is provided. The ophthalmic endoilluminator includes a light source, a first optical assembly, an optical coupling element, and an optical fiber having an optical grating located distally on the optical fiber, the optical fiber optically coupled to the optical coupling element. The first optical assembly receives and substantially collimates the white light. The optical coupling element receives the substantially collimated white light from the first optical assembly and directs the light to an optical fiber. The optical grating couples to the distal end of the optical fiber, the optical grating having a surface relief grating, and an overlayer optically coupled to the surface relief grating. The optical grating is operable to substantially diffract incident light into N diffraction orders, the N diffraction orders having a substantially uniform intensity.

A polarization-sensitive infrared image sensor (also termed a snapshot polarimeter) utilizing a 2-D array of polarizers to filter infrared light from a scene according to polarization, and a 2-D array of photodetectors (i.e. a focal plane array) to detect the filtered infrared light and generate polarization information which can be used to form a polarization-sensitive image of the scene. By forming each polarizer on an optical fiber in a fiber optic faceplate, the polarizers can be located facing a 2-D array of retarders to minimize diffraction effects of the infrared light. The optical fibers also guide the filtered infrared light to the photodetectors to reduce cross-talk in the polarization information. The polarizers can be formed as wire grid polarizers; and the retarders can be formed as subwavelength surface-relief gratings.

A spatial light modulator for modulating light field amplitude comprises a surface relief grating adapted to act as a diffractive lens, where a material is used to fill at least one groove of a surface grating structure, such that a controllable refractive index birefringence of the material inside the surface relief grating is controlled by an electric field, which leads to a controllable intensity at a fixed focal point.

An organic solar cell and a method of fabricating the same are provided. The organic solar cell includes a first electrode and a second electrode. An organic active layer is disposed between the first electrode and the second electrode. The organic active layer includes an concave-convex pattern in a surface adjacent to the second electrode. The concave-convex pattern may be formed by contacting an elastomer stamp and a top surface of the organic active layer. The elastomer stamp may be formed by molding using a template having a surface relief grating (SRG). The template may include a photoisomerization polymer layer, and the surface relief grating may be formed by irradiating interference light onto the photoisomerization polymer layer. The surface relief grating may be a blazed diffraction grating.

Photo-masks for fabricating surface-relief grating diffractive devices and methods of fabricating surface-relief grating diffractive devices are described. The photo-mask can include refractive elements and / or diffractive elements contained in or on a body element. The photo-mask can be used to simultaneously produce multiple surface-relief grating diffractive devices in a recording material. The photo-mask enables the surface-relief grating diffractive devices to be produced in large quantities while significantly reducing the cost and labor required.

The invention discloses a high photosynthetic efficiency holographic waveguide lens and an augmented reality display device. The high photosynthetic efficiency holographic waveguide lens comprises atleast one holographic waveguide lens unit, and the waveguide lens unit is composed of a waveguide substrate and two grating areas arranged on the waveguide substrate. No secondary turning needs to beperformed at the middle via a relay grating to transmit an optical signal, so that the difficulty of accurately matching phase conditions is greatly reduced, the gratings in the grating areas can adopt surface relief gratings and can be copied in batches through the nanoimprinting process. A reflecting element is placed on an emission end face of the holographic waveguide lens, so that the light originally lost from the end face continues to act with the emission grating, thereby effectively overcoming the shortcomings of low photosynthetic efficiency of the holographic waveguide. Furthermore,by means of the sizes of the two grating areas, the mutual distance, the structure of the gratings and the thickness size cooperation of a waveguide substrate, a function of once coupling in and multiple coupling output that is absent in the prior art can be achieved, and a pupil expansion function is achieved very conveniently.

A blade body component of a fishing lure formed from a material that includes a first side and a second side, wherein a surface relief grating image effect component is positioned on at least one side of the blade body component. In certain embodiments, the blade body component includes a curvature produced by a curving device. The blade body may be part of a quick change blade system that allows the user to quickly and easily remove and replace one or more of the blade body component on a fishing lure by using a combination of a quick change clevis and a clasp.

The invention discloses cyclic polymer and the preparation method thereof. The cyclic polymer is cyclic main chain phenylazo naphthalene polymer. Firstly, monomer EPNA is obtained through preparation, then thermocatalytic solid phase reaction is adopted for click reaction stepwise polymerization to the monomer EPNA, so as to obtain Alpha-azide group and Omega-alkynyl linear-PEPNA; and finally, ring closing reaction to linear-PEPNA is performed in extremely dilute solution through a nitrine / alkynyl CuAAC method, so as to obtain cyclic PEPNA. Compared with the linear polymer with the same molecular weight, the cyclic main chain phenylazo naphthalene polymer synthesized by using the method provided by the invention has the advantages of higher glass transition temperature (Tg), strong fluorescent emission, long fluorescence life time and deep groove depth of SRG (surface relief gratings).

Diffractive patterns are disposed on a MEMS substrate in the gaps between the MEMS micromirrors to reduce backreflection of light leaking through the gaps and reflected by the MEMS substrate. The diffractive patterns are silicon surface-relief diffraction gratings or silicon oxide gratings on silicon substrate. Sub-wavelength gratings are used to suppress higher orders of diffraction; 50% duty cycle surface relief gratings on a substrate having index of refraction close to 3 are used to suppress both reflected and transmitted zero orders of diffraction simultaneously. The gratings have lines running parallel or at a slight angle to the gaps, to prevent the diffracted light from re-entering the gaps.

Provided is a method of forming a fine pattern having a pattern dimension of 1 μm or less, repeatedly with reproducibility. The method of forming the fine pattern includes: forming an azobenzene-functionalized polymer film on an etched layer; irradiating the azobenzene-functionalized polymer film using an interference laser beam to form a patterned azobenzene-functionalized polymer film having fine-patterned surface relief gratings by a photophysical mass transporting of the azobenzene-functionalized polymer; etching the etched layer using the azobenzene-functionalized polymer film having the surface relief grating patterns as an etching mask; and removing the patterned azobenzene-functionalized polymer film.

Diffractive patterns are disposed on a MEMS substrate in the gaps between the MEMS micromirrors to reduce backreflection of light leaking through the gaps and reflected by the MEMS substrate. The diffractive patterns are silicon surface-relief diffraction gratings or silicon oxide gratings on silicon substrate. Sub-wavelength gratings are used to suppress higher orders of diffraction; 50% duty cycle surface relief gratings on a substrate having index of refraction close to 3 are used to suppress both reflected and transmitted zero orders of diffraction simultaneously. The gratings have lines running parallel or at a slight angle to the gaps, to prevent the diffracted light from re-entering the gaps.

An imageguide comprising glass or plastic planer substrate, a first hologram area, a second hologram area, and a third hologram area which are formed on the substrate as surface relief grating, period and direction of diffraction structure of the first, second, and third hologram areas have a relationship which is a sum of grating vectors of the first, second, and third hologram areas becomes zero, depth of diffraction structure on the first hologram area is a uniform in the own hologram area, and depth of diffraction structure on the second or third hologram area is chirped in the own hologram area increases luminance and uniformity of virtual image.

The present invention is directed to a film forming, photoactive, homogeneously mixed material comprising a complex prepared from (a) at least one ionic photosensitive compound which may undergo a photoreaction, selected from photoisomerizations, photocycloadditions and photoinduced rearrangements, and / or (a′) at least one photosensitive polyelectrolyte (“second polyelectrolyte”) carrying residues which may undergo said photoreaction, and (b) at least one (“first”) polyelectrolyte carrying charges which are opposite to those of the active groups of the photosensitive material. This material has unique photochemical properties in that non-scattering, optically clear films may prepared therefrom which allow light-induced generation of optical anisotropy and of topological surface structures, e.g. such as surface relief gratings (SRG).

The invention discloses an azo polyarylether rare earth complex material as well as a preparation method and an application thereof, and belongs to the technical field of polymer materials. The azo polyarylether rare earth complex is obtained by utilizing an azo polyarylether copolymer with carboxyl as a macromolecular ligand, utilizing phenanthroline as a co-ligand and carrying out ion coordination synthesis on the macromolecular ligand and the co-ligand with rare earth europium or terbium. The polyarylether copolymer is prepared by performing nucleophilic polycondensation on azo bisphenol monomer, difluoro monomer and 4, 4'-dihydroxy triphenyl methane-2-carboxylic acid bisphenol monomer as raw materials. The azo polyarylether rare earth complex material can be used for preparing surface relief gratings or fluorescent patterns, and the colors of the fluorescent patterns can be changed by changing the category of the rear earth ions. The prepared azo polyarylether rare earth complex fluorescent patterns have an application prospect in holographic storage and light emitting devices.

A surface relief grating (SRG) image machining process and / or product. For the SRG image machining process a material and a cutting tool are provided. The material is contacted by the cutting tool to a predetermined depth. The cutting tool is rotated to cut the material at a predetermined rotational speed. The cutting tool is moved to cut the material at a predetermined travel speed. A SRG image effect is produced in the material through the contacting, rotating, and moving steps. A product with a SRG image effect has a surface with rotational cuts effected therein to create the SRG image effect. The SRG image has an effect based on a rotational speed of a cutting tool effecting the cuts, a travel speed of a cutting tool effecting the cuts, and a depth of the cuts. A light source can be used to emit light on the surface of the product.

The invention provides a manufacturing method of a surface embossment grating structure. The manufacturing method of a surface embossment grating structure comprises a grating mother board manufacturing process and a grating structure transferring process. In the grating mother board manufacturing process, a mother board coating process is added, and a metal film layer with the etching rate different from that of a substrate base material is selected. In the mother board etching process, the power of an ion beam can be controlled, and therefore, the etching depth of the substrate base materialcan be accurately controlled. The included angle between the emission line of the ion beam and one end surface of the developed substrate base material is not a right angle, so that the etching groove surface is inclined, and a grating mother board with a trapezoidal crack is obtained. The method has high ion beam etching efficiency, is suitable for large-area processing and mass production, andis widely applied. Compared with a laser direct writing method, ion beam etching parameters confirmed in advance are set, one-time forming is achieved, efficiency and controllability are high, the target grating structure can better meet the size requirement, and the operation is simpler.

The invention relates to a new fixing method of surface relief gratings on an azo polymer film. The fixing method of surface relief gratings on the azo polymer film is realized by introducing an N-hydroxy succinimide carboxylic ester group into an azo polymer and reacting with a diamine or polyamine solution. The fixing method for SRGs on the azo polymer film is mild in conditions, fast in speed and small in reaction system toxicity, the fixed SRGs structure is not influenced and has the advantages of good thermal stability and solvent resistance, and the like. The fixed surface relief gratings have wide application prospect in the fields such as optical storage, micro / nanofabrication, chemical sensors and the like.

The invention discloses a genetic algorithm-based optimization method of multi-piece inclined surface relief tiled grating and an inclined surface relief grating waveguide display system. The optimization method comprises the following steps of selecting an optimization target and to-be-optimized grating structure parameters, and determining a fitness function of a genetic algorithm; initializinga group, namely, randomly generating multiple groups of grating structure parameters; calculating the fitness of individuals and the average fitness of the group according to the fitness function; generating a next-generation group; judging whether a program is terminated or not, and finding out the grating structure parameters corresponding to the minimum fitness values of the individuals in allgenerations. According to the inclined surface relief grating waveguide display system, three pieces of inclined surface relief gratings are horizontally tiled, and the morphologies of the three pieces of the inclined surface relief gratings are calculated by the optimization method. The inclined surface relief grating waveguide display system has the advantages that while a view field angle is increased, high brightness and good uniformity of the system are ensured.

The invention belongs to the polymer material preparation field, particularly relates to a polyarylether material containing azo groups and fluorescent groups, and a method for preparing azo fluorescent polyarylether films, and the application in the aspect of preparing surface relief gratings and fluorescence patterns. The polyarylether material component and the polymer with a side chain containing carboxyl or sulfo in accordance with the mass mixture ratio: the polymer containing azo groups : fluorescent groups is equal to 78-94:20-5:2-0.5. The invention rotatablely coats the guest-host type azo fluorescent polymer containing azo groups and fluorescent groups on a substrate, and can form light-induced surface gratings in the polarized laser irradiation. Excited by ultraviolet light, regular fluorescence patterns can be observed by a fluorescence microscope or confocal fluorescence microscope. The color of the fluorescence patterns can be changed by altering the type of a fluorescent chromophore.

The invention belongs to the field of biosensors, and particularly relates to a subwavelength grating-based ultra-sensitive refractive index optical biosensor which comprises a quartz substrate, and a gold film, a fluorine-containing polymer Cytop film layer and a grating waveguide layer which are sequentially arranged on the quartz substrate. The grating waveguide layer is a surface relief grating structure made of a silicon nitride material. And a liquid sample to be detected covers the grating waveguide layer. According to the invention, the fluorine-containing polymer Cytop film is inserted between the grating and the metal film, the extremely narrow full width at half maximum of guided-mode resonance is realized, and calculation shows that the thickness of the film is changed, the influence on an incident resonance angle is small, but the full width at half maximum can be greatly improved and is about 0.0005 degrees, and the refractive index change is-4 * 10 <-5 >so that the sensitivity of the sensor can be greatly improved.

Photo-masks for fabricating surface-relief grating diffractive devices and methods of fabricating surface-relief grating diffractive devices are described. The photo-mask can include refractive elements and / or diffractive elements contained in or on a body element. The photo-mask can be used to simultaneously produce multiple surface-relief grating diffractive devices in a recording material. The photo-mask enables the surface-relief grating diffractive devices to be produced in large quantities while significantly reducing the cost and labor required.

Provided is a method of forming a fine pattern having a pattern dimension of 1 μm or less, repeatedly with reproducibility. The method of forming the fine pattern includes: forming an azobenzene-functionalized polymer film on an etched layer; irradiating the azobenzene-functionalized polymer film using an interference laser beam to form a patterned azobenzene-functionalized polymer film having fine-patterned surface relief gratings by a photophysical mass transporting of the azobenzene-functionalized polymer; etching the etched layer using the azobenzene-functionalized polymer film having the surface relief grating patterns as an etching mask; and removing the patterned azobenzene-functionalized polymer film.

The present invention is directed to a film forming, photoactive, homogeneously mixed material comprising a complex prepared from (a) at least one ionic photosensitive compound which may undergo a photoreaction, selected from photoisomerizations, photocycloadditions and photoinduced rearrangements, and / or (a') at least one photosensitive polyelectrolyte (''second polyelectrolyte'') carrying residues which may undergo said photoreaction, and (b) at least one (''first'') polyelectrolyte carrying charges which are opposite to those of the active groups of the photosensitive material. This material has unique photochemical properties in that non-scattering, optically clear films may prepared therefrom which allow light-induced generation of optical anisotropy and of topological surface structures, e.g. such as surface relief gratings (SRG).

The invention discloses a preparation method and application of a surface-deformable nano-composite film, relates to the technical field of surface relief periodic structure manufacturing and optical information storage, and solves the problem that noble metal nanoparticles are required to be introduced into a preparation method of a surface-deformable polymer system. The preparation method comprises the steps: preparing a polymer aqueous solution, wherein the polymer has hydroxyl functional groups; preparing a silver nitrate aqueous solution with the concentration of 0.05 mol / L to 0.2 mol / L; mixing the silver nitrate aqueous solution and the polymer aqueous solution according to a volume ratio of 1:0.5-1:4 to obtain an AgNO3 / polymer mixed solution; and dispensing the mixed solution on a glass substrate, and carrying out preheating treatment to obtain the polymer film containing a silver core. The thin film prepared by the preparation method is high in light energy conversion efficiency, and preparation of a surface relief grating and a complex periodic micro / nano structure can be realized; the method can also be used for holographic optical storage, ultra-high-density data storage is achieved through the rotation multiplexing technology, and the storage time is long.