Method for depositing perovskite film on hydrophobic hole transport layer
A technology of hole transport layer and perovskite, which is applied in the direction of electrical components, circuits, electric solid devices, etc., can solve the problems of deteriorating luminescent properties, poor compatibility, unfavorable perovskite crystallization and film formation, etc., and achieve improved fluorescence production The effect of high efficiency, wettability improvement, high quality and rapid preparation
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[0028] The above solution will be further described below in conjunction with specific implementation examples. The preferred embodiments of the present invention are described in detail as follows:
[0029] In this embodiment, a method for depositing a perovskite film on a hydrophobic hole transport layer includes the following steps:
[0030] a. Preparation of hole transport layer solution:
[0031] Using poly(9,9-dioctylfluorene-CO-N-(4-butylphenyl)diphenylamine) (TFB) and polyvinylcarbazole (PVK) as raw materials, weigh the masses of PVK and TFB respectively 6 and 4 mg, dissolved in 1ml of chlorobenzene solvent to obtain a raw material mixture, use a stirrer to stir the raw material mixture for 2 hours, and then use a 0.45μm polytetrafluoroethylene filter to filter the raw material mixture to obtain a uniform mixture PVK: TFB solution, spare;
[0032] b. Preparation of PVP solution:
[0033] Dissolve PVP in absolute ethanol to make the concentration of PVP 1.5mg / ml, as a modifier ...
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