A method of laser processing a single-pointed cone of a cathode emitter
A cathode emission and laser processing technology, which is applied in the field of material processing, can solve the problems of poor environmental protection and low efficiency, and achieve the effects of high-efficiency processing, controllable curvature radius, and no pollution in the processing process
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Embodiment 1
[0024] This embodiment provides a method for processing single-tip cones of lanthanum hexaboride cathode emitters by laser, which can prepare single-tip cones of lanthanum hexaboride cathode emitters with a radius of curvature in submicron order, and the radius of curvature can be controlled. Including the following steps:
[0025] (1) Femtosecond laser (240fs, 800nm) beam 1 is focused by focusing lens 2 (f=100mm) to form a focused beam 3;
[0026] (2) Install the lanthanum hexaboride cathode emitter 4 (φ10mm×50mm) on the rotatable movement device 5, the rotatable movement device 5 has a two-dimensional rotation mechanism, which can realize the high-speed rotation movement of the lanthanum hexaboride cathode emitter 4 And the angle adjustment between the lanthanum hexaboride cathode emitter 4 and the focused beam 3;
[0027] (3) The rotational speed of the rotatable motion device 5 is set at 100 r / min, and the rotatable motion device 5 is adjusted so that it is 30° to the cen...
Embodiment 2
[0030] This embodiment provides a laser machining method for a tungsten cathode emitter single-tip cone, which can prepare a lanthanum hexaboride cathode emitter single-tip cone with a radius of curvature at the submicron level, and the radius of curvature can be controlled. Including the following steps:
[0031] (1) After the picosecond laser (3fs, 1030nm) beam 1 is focused by the focusing lens 2 (f=150mm), a focused beam 3 is formed;
[0032] (2) Install the tungsten cathode emitter 4 (φ10mm×40mm) on the rotatable motion device 5, the rotatable motion device 5 can realize the high-speed rotary motion of the tungsten cathode emitter 4, and set the rotational speed of the rotatable motion device 5 to 200r / min;
[0033] (3) The focused beam 3 has a tilting and rotating function, and the tilting angle of the focused beam 3 is adjusted so that its central axis and the rotation axis of the tungsten cathode emitter 4 are 45°;
[0034] (4) Using the focused beam 3 to remove materi...
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