Preparation and application of hydrophobic Schiff base cobalt-beta cyclodextrin-graphene porous carbon composite material
A technology of β-cyclodextrin and Schiff base cobalt, which is applied in the field of hydrophobic Schiff base cobalt@β-cyclodextrin-graphene porous carbon composite materials and its preparation, can solve the problem that cobalt oxide cannot be anchored in it, and cannot Solve the problems of agglomeration and not significantly improve the specific capacitance of electrode materials, achieve the effect of multiple active sites, low price, and avoid agglomeration of cobalt oxides
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment
[0037] A method for preparing a hydrophobic Schiff base cobalt@β cyclodextrin-graphene porous carbon composite material, comprising the following steps:
[0038] 1) Preparation of 5-chlorosalicylaldehyde dicyandiamide Schiff base cobalt, dissolving dicyandiamine, 5-chlorosalicylaldehyde, and cobalt acetate tetrahydrate in 5ml with a mass ratio of 0.4204:1.57:1.254 , 20ml and 5ml of methanol solution to prepare dicyandiamine solution, 5-chlorosalicylaldehyde solution and cobalt acetate tetrahydrate solution, then mix the three solutions evenly and carry out hydrothermal reaction at 120°C for 12h, after the reaction is completed After filtering, washing and drying, black solid powder 5-chlorosalicylaldehyde dicyandiamide Schiff base cobalt was obtained;
[0039] 2), the preparation of the hydrophobic Schiff base cobalt-β-cyclodextrin-graphene, with a volume ratio of 2:1, deionized water and ethanol are prepared as a mixed solvent, and then the mass ratio of 2:5.67:0.005 is the s...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com