a porous worm 3 Preparation method, product and application of electrochromic thin film
An electrochromic and thin film technology, applied in electrolytic coating, surface reaction electrolytic coating, vacuum evaporation coating, etc., can solve the problem of oxidation voltage and oxidation time remaining on the surface of the film, the influence of electrochromic film performance oxidation time, and film oxidation. Excessive and other problems, to achieve the effect of color change reaction, porosity and pore size controllable, fast coloring and fading
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Embodiment 1
[0028] (1) Select ITO transparent conductive glass as the substrate, ultrasonically clean it in acetone, absolute ethanol, and deionized water for 10 minutes, then dry it with high-pressure nitrogen, and place it on the sample stage of the magnetron sputtering vacuum chamber. A tungsten target with a purity of 99.99% was used as the sputtering target.
[0029] (2) Vacuum the background to 10 -3 Pa; Introduce high-purity argon gas with a flow rate of 12 sccm, and adjust the working pressure to 1.0 Pa; after the gas flow is stable, start the tungsten sputtering target, control the sputtering power by adjusting the sputtering current of the tungsten target, and set the sputtering power to Set at 50W, block the substrate with a baffle and start pre-sputtering for 20 minutes, then remove the baffle and start depositing a metal W film. After 50 minutes of deposition, a metal W film is obtained on the ITO transparent conductive glass, and turn off the power of the tungsten sputtering...
Embodiment 2
[0033] Same as Example 1, the difference is that 20V DC voltage is directly used for pole oxidation for 50min.
Embodiment 3
[0035] Same as Example 1, the difference is that after the first stage and the second stage of anodic oxidation, they are ultrasonically cleaned with absolute ethanol and deionized water for 10 minutes and then taken out.
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