Array chip mass spectrometry analysis method of photoelectrochemical reaction intermediate
An array chip, chemical reaction technology, applied in the field of mass spectrometry analysis, can solve problems such as difficult detection, restricting the development of photoelectric catalysis theory, catalyst development, short life of intermediates, etc., to achieve the effect of in-situ analysis, avoiding delay and avoiding influence
Inactive Publication Date: 2020-04-10
FUDAN UNIV
5 Cites 0 Cited by
AI-Extracted Technical Summary
Problems solved by technology
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreAbstract
The invention discloses an array chip mass spectrometry analysis method of a photoelectrochemical reaction intermediate. According to the array chip mass spectrometry analysis method, inorganic materials such as titanium dioxide and graphene with semiconductor properties or photocatalytic performance are used for modifying insulating plastics such as glass and polyimide to form a photocatalyst-modified microarray chip; then a substrate for photoelectrochemical reaction is dropwise added on the chip, and a photoelectrochemical reaction is induced by utilizing illumination. After the reaction iscarried out for a period of time, a sample point is detected by utilizing an electrostatic spray ionization mass spectrometry technology, so as to realize photoelectrochemical reaction intermediate analysis.
Application Domain
Technology Topic
Image
Examples
- Experimental program(2)
Example
Example Embodiment
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more PUM
Property | Measurement | Unit |
Thickness | 10.0 | µm |
Thickness | 100.0 | µm |
Diameter | 0.2 | mm |
tensile | MPa | |
Particle size | Pa | |
strength | 10 |
Description & Claims & Application Information
We can also present the details of the Description, Claims and Application information to help users get a comprehensive understanding of the technical details of the patent, such as background art, summary of invention, brief description of drawings, description of embodiments, and other original content. On the other hand, users can also determine the specific scope of protection of the technology through the list of claims; as well as understand the changes in the life cycle of the technology with the presentation of the patent timeline. Login to view more.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more Similar technology patents
Train-ground data communication method
ActiveCN102355496AAvoid blockingAvoid delayWireless commuication servicesData switching networksData securityLow complexity
Owner:INST OF COMPUTING TECH CHINA ACAD OF RAILWAY SCI +2
Retrieval of user equipment capabilities by application server
ActiveUS20130150052A1Avoid delayAssess restrictionConnection managementApplication serverWireless network
Owner:SAMSUNG ELECTRONICS CO LTD
Display panel with signal transmission patterns
InactiveUS20050190175A1Avoid delayEasy to carryPrinted circuit assemblingCathode-ray tube indicatorsGate driverLiquid-crystal display
Owner:SAMSUNG ELECTRONICS CO LTD
Method for sending information in a telecommunication system
InactiveUS6870876B1Fast estimationAvoid delayHybrid switching systemsTime-division multiplexTransceiverDigital signal
Owner:TELEFON AB LM ERICSSON (PUBL)
Classification and recommendation of technical efficacy words
- Avoid delay
Production scheduling management system, and method of managing production scheduling
InactiveUS6438436B1Avoid delayImprove efficiencySemiconductor/solid-state device manufacturingTechnology managementWork periodWork scheduling
Owner:KK TOSHIBA
Incident command post
ActiveUS20060217881A1Improves communicationAvoid delayInstruments for road network navigationRoad vehicles traffic controlEnvironmental sensorMultiple input
Owner:SAP AG
Sterilized moist snuff and method
InactiveUS20080156338A1Avoid delayReduce productionTobacco preparationTobacco treatmentFlavorTobacco product
Owner:PHILIP MORRIS USA INC
Proxy system, method and computer program product for utilizing an identifier of a request to route the request to a networked device
ActiveUS8996610B1Avoid delayReduce numberMultiple digital computer combinationsStructured data retrievalIp addressComputer program
Owner:SALESFORCE COM INC