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Texturing and cleaning method and heterojunction battery

A technology for making texture and silicon wafers, which is applied in the fields of circuits, photovoltaic power generation, electrical components, etc. It can solve the problems of poor quality of texture and achieve the effect of high cost, low cost of chemicals, and large amount of use

Active Publication Date: 2020-08-07
CHANGZHOU S C EXACT EQUIP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In order to solve the defect of poor suede quality in the existing process, the present invention proposes a suede cleaning method and a heterojunction battery, which has the advantages of low cost, good suede consistency, and more environmental protection

Method used

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  • Texturing and cleaning method and heterojunction battery

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Embodiment approach

[0043] Then the silicon wafer is oxidatively cleaned, the silicon wafer is soaked in an oxidative cleaning solution, and the cleaning solution reacts with the surface of the silicon wafer to form a uniform oxide layer of about 10 angstroms on the surface of the silicon wafer again. Specifically, there are two implementations for oxidative cleaning of silicon wafers. The first implementation includes: oxidative cleaning of silicon wafers with a mixed solution containing ozone and hydrochloric acid, and the concentration of ozone in the mixed solution containing ozone and hydrochloric acid The concentration of hydrochloric acid is 10PPM-20PPM, the concentration of hydrochloric acid is 0.01%-0.5%, the balance is deionized water, the temperature of the mixed solution is room temperature, and the reaction time is 90s-180s.

[0044] The second embodiment includes: using a mixed solution containing potassium hydroxide and hydrogen peroxide to oxidatively clean the silicon wafer. The c...

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Abstract

The invention discloses a texturing and cleaning method and a heterojunction battery. The texturing and cleaning method comprises the following steps: 1, pretreating a silicon wafer by using a mixed solution containing ozone, and generating an oxide layer for attaching pollutants on the surface of the silicon wafer in the pretreatment process; 2, removing an oxide layer on the surface of the silicon wafer through alkali liquor; 3, carrying out oxidative cleaning on the silicon wafer after water washing, and generating an oxide layer on the surface of the silicon wafer again in the cleaning process; 4, texturing the silicon wafer through alkali liquor; 5, washing the silicon wafer for at least one time; 6, decontaminating the silicon wafer by using alkali liquor containing hydrogen peroxide; 7, after water washing, carrying out rounding treatment on the surface of the silicon wafer by using an ozone-containing acid solution; 8, performing acid washing on the silicon wafer after water washing; and 9, drying the silicon wafer after water washing. The texturing and cleaning method and the heterojunction battery have the advantages of being low in cost, good in suede consistency, more environmentally friendly and the like.

Description

[0001] This application claims the priority of the Chinese patent application submitted to the China Patent Office on November 20, 2019, with the application number "2019111433127" and the application title "A Textile Cleaning Method and Heterojunction Battery", the entire content of which is passed References are incorporated in this application. technical field [0002] The invention relates to the technical field of solar photovoltaic cells, in particular to a cleaning method for making texture and a heterojunction cell. Background technique [0003] Heterojunction cells are a type of high-efficiency photovoltaic solar cells. Compared with traditional crystalline silicon photovoltaic solar cells, heterojunction cells are more and more popular in the market because of their higher conversion efficiency. However, heterojunction cells have relatively high requirements for each process in the manufacturing process, specifically referring to the requirements for cleanliness, s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/02H01L31/18H01L31/0236H01L31/072
CPCH01L21/02057H01L21/02082H01L31/1804H01L31/02363H01L31/072Y02E10/50Y02P70/50
Inventor 左国军谢毅任金枝刘正新
Owner CHANGZHOU S C EXACT EQUIP
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