Nonplanar patterned nanostructured surface and printing methods for making thereof

A non-planar, patterned technology, applied in the field of layout of patterned elements, can solve problems such as long patterning time, limited size and pattern geometry, excessive feature structure, etc.

Inactive Publication Date: 2020-08-14
3M INNOVATIVE PROPERTIES CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method is fundamentally a turning operation, which limits the size and pattern geometry of structures that can be reproducibly cut into the surface of non-planar substrates such as cylindrical tool rolls.
[0002] To create nanometer-sized (greater than about 10 nm and less than about 1 micron) features and patterns on non-planar surfaces, lithography and laser ablation can be used, but these techniques produce features that are too large for the pattern geometry to provide. Limited options, or require unacceptably long patterning times

Method used

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  • Nonplanar patterned nanostructured surface and printing methods for making thereof
  • Nonplanar patterned nanostructured surface and printing methods for making thereof
  • Nonplanar patterned nanostructured surface and printing methods for making thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0089] A silver-plated PET film was wrapped on the surface of the cylindrical roll. A PDMS stamp having dimensions of about 2 cm x 3 cm was impregnated with a solution of 10 mM thiol in ethanol, and the solution was allowed to penetrate into the stamp for about 30 minutes to 10 hours.

[0090] Attach the impression to the Figure 2A to Figure 2B The vacuum chucks in the imprint module are schematically shown in . Using an optical alignment method, align the tool to the tool coordinate system. Coordinates the surface velocity of the planar impression and tool substrate while actively maintaining alignment.

[0091] After initiation of contact between the stamp and tool substrate, a substantially constant contact force is maintained at the interface between the stamp surface and the non-planar surface, and when the stamp surface and the non-planar surface are in contact with each other, the interface is allowed to The contact pressure is varied until the entire stamp has been...

Embodiment 2

[0095] A tool layer of 1 μm diamond-like carbon (DLC) was coated onto the silicon wafer, followed by a 50 nm printed layer of gold.

[0096] Nanoscale patterns were hand-imprinted onto the printed layer, followed by chemical etching with a ferric nitrate / thiourea solution.

[0097] Then, include O 2 and C 6 f 14 Reactive ion etching (RIE) equipment of etching gas processes the printed wafer, where the gold printed layer is used as a mask.

[0098] Figure 8 The final structure in the DLC tools layer is shown in .

Embodiment approach A

[0100] Embodiment A. A method of applying a pattern to a non-planar surface, wherein at least a portion of the non-planar surface has a radius of curvature, the method comprising:

[0101] A stamp is provided having a major surface comprising a relief pattern of pattern elements extending away from a base surface, wherein each pattern element comprises an embossed surface with a lateral dimension greater than 0 and less than about 5 microns, and wherein the embossed a surface comprising ink having functionalized molecules having functional groups chemically bonded to said non-planar surface;

[0102] positioning the stamp to induce rolling contact between the non-planar surface and the major surface of the stamp;

[0103] contacting the embossed surface of the pattern element with the non-planar surface to form a self-assembled monolayer (SAM) of the functionalized molecules on the non-planar surface and impart to the non-planar surface arrangement of pattern elements; and

...

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Abstract

The invention provides a method of applying a pattern to a nonplanar surface. A stamp has a major surface with pattern elements having a lateral dimension of greater than 0 and less than about 5 microns. The major surface of the stamp has a functionalizing molecule with a functional group selected to chemically bind to the nonplanar surface. The stamp is positioned to initiate rolling contact withthe nonplanar surface, and contacts the nonplanar surface to form a self-assembled monolayer (SAM) of the functionalizing material thereon and impart the arrangement of pattern elements thereto. Themajor surface of the stamp is translated with respect to the nonplanar surface such that: a contact force is controlled at an interface between the stamping surfaces and the nonplanar surface, and thecontact pressure at the interface is allowed to vary while the stamping surfaces and the nonplanar surface are in contact with each other.

Description

Background technique [0001] Cylindrical tool rolls are used in a variety of industrial operations, especially in roll-to-roll manufacturing. Microstructured cylindrical tool rolls comprising structured patterns with length scales on the order of one micron and above can be fabricated using a diamond turning machine that cuts copper on a precision lathe using diamond-tipped tools. However, this method is fundamentally a turning operation, which limits the size and pattern geometry of structures that can be reproducibly cut into the surface of non-planar substrates such as cylindrical tool rolls. [0002] To create nanometer-sized (greater than about 10 nm and less than about 1 micron) features and patterns on non-planar surfaces, lithography and laser ablation can be used, but these techniques produce features that are too large for the pattern geometry to provide. Choices are limited, or unacceptably long patterning times are required. [0003] Microcontact printing can be u...

Claims

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Application Information

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IPC IPC(8): B41C1/18B41F17/00B41F3/26B41K3/26B41M1/00B81C1/00
CPCB41K3/26B41F17/22B41C1/184B41C1/003
Inventor 詹姆斯·朱卡尔·K·斯腾斯瓦德丹尼尔·M·伦茨托马斯·J·梅茨勒莫塞斯·M·大卫
Owner 3M INNOVATIVE PROPERTIES CO
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