Vacuum coating equipment and vacuum coating method

A technology of vacuum coating and equipment, applied in vacuum evaporation coating, sputtering coating, ion implantation coating and other directions, can solve the problem of low molecular energy, achieve compact structure, optimize mechanical properties, and improve mechanical properties.

Inactive Publication Date: 2020-08-25
SHANGHAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] In order to solve the problems of the prior art, the purpose of the present invention is to overcome the deficiencies of the prior art, provide a vacuum coating equipment and vacuum coating method, use the pressure differenc

Method used

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  • Vacuum coating equipment and vacuum coating method

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0042] Example one:

[0043] In this embodiment, as figure 1 As shown, a vacuum coating equipment includes a coating vacuum chamber 1, an evaporation source 3, a sample table 5, a heating source 6, and an air extraction system. The sample table 5 is set in the coating vacuum chamber 1, and the heating source 6 is directed to the coating vacuum chamber 1. Output heat to control the temperature of the sample stage 5 and the substrate set on the sample stage 5; a small vacuum chamber 2 connected to the coating vacuum chamber 1 is also provided, and the coating vacuum chamber 1 and the small vacuum chamber 2 are nested and connected , The small vacuum chamber 2 is set in the coating vacuum chamber 1; the evaporation source 3 is set in the small vacuum chamber 2. The pumping system includes a mechanical pump 10 and a molecular pump 11. The mechanical pump 10 is connected to the coating vacuum through a rough pumping valve 12, respectively. Chamber 1 and small vacuum chamber 2 are co...

Example Embodiment

[0076] Embodiment two:

[0077] This embodiment is basically the same as the first embodiment, and the special features are:

[0078] In this embodiment, a vacuum coating method using the first vacuum coating equipment of this embodiment includes the following steps:

[0079] a. Cleaning the substrate:

[0080] Use the pre-cleaned silicon wafer or cemented carbide plate as the substrate, put it in acetone, ethanol, and deionized water for ultrasonic cleaning for 10 minutes each, and then dry it with nitrogen;

[0081] b. Place the substrate:

[0082] Place and transfer the cleaned substrate to the coating vacuum chamber 1 and set it on the sample stage 5, and connect the sample stage 5 to the negative bias power supply;

[0083] c. Load preparation materials:

[0084] Transfer the cleaned sample to the small vacuum chamber 2, put the fullerene powder into the evaporation boat, fix it, and then put it into the small vacuum chamber 2 together;

[0085] d. Vacuum coating:

[0086] Turn on the p...

Example Embodiment

[0090] Embodiment three:

[0091] This embodiment is basically the same as the previous embodiment, and the special features are:

[0092] In this embodiment, a vacuum coating method using the first vacuum coating equipment of this embodiment includes the following steps:

[0093] a. Cleaning the substrate:

[0094] Use the pre-cleaned sapphire substrate as the substrate, put it in acetone, ethanol, and deionized water for ultrasonic cleaning for 10 minutes each, and then dry it with nitrogen;

[0095] b. Place the substrate:

[0096] Place and transfer the cleaned substrate to the coating vacuum chamber 1 and set it on the sample stage 5, and connect the sample stage 5 to the negative bias power supply;

[0097] c. Load preparation materials:

[0098] Transfer the cleaned sample to the small vacuum chamber 2, put the fullerene powder into the evaporation boat, fix it, and then put it into the small vacuum chamber 2 together;

[0099] d. Vacuum coating:

[0100] Turn on the pumping system, p...

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Abstract

The invention discloses vacuum coating equipment and a vacuum coating method. The vacuum coating equipment comprises a coating vacuum chamber, an evaporation source, a sample table, a heating source and an air exhaust system, the vacuum coating equipment is also provided with a small vacuum chamber communicating with the coating vacuum chamber, and the coating molecular or atomic kinetic energy isimproved by utilizing the pressure difference, so that the mechanical property of a thin film is improved. The vacuum coating method comprises the steps of cleaning a substrate, placing a base plate,loading a preparation material, performing vacuumizing coating, and performing annealing. According to the vacuum coating equipment and the vacuum coating method, the pressure difference between thetwo connected vacuum chambers is utilized to provide additional directional kinetic energy for coating molecules, and the combination of a radio frequency power supply and a bias power supply can be utilized to provide assistance in deposition when necessary. A new method for optimizing the mechanical property of the vacuum thin film by improving the hardness of the thin film by adding directionalmolecular or atomic kinetic energy is provided, and the method is expected to provide a new way for improving the mechanical property of the vacuum thin film. The preparation method is simple, easy to operate, low in cost and suitable for popularization and application.

Description

technical field [0001] The invention relates to a film preparation device and a preparation method, in particular to a device and a process for improving mechanical properties such as film hardness, which are applied in the technical field of physical vapor deposition. Background technique [0002] The research of thin films depends on the preparation equipment and technology of thin films. High-quality thin films are conducive to the research of thin film physics and the development of thin film device applications. With the application of laser technology, microwave technology and ion beam technology, people have developed a variety of thin film preparation technologies and methods. [0003] Thin film preparation technology is divided into two categories, the first category is PVD, that is, physical vapor deposition, including vacuum evaporation method, magnetron sputtering method, ion plating and so on. The basic principle of vacuum evaporation is to evaporate metals, me...

Claims

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Application Information

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IPC IPC(8): C23C14/24C23C14/54
CPCC23C14/228C23C14/24C23C14/54
Inventor 陈益钢程竞经
Owner SHANGHAI UNIV
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