Three-dimensional continuous network hydrophilic boron-doped diamond radiator and preparation method and application thereof
A continuous network and three-dimensional network technology, applied in the field of thermal management equipment, can solve the problems of insufficient hydrophilicity of diamond and affect heat dissipation efficiency, and achieve the effects of maintaining thermal conductivity, improving heat dissipation efficiency, and improving wettability
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Embodiment 1
[0045] The foamed Cu substrate (30PPI) was subjected to acetone (CH 3 COCH 3 ) ultrasonic cleaning, ethanol (C 2 h 5 OH) ultrasonic cleaning and deionized water ultrasonic cleaning for 10 min each. Then a W transition layer was sputtered on its surface by vacuum evaporation method, wherein the thickness of the W transition layer was 100nm; then the copper substrate was placed in the nano-diamond suspension and seed crystals were ultrasonically planted for 30 minutes to enhance nucleation. Finally, ultrasonically rinsed with deionized water for 10 min, and dried for later use.
[0046] (2) Then adopt chemical vapor deposition to carry out the deposition of diamond film on the foamed Cu substrate that is adsorbed with nano-diamond particles, diamond deposition process: adopt hot wire CVD to deposit three-dimensional continuous network diamond on the surface of foam substrate, used hot wire is The straight tungsten wire is used to completely cover the straight wire directly ...
Embodiment 2
[0050] (1) The foamed Cu substrate (50PPI) was subjected to acetone (CH 3 COCH 3 ) ultrasonic cleaning, ethanol (C 2 h 5 OH) ultrasonic cleaning and deionized water ultrasonic cleaning for 10 min each. Then magnetron sputtering was used to sputter a Cr film on its surface, wherein the thickness of the Cr film was 100nm; then the copper substrate was placed in the nano-diamond suspension and seed crystals were planted ultrasonically for 30 minutes to enhance the nucleation. Finally, ultrasonically rinsed with deionized water for 10 min, and dried for later use.
[0051] (2) Then adopt chemical vapor deposition to carry out the deposition of diamond film on the foamed Cu substrate that is adsorbed with nano-diamond particles, the process of diamond deposition: adopt hot wire CVD to deposit three-dimensional continuous network diamond on the foam substrate surface, used hot wire is The straight tungsten wire is used to completely cover the straight wire directly above the su...
Embodiment 3
[0055] (1) The foamed Cu substrate (70PPI) was subjected to acetone (CH 3 COCH 3 ) ultrasonic cleaning, ethanol (C 2 h 5 OH) ultrasonic cleaning and deionized water ultrasonic cleaning for 10 min each. Then magnetron sputtering was used to sputter a Cr film on its surface, wherein the thickness of the Cr film was 100nm; then the copper substrate was placed in the nano-diamond suspension and seed crystals were planted ultrasonically for 30 minutes to enhance the nucleation. Finally, ultrasonically rinsed with deionized water for 10 min, and dried for later use.
[0056] (2) The hot wire used in this paper is The straight tungsten wire is used to completely cover the straight wire directly above the substrate, and then the pretreated substrate is put into the cavity of the HFCVD equipment, and the distance between the hot wire and the substrate is adjusted (8mm). After the installation is completed, close the hatch to vacuumize, and then pass in hydrogen and methane accordi...
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