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Preparation method of super-sliding block

An ultra-slippery, slider technology used in the manufacture of microstructure devices, processes for creating decorative surface effects, piezoelectric/electrostrictive or magnetostrictive motors, etc. damage, the buckling and unstable structure of the slider, etc., to achieve the effect of simple and convenient method, wide applicability, and improved yield

Active Publication Date: 2020-09-29
RESEARCH INSTITUTE OF TSINGHUA UNIVERSITY IN SHENZHEN +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the counterbore processing technology is complex, and if the probe exerts too much pressure on the counterbore, it may still cause damage to the top surface of the slider
[0006] In short, the probe loading method in the existing preparation method of super-slippery slider may lead to buckling instability and structural damage of the slider, so that qualified super-slippery slider cannot be obtained.
This will reduce the yield of mass-produced super-slippery sliders, so there is a need for a simple method of preparing super-slippery sliders that can solve the problem of instability

Method used

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  • Preparation method of super-sliding block

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Embodiment Construction

[0032] The preparation method of the ultra-slippery slider that can avoid buckling instability and structural damage of the present invention will be described in detail below with reference to the accompanying drawings.

[0033] Step 1, covering the photoresist on the HOPG, and the photoresist may be covered by spin coating.

[0034] Step 2, patterning the photoresist, and retaining a plurality of photoresist islands. The step of patterning the photoresist determines the layout of the island structure formed in the subsequent steps, for example, the photoresist can be patterned by electron beam etching, and the formed photoresist island can be, for example, the average diameter is 1 μm to 30 μm, and the average interval between photoresist islands is 1 μm to 100 μm, so that the etched island structure also has a corresponding average diameter and average interval.

[0035] Step 3, etching the substrate to remove a portion of the substrate not protected by the photoresist, th...

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Abstract

The invention provides a preparation method of a super-sliding block. According to the preparation method, buckling instability and structural damage of the super-sliding block are avoided by improving a loading mode. The method comprises the following steps: etching a platform at the tip of a probe by using a focused ion beam etching method and the like, contacting the platform with a super-slideblock, changing a loading mode into a mode of contacting the super-slide block from the top by using the probe, and applying positive pressure and shearing force so as to push the slide block. The method provided by the invention is simple and convenient, and can avoid the problem that the slide block is damaged due to buckling instability under the pushing of the probe when the super-slide blockis large. Meanwhile, the method provided by the invention can improve the yield of batch production of the ultra-sliding blocks, and has wide applicability.

Description

technical field [0001] The invention relates to the field of solid structure super-slip, in particular to a method for preparing a super-sliding block that avoids buckling instability and structural damage of the super-sliding block by improving the loading method. [0002] technical background [0003] For a long time, friction and wear problems are not only closely related to manufacturing, but also directly related to energy, environment and health. According to statistics, about one-third of the world's energy is consumed in the friction process, and about 80% of machine parts failures are caused by wear and tear. Structural superslip is one of the ideal solutions to solve friction and wear problems. Structural superslip refers to the friction between two van der Waals solid surfaces (such as graphene, molybdenum disulfide and other two-dimensional material surfaces) that are atomically smooth and incommensurate contact. , The phenomenon of wear and tear is almost zero. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81B5/00B81C1/00
CPCB81B5/00B81C1/00198Y02P70/50
Inventor 郑泉水瞿苍宇
Owner RESEARCH INSTITUTE OF TSINGHUA UNIVERSITY IN SHENZHEN
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