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Low-sheet-resistance transparent conductive film

A technology of transparent conductive film and transparent conductive layer, applied in the direction of conductive layer on insulating carrier, etc., can solve the problems of weather resistance and poor transmittance of silver laminated conductive film, and reduce island discontinuity, weather resistance and other problems. The effect of improving and preventing deterioration

Pending Publication Date: 2020-11-10
JIANGSU RIJIU OPTOELECTRONICS LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage is that the weather resistance and transmittance of the silver laminated conductive film will be slightly worse than that of ITO

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] A low square resistance transparent conductive film is composed of a transparent substrate 10, a refractive index matching layer 11, a transition layer 12, a metal alloy layer 13, a first transparent conductive layer 14, a dielectric barrier layer 15 and The second transparent conductive layer 16, the materials of each layer are PET, niobium pentoxide, zinc magnesium oxide, silver alloy (wherein the remaining alloys in the silver alloy are palladium and copper, the proportion of silver is greater than 95%, and the square resistance is 16Ω) , indium tin oxide (indium tin ratio 90:10), silicon dioxide, indium tin oxide (indium tin ratio 90:10), the thickness of the above layers are 0.125μm, 35nm, 6nm, 6.5nm, 20nm, 10nm, 20nm . At this time, the transparent conductive film has better performance (including weather resistance, transparency, adhesion, etc.).

[0029] The production process can adopt the conventional roll-to-roll magnetron sputtering deposition method. The r...

Embodiment 2

[0040] A low square resistance transparent conductive film is composed of a transparent substrate 10, a refractive index matching layer 11, a transition layer 12, a metal alloy layer 13, a first transparent conductive layer 14, a dielectric barrier layer 15 and The second transparent conductive layer 16, the materials of each layer are respectively PC, zinc sulfide, zinc gallium oxide, copper alloy (wherein the remaining alloys in the copper alloy are palladium and gold, the proportion of copper is greater than 95%, and the square resistance is 18Ω), Zinc oxide, zinc magnesium oxide, and tin oxide, the thicknesses of the above-mentioned layers are 0.100 μm, 40 nm, 7 nm, 5.5 nm, 16 nm, 10 nm, and 22 nm, respectively.

[0041] Table 3, 4 are the test results of embodiment 2 products

[0042] table 3

[0043] Square resistance Ω VLT(%) Adhesion 18 82 5B

[0044] Weather resistance test conditions: high temperature and high humidity: 85°C, 85% RH, high te...

Embodiment 3

[0048]A low square resistance transparent conductive film is composed of a transparent substrate 10, a refractive index matching layer 11, a transition layer 12, a metal alloy layer 13, a first transparent conductive layer 14, a dielectric barrier layer 15 and The second transparent conductive layer 16, the materials of each layer are respectively PI, titanium dioxide, zinc aluminum oxide, silver alloy (wherein the remaining alloys in the silver alloy are platinum and rhodium, the proportion of silver is greater than 95%, and the square resistance is 13Ω), tin oxide , aluminum oxide, indium tin oxide (indium tin ratio 90:10), the thickness of the above layers are 0.150 μm, 30nm, 5nm, 7nm, 18nm, 10nm, 25nm respectively.

[0049] Table 5, 6 is the test result of embodiment 3 products

[0050] table 5

[0051] Square resistance Ω VLT(%) Adhesion 13 83.5 5B

[0052] Weather resistance test conditions: high temperature and high humidity: 85°C, 85% RH, high...

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Abstract

The invention discloses a low-sheet-resistance transparent conductive film which comprises a transparent base material, a refractive index matching layer, a transition layer, a metal alloy layer, a first transparent conductive layer, a dielectric barrier layer and a second transparent conductive layer which are stacked from bottom to top. A water-oxygen barrier layer at the side of the base material and formed by combining the refractive index matching layer and the transition layer is added between the transparent base material and the metal alloy layer, and the transition layer aims to provide a compact and continuous conductive layer substrate for the metal alloy layer on the upper layer and reduce the island-shaped discontinuity phenomenon of thin-layer metal. After the transition layer and the refractive index matching layer are combined together to form the water-oxygen barrier layer at the base material side, the metal alloy layer is effectively prevented from being degraded inthe using process, and the overall reliability and weather resistance are greatly improved; and the dielectric barrier layer and the transparent conductive layer at the inner side are additionally arranged at the air side of the metal alloy layer. so that water and oxygen erosion of water and oxygen to the metal alloy layer through the transparent conductive layer at the outermost side of the airside in the machining and transporting process is effectively isolated.

Description

technical field [0001] The invention relates to the field of conductive films, in particular to a transparent conductive film with low square resistance. Background technique [0002] In recent years, with the rapid development of semiconductor manufacturing technology and photovoltaic technology, technologies such as flat panel displays, touch screens, window films, polymer dispersed liquid crystals, and solar cells have developed and improved rapidly. These new technologies require the use of transparent conductive films As electrodes, light-receiving surfaces, or electromagnetic pulse shielding films. Taking a touch screen as an example, several commonly used types of touch screens, such as resistive touch screens, surface capacitive touch screens, and inductive capacitive touch screens, all require transparent conductive films as electrode materials. [0003] Transparent conductive films are generally defined as being transparent in the visible range and having low resi...

Claims

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Application Information

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IPC IPC(8): H01B5/14
CPCH01B5/14
Inventor 吕敬波于佩强胡业新陆明明
Owner JIANGSU RIJIU OPTOELECTRONICS LTD