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Low sheet resistance transparent conductive film

A technology of transparent conductive film and transparent conductive layer, which is applied in the direction of the conductive layer on the insulating carrier, can solve the problems of the weather resistance and poor transmittance of the silver laminated conductive film, and achieve the reduction of island-shaped discontinuities and ring-resistant Measurability improvement and deterioration prevention effect

Pending Publication Date: 2020-11-10
JIANGSU RIJIU OPTOELECTRONICS LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage is that the weather resistance and transmittance of the silver laminated conductive film will be slightly worse than that of ITO

Method used

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  • Low sheet resistance transparent conductive film
  • Low sheet resistance transparent conductive film
  • Low sheet resistance transparent conductive film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] The low square resistance transparent conductive film is composed of a transparent substrate 10, a refractive index matching layer 11, a transition layer 12, a metal alloy layer 13, a dielectric barrier layer 14 and a transparent conductive layer 15 stacked from bottom to top. The materials of each layer are respectively It is PET, niobium pentoxide, zinc magnesium oxide, silver alloy (the rest of the silver alloy is palladium and copper, the proportion of silver is greater than 95%, and the square resistance is 16Ω), nickel chromium oxide (nickel chromium is used in weight ratio 50:50 to 95:5 can be used, preferably 80:20), indium tin oxide (indium tin ratio 90:10), the thickness of each layer above is 0.125 μm, 35nm, 6nm, 6.5nm, 3nm, 40nm. At this time, the transparent conductive film has better performance (including weather resistance, transparency, adhesion, etc.).

[0029] The production process can adopt the conventional roll-to-roll magnetron sputtering depositi...

Embodiment 2

[0040] The low square resistance transparent conductive film is composed of a transparent substrate 10, a refractive index matching layer 11, a transition layer 12, a metal alloy layer 13, a dielectric barrier layer 14 and a transparent conductive layer 15 stacked from bottom to top. They are respectively PC, zinc sulfide, zinc gallium oxide, copper alloy (the remaining alloys in the copper alloy are palladium and gold, the proportion of copper is greater than 95%, and the square resistance is 18Ω), zinc oxide, and tin oxide. The thicknesses of the above layers are respectively 0.100μm, 40nm, 7nm, 5.5nm, 5nm, 42nm.

[0041] Table 3, 4 are the test results of embodiment 2 products

[0042] table 3

[0043] Square resistance Ω VLT(%) Adhesion 18 82 5B

[0044] Weather resistance test conditions: high temperature and high humidity: 85°C, 85% RH, high temperature storage: 80°C, low temperature storage: -40°C, thermal shock: -40°C (60min) to 80°C (60min), ...

Embodiment 3

[0048]The low square resistance transparent conductive film is composed of a transparent substrate 10, a refractive index matching layer 11, a transition layer 12, a metal alloy layer 13, a dielectric barrier layer 14 and a transparent conductive layer 15 stacked from bottom to top. They are PI, titanium dioxide, zinc gallium oxide, silver alloy (the remaining alloys in the silver alloy are platinum and rhodium, the proportion of silver is greater than 95%, and the square resistance is 14Ω), nickel chromium nitride, indium tin oxide (indium tin ratio 90:10), the thicknesses of the above layers are 0.150 μm, 30 nm, 5 nm, 7 nm, 2 nm, and 28 nm, respectively.

[0049] Table 5, 6 is the test result of embodiment 3 products

[0050] table 5

[0051] Square resistance Ω VLT(%) Adhesion 14 83 5B

[0052] Weather resistance test conditions: high temperature and high humidity: 85°C, 85% RH, high temperature storage: 80°C, low temperature storage: -40°C, therma...

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Abstract

The invention discloses a low-sheet-resistance transparent conducting film which comprises a transparent base material, a refractive index matching layer, a transition layer, a metal alloy layer, a dielectric barrier layer and a transparent conducting layer which are arranged in a stacked mode from bottom to top. A water-oxygen barrier layer at the side of the base material and formed by combiningthe refractive index matching layer and the transition layer is added between the transparent base material and the metal alloy layer, and the transition layer aims to provide a compact and continuous conductive layer substrate for the metal alloy layer at the upper layer and reduce an island-shaped discontinuity phenomenon of thin-layer metal. After the transition layer and the refractive indexmatching layer made of a high-refractive-index material are combined together to form the water-oxygen blocking layer at the side of the base material, the metal alloy layer is effectively prevented from being degraded in the using process, and the reliability and weather resistance of the whole conductive film are greatly improved. Meanwhile, the dielectric barrier layer with a compact molecularstructure is additionally arranged at the air side of the metal alloy layer, so that water and oxygen erosion is effectively isolated, and the environmental measurement resistance is greatly improved.

Description

technical field [0001] The invention relates to the field of conductive films, in particular to a transparent conductive film with low square resistance. Background technique [0002] In recent years, with the rapid development of semiconductor manufacturing technology and photovoltaic technology, technologies such as flat panel displays, touch screens, window films, polymer dispersed liquid crystals, and solar cells have developed and improved rapidly. These new technologies require the use of transparent conductive films As electrodes, light-receiving surfaces, or electromagnetic pulse shielding films. Taking a touch screen as an example, several commonly used types of touch screens, such as resistive touch screens, surface capacitive touch screens, and inductive capacitive touch screens, all require transparent conductive films as electrode materials. [0003] Transparent conductive films are generally defined as being transparent in the visible range and having low resi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01B5/14
CPCH01B5/14
Inventor 吕敬波陈超于佩强刘世琴
Owner JIANGSU RIJIU OPTOELECTRONICS LTD