Supercharge Your Innovation With Domain-Expert AI Agents!

Ultrahigh-precision surface shape measurement method based on dual-wavelength interference

A dual-wavelength interference and measurement method technology, which is applied in the field of ultra-high-precision surface shape measurement based on dual-wavelength interference, can solve problems such as prolonged measurement time, reduced environmental and tooling stability, and increased measurement error, and achieves suppression of randomness. Noise, reduced stability and environmental stability requirements, effects of high measurement accuracy

Inactive Publication Date: 2020-11-27
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, more averaging times lead to longer measurement time, which in turn reduces the stability of the environment and tooling and eventually leads to an increase in measurement error

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ultrahigh-precision surface shape measurement method based on dual-wavelength interference
  • Ultrahigh-precision surface shape measurement method based on dual-wavelength interference
  • Ultrahigh-precision surface shape measurement method based on dual-wavelength interference

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] The present invention will be described in detail below by taking the Fizeau common optical path interference structure as an example in conjunction with the accompanying drawings and specific implementation methods.

[0036] Such as figure 1 As shown, a high-precision interferometric method based on a dual-wavelength Fizeau common optical path interference structure in this implementation example includes the following steps:

[0037] The first laser 1 is used to generate a laser beam with a center wavelength of 632.8nm and a wavelength tunable;

[0038] The second laser 2 is used to generate a laser beam with a center wavelength of 635nm and a wavelength tunable;

[0039] The first dichroic prism 3 and the second dichroic prism 4 are used to simultaneously introduce two laser beams into the interference system;

[0040] The focusing lens 5 is used to focus the thin beams emitted by the first laser 1 and the second laser 2 and emit them into divergent spherical waves; ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
wavelengthaaaaaaaaaa
Login to View More

Abstract

The invention discloses an ultrahigh-precision surface shape measurement method based on dual-wavelength interference, and belongs to the field of optical detection. According to the method, two tunable lasers with different central wavelengths are introduced on the basis of a Fizeau interferometer. When interferometry is carried out on the same measured mirror, synchronous phase shift is carriedout on the two tunable lasers by calculating voltages respectively required by the two lasers with different wavelengths to move the same phase (such as pi / 2). And the obtained multiple frames of combined interference fringes are processed by using an equal step length / fixed step length phase shift algorithm to obtain a phase under a shorter synthetic wavelength. And the final surface shape data can be recovered through a phase unwrapping algorithm. Compared with a single-wavelength interferometer, the dual-wavelength interferometer has more sensitive detail resolution ability, and the signal-to-noise ratio of the measured surface shape data is higher.

Description

technical field [0001] The invention belongs to the field of advanced optical manufacturing and detection, and in particular relates to an ultra-high-precision surface shape measurement method based on dual-wavelength interference. Background technique [0002] Optical components with high surface precision are used in modern optical engineering such as large-aperture astronomical telescope systems, inertial confinement fusion (ICF) devices, synchrotron radiation systems, gravitational wave detection systems, and deep ultraviolet and extreme ultraviolet (EUV) projection exposure systems. It plays an extremely important role in large scientific engineering. Especially in the field of integrated circuit manufacturing, deep ultraviolet and extreme ultraviolet lithography machines are the core equipment for semiconductor lithography. Now, the line width of chips on the market has reached 5nm, and in the field of semiconductor lithography, Moore's Law is still valid, thanks to t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/24G01M11/02
CPCG01B11/2441G01M11/0271
Inventor 刘锋伟吴永前肖向海陈小君
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com