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Suspension plasma spraying high-purity Y2O3 erosion-resistant coating and preparation method and application thereof

A plasma spray gun and suspension technology, applied in coating, metal material coating process, fusion spraying, etc., can solve the problems of uneven microstructure of the coating, many structural defects, high porosity of the coating, etc., and achieve improvement Anti-plasma erosion performance, lower processing cost, and excellent overall performance

Pending Publication Date: 2020-12-11
JINAN UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The preparation method overcomes the problems of traditional APS method and current SPS method such as complicated powder making process, high coating porosity, uneven coating microstructure, many tissue defects, and fast plasma erosion degradation rate.

Method used

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  • Suspension plasma spraying high-purity Y2O3 erosion-resistant coating and preparation method and application thereof
  • Suspension plasma spraying high-purity Y2O3 erosion-resistant coating and preparation method and application thereof
  • Suspension plasma spraying high-purity Y2O3 erosion-resistant coating and preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033]Using aluminum alloy as the substrate, it is processed into a 50mm×50mm sample by wire cutting and grinding. The surface of the sample is sandblasted with 360 mesh corundum sand under compressed air, and then the sample is placed in acetone and anhydrous Ultrasonic cleaning was carried out in alcohol to fully remove the contamination impurities and corundum fine sand remaining on the surface of the sample and then dried; the suspension plasma was sprayed on the surface of aluminum alloy to prepare high-purity Y with a thickness of 100 μm 2 o 3 Coating: Y 2 o 3 The particle size of the powder is D50=1μm (the microscopic appearance of the powder is as follows figure 1 shown), the concentration of the suspension is 15wt.%, the surfactant is polyethyleneimine, and the addition amount is 2wt.%. The flow rate of the suspension injected into the plasma jet was 35g / min, the spraying distance was 50mm, the moving speed of the spray gun was 700mm / s, and the preheating temperatu...

Embodiment 2

[0036] Using aluminum alloy as the matrix, the sample of 100mm×100mm is finished by wire cutting and grinding, and the surface of the sample is sandblasted with 240 mesh corundum sand under compressed air, and then the sample is placed in acetone and anhydrous Ultrasonic cleaning was carried out in alcohol to fully remove the contamination impurities and corundum fine sand remaining on the surface of the sample and then dried; the suspension plasma was sprayed on the surface of aluminum alloy to prepare high-purity Y with a thickness of 200 μm 2 o 3 Coating: Y 2 o 3 The particle size of the powder is D50=60nm, the concentration of the suspension is 30wt.%, the surfactant is sodium polyacrylate, and the addition amount is 1wt.%. The flow rate of the suspension injected into the plasma jet was 65g / min, the spraying distance was 100mm, the moving speed of the spray gun was 700mm / s, and the preheating temperature of the aluminum alloy substrate was 100℃. Using Axial III TM (No...

Embodiment 3

[0039] Using aluminum alloy as the matrix, it is processed into a 50mm×50mm sample by wire cutting and grinding. The surface of the sample is sandblasted with 120 mesh corundum sand under compressed air, and then the sample is placed in acetone and anhydrous Ultrasonic cleaning was carried out in alcohol to fully remove the contamination impurities and corundum fine sand remaining on the surface of the sample and then dried; the suspension plasma was sprayed on the surface of aluminum alloy to prepare high-purity Y with a thickness of 300 μm 2 o 3 Coating: Y 2 o 3 The particle size of the powder is D50=300nm, the concentration of the suspension is 20wt.%, the surfactant is polyvinylpyrrolidone, and the addition amount is 3wt.%. The flow rate of the suspension injected into the plasma jet is 57g / min, the spraying distance is 70mm, the moving speed of the spray gun is 1000mm / s, and the preheating temperature of the aluminum alloy substrate is less than 100℃. 100HE (Progressiv...

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Abstract

The invention discloses a suspension plasma spraying (SPS) high-purity Y2O3 erosion-resistant coating and a preparation method and application thereof, and belongs to the field of suspension plasma spraying. Micro-nano superfine Y2O3 powder is sprayed on the surface of an aluminum alloy through a suspension plasma spraying process to prepare the Y2O3 coating. According to the preparation method, the problems that a traditional atmospheric plasma spraying (APS) method and a current SPS method are complex in powder preparation process, the porosity of the coating is high, the microstructure of the coating is not uniform, the number of structure defects is large, and the plasma erosion degradation rate is high are solved. The prepared SPS high-purity Y2O3 erosion-resistant coating is uniformand dense in cross section, free of vertical or transverse microscopic cracks and free of convex structures and loose and porous columnar-crystal-like structure defects, and the density is close to that of a sintered Y2O3 ceramic block; and the plasma erosion resistance of the coating can be greatly improved, the maintenance cost of a plasma etching machine is reduced, and the service life of an aluminum alloy cavity is prolonged.

Description

technical field [0001] The invention relates to the technical field of suspension plasma spraying, in particular to a suspension plasma spraying high-purity Y 2 o 3 Erosion-resistant coatings, their preparation methods and applications. Background technique [0002] Plasma etching technology is widely used in the preparation of micro-nano semiconductor devices and microelectronics manufacturing processes. Through glow discharge, a plasma containing charged particles such as plasma and electrons and highly chemically active neutral atoms, molecules and free radicals is generated. These active particles diffuse to silicon wafers and other etched device parts and react with them to form volatile products that are removed, thus completing the etching technology of pattern transfer. Plasma etching is an irreplaceable process to realize the high-fidelity transfer of micro-patterns from lithography templates to wafers in VLSI production. [0003] Reactive gas CF for plasma etch...

Claims

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Application Information

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IPC IPC(8): C23C4/11C23C4/134
CPCC23C4/11C23C4/134
Inventor 陈小龙赵泓旭孙铱尉李心怡李卫
Owner JINAN UNIVERSITY
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