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Infrared detector with Van der Waals asymmetric barrier structure and preparation method

An infrared detector, asymmetric technology, applied in the field of infrared detectors, can solve the problems that hinder the development of high-performance single-carrier photodetectors, interface defects, lattice mismatch, etc., to reduce dark current, improve performance, fast response effect

Pending Publication Date: 2021-01-19
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

However, the inevitable lattice mismatch and interfacial defects in the epitaxial growth of conventional materials seriously hinder the development of high-performance single-carrier photodetectors.

Method used

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  • Infrared detector with Van der Waals asymmetric barrier structure and preparation method
  • Infrared detector with Van der Waals asymmetric barrier structure and preparation method
  • Infrared detector with Van der Waals asymmetric barrier structure and preparation method

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Embodiment Construction

[0036] The specific embodiment of the present invention is described in detail below in conjunction with accompanying drawing:

[0037] The invention develops an infrared detector with van der Waals asymmetric potential barrier structure. Through the unique asymmetric barrier structure design, the dark current can be effectively suppressed, thereby improving the detection rate of the device, and finally realizing black body detection and infrared imaging at room temperature.

[0038] Specific steps are as follows:

[0039] 1. Substrate selection

[0040] Use heavily doped p-type silicon as the substrate, SiO 2 The thickness of the dielectric layer is about 280±10 nanometers.

[0041] 2. Two-dimensional material transfer

[0042] The graphene layer, molybdenum disulfide layer and black phosphorus layer were peeled off in turn by mechanical peeling method, and then the graphene layer, molybdenum disulfide layer and black phosphorus layer were sequentially transferred in a ni...

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Abstract

The invention discloses an infrared detector with a Van der Waals asymmetric barrier structure and a preparation method. The detector structure comprises a substrate, a dielectric layer, a graphene layer, a molybdenum disulfide layer, a black phosphorus layer, a metal source electrode and a metal drain electrode. The preparation method of the device comprises the following steps of: sequentially transferring mechanically stripped graphene, molybdenum disulfide and black phosphorus to a substrate with a dielectric layer, and respectively manufacturing a metal source electrode and a metal drainelectrode on the black phosphorus and the graphene by using processes such as electron beam exposure, thermal evaporation and the like to form the Van der Waals single-carrier infrared photoelectric detector with a vertical structure. A multi-sub-barrier asymmetric barrier energy band structure is designed by utilizing rich energy band structures and unique physical characteristics of a two-dimensional material, dark current can be effectively suppressed, and then medium-wave infrared room-temperature black body detection, polarization detection and infrared imaging are realized. The detectorhas the characteristics of room-temperature operation, multi-sub-blocking, medium-wave infrared response, high sensitivity, fast response, black body detection and the like.

Description

technical field [0001] The invention relates to an infrared detector with a van der Waals asymmetric barrier structure, in particular to a mid-wave infrared single-carrier photodetector and a preparation method. Background technique [0002] Single-carrier photodetectors are proposed to solve the problem of large dark current in infrared detectors, so that infrared detectors can work at high temperatures. The barrier layer of single-carrier photodetectors requires strict consideration of energy band matching and lattice matching. There is a larger potential barrier in the conduction band or valence band to block the majority carriers, and a near-zero potential barrier is designed in the other energy band so that the carriers in this energy band can move freely. Therefore, dark currents such as surface leakage currents and multisub dark currents are blocked by potential barriers, while photocurrents are not suppressed. However, the inevitable lattice mismatch and interfacia...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/101H01L31/102H01L31/0352H01L31/0216
CPCH01L31/02161H01L31/035272H01L31/101H01L31/102
Inventor 胡伟达陈允枫王芳王振王鹏汪洋李庆何家乐谢润章张莉丽陈效双陆卫
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI