Infrared detector with Van der Waals asymmetric barrier structure and preparation method
An infrared detector, asymmetric technology, applied in the field of infrared detectors, can solve the problems that hinder the development of high-performance single-carrier photodetectors, interface defects, lattice mismatch, etc., to reduce dark current, improve performance, fast response effect
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[0036] The specific embodiment of the present invention is described in detail below in conjunction with accompanying drawing:
[0037] The invention develops an infrared detector with van der Waals asymmetric potential barrier structure. Through the unique asymmetric barrier structure design, the dark current can be effectively suppressed, thereby improving the detection rate of the device, and finally realizing black body detection and infrared imaging at room temperature.
[0038] Specific steps are as follows:
[0039] 1. Substrate selection
[0040] Use heavily doped p-type silicon as the substrate, SiO 2 The thickness of the dielectric layer is about 280±10 nanometers.
[0041] 2. Two-dimensional material transfer
[0042] The graphene layer, molybdenum disulfide layer and black phosphorus layer were peeled off in turn by mechanical peeling method, and then the graphene layer, molybdenum disulfide layer and black phosphorus layer were sequentially transferred in a ni...
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