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Preparation method and application of polydimethylsiloxane nano-substrate with multi-hierarchical structure

The technology of polydimethylsiloxane and dimethylsiloxane is applied in the fields of biomedical materials and nanomaterials, and can solve the problems of harsh operating conditions and complicated steps, and achieve the effect of simple preparation method and mild conditions.

Active Publication Date: 2021-04-09
WUHAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the use of chemical etching, ion etching, vapor deposition, electrospinning and other techniques to prepare nanostructured substrates and patterning requires special equipment, complicated steps, and harsh operating conditions.

Method used

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  • Preparation method and application of polydimethylsiloxane nano-substrate with multi-hierarchical structure
  • Preparation method and application of polydimethylsiloxane nano-substrate with multi-hierarchical structure
  • Preparation method and application of polydimethylsiloxane nano-substrate with multi-hierarchical structure

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Embodiment 1

[0036] The preparation of embodiment 1 multiple hierarchical structure polydimethylsiloxane nano-substrate (HPNS)

[0037] 1. Preparation of zinc oxide nanowire substrate: First, treat the surface of the clean glass substrate with plasma for 1-3 minutes, then place it in a homogenizer, spin-coat 10mM zinc acetate ethanol solution evenly at 2500rpm, and finally heat it at 300°C The platform is heated for 3 hours to produce a layer of zinc oxide seeds. In the second step, the glass substrate covered with zinc oxide seeds was placed upside down in an aqueous solution of 50 mM zinc nitrate and hexamethylenetetramine, and grown at 90° C. for 3 hours to obtain a zinc oxide nanowire substrate.

[0038] 2. Preparation of zinc phosphate nanosubstrates with multiple hierarchical structures (HZnPNS): the zinc oxide nanowire substrates were incubated in physiological isotonic phosphate buffer containing 10 mM magnesium ions at 37°C until the surface of the glass substrate was covered with...

Embodiment 2

[0045] Example 2 Polydopamine-patterned polydimethylsiloxane nano-substrate with multiple hierarchical structure for cell patterning

[0046]1. Preparation of polydimethylsiloxane nano-substrates with multiple hierarchical structures that can be patterned with sacrificial photoresist: First, design any shape with antoCAD software and print it on a photomask. Secondly, spin-coat a layer of sacrificial photoresist AZ4620 on the surface of HPNS (forward rotation 600rpm / 15s; back rotation 1500rpm / 30s) to completely cover the surface morphology of HPNS. After pre-baking (75°C / 3min; 105°C / 5min), place a photomask on the surface of the photoresist, UV exposure (48s), develop, H 2 O cleaning and N2 drying to obtain photoresist-patterned HPNS.

[0047] 2. Preparation of polydopamine-patterned polydimethylsiloxane nano-substrates with multiple hierarchical structures: First, incubate the photoresist-patterned substrate and dopamine solution (2 mg / mL, 10 mM Tris buffer, pH 8.5) at room ...

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Abstract

The invention relates to the technical field of biomedical materials and nanomaterials, in particular to a preparation method and application of a polydimethylsiloxane nano-substrate with a multi-hierarchical structure. The preparation method comprises the following steps: preparing a zinc phosphate nano-substrate HZnPNS with the multi-hierarchical structure; with the HZnPNS as a template, pouring a liquid polydimethylsiloxane prepolymer and a cross-linking agent thereof on the surface of the HZnPNS, and successively conducting heating, curing and molding so as to copy the surface structure of the HZnPNS; and stripping the cured polydimethylsiloxane from the surface of the HZnPNS, and conducting washing and drying to obtain the polydimethylsiloxane nano-substrate HPNS with the multi-hierarchical structure. The preparation method is simple and mild in conditions; according to the prepared polydimethylsiloxane nano-substrate with the multi-hierarchical structure, a polydopamine array in any shape can be formed on the surface of the polydimethylsiloxane nano-substrate by virtue of a photoetching technology and sacrificial photoresist; and cell patterns in any shape can be quickly and efficiently formed.

Description

technical field [0001] The invention relates to the technical field of biomedical materials and nanomaterials, in particular to a preparation method and application of a polydimethylsiloxane nano-substrate with multiple hierarchical structures. Background technique [0002] Cell patterning technology can control the shape and size of cell adhesion, and is widely used in cell biology, tissue engineering, high-throughput drug screening and other fields. There are two main ways to promote cell patterning: one is to restrict the cells to the patterned area by means of external forces such as light assistance, electrical stimulation, magnetic attraction or physical barriers such as microchannels and micropores; Chemical modification of cell adhesion molecules or anti-cell adhesion molecules allows cells to selectively adhere and form cell patterns. However, external forces may damage cells, and physical obstacles are limited by the allowed size and shape of the device, and are n...

Claims

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Application Information

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IPC IPC(8): C08L83/04C12N5/00B29C39/02
CPCC08L83/04C12N5/0068B29C39/02C12N2533/30C12N2535/10C12N2537/10
Inventor 王行环郭珊肖宇王欣
Owner WUHAN UNIV
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