LED epitaxial growth method
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- XIANGNENG HUALEI OPTOELECTRONICS
- Publication Date
- 2021-04-20
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Abstract
Description
Technical field
[0001] The present invention belongs to the field of LED technology, and more particularly to an LED epitaxial growth method.Background technique
[0002] Light-Emitting Diode, LEDs are semiconductor electronic devices that convert electrical energy into light energy. When the LED is currently flowing, the electrons in the LEDs are monochromatic light from the holes in their multi-quantum wells. As an efficient, environmentally friendly, green new solid-state illumination source, LED source has the advantages of low voltage, low energy, small size, light weight, long life, high reliability and colorful color. At present, the size of the domestic production LED is gradually expanding, but the LED still has low luminous efficiency, affecting the energy saving effect of the LED.
[0003] At present, the LED epitaxial inGan / GaN multi-quantum well quality prepared by the growth method of the existing LED multi-quantum well is low, and the radiation efficiency of the multi-quantum...