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Preparation method of flexible transparent conductive electrode with low surface roughness

A transparent conductive electrode, roughness technology, applied in the equipment for manufacturing conductive/semiconducting layer, conductive layer on insulating carrier, cable/conductor manufacturing, etc. Problems such as poor adhesion to the substrate, low surface resistivity, light transmittance, etc., to achieve the effects of green and pollution-free raw materials, high transmittance, and reduced surface roughness

Inactive Publication Date: 2021-05-07
SOUTH CHINA NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there are three main problems restricting the industrialization of metal nanowires, one is the mass production of nanowires with larger aspect ratio; the other is the contact problem between nanowires with high resistance; the third is the adhesion between nanowires and substrate poor adhesion
The optical performance of the metal grid electrode is excellent (light transmittance is 90%, the surface resistance is as low as 2Ω / sq), but the electrode still has problems such as poor adhesion and too much roughness
With the rapid development of thin-film optoelectronic devices, the technical requirements for low surface roughness, low surface resistivity and high light transmittance are increasing, and the performance of existing metal grid electrodes can no longer meet the technical requirements in this field.

Method used

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  • Preparation method of flexible transparent conductive electrode with low surface roughness
  • Preparation method of flexible transparent conductive electrode with low surface roughness
  • Preparation method of flexible transparent conductive electrode with low surface roughness

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0061] Flexible transparent conductive electrodes with low surface roughness are fabricated by the following method:

[0062] S0: Clean the substrate: ultrasonically clean the substrate in isopropanol, absolute ethanol, and deionized water for 15 minutes, and then dry the substrate with an air gun; place it in a plasma cleaning machine for hydrophilic treatment, For hydrophilic treatment, the plasma cleaning machine cleans for 100s, and the power of the plasma cleaning machine is 220w;

[0063] S1: Coating the cracking material CA600 nail polish on the substrate to make a sacrificial layer, and the sacrificial layer gradually cracks under natural conditions to form a crack template;

[0064] S2: Place the substrate covered with the cracked template in a magnetron sputtering device to deposit metallic silver. After the deposition is completed, place it in absolute ethanol, ultrasonically clean it for 30s, and then wash it with deionized water to remove the cracked template. Ge...

Embodiment 2

[0071] Flexible transparent conductive electrodes with low surface roughness are fabricated by the following method:

[0072] S0: Clean the substrate: ultrasonically clean the substrate in isopropanol, absolute ethanol, and deionized water for 15 minutes, and then dry the substrate with an air gun; place it in a plasma cleaning machine for hydrophilic treatment, For hydrophilic treatment, the plasma cleaning machine cleans for 100s, and the power of the plasma cleaning machine is 220W;

[0073] S1: Coating the cracking material cellulose on the substrate to make a sacrificial layer, and gradually cracking the sacrificial layer under the heating conditions of 70°C and holding time for 10 minutes to form a cracking template;

[0074] S2: Place the substrate covered with the cracked template in a magnetron sputtering device to deposit metallic silver. After the deposition is completed, place it in absolute ethanol, ultrasonically clean it for 30s, and then wash it with deionized ...

Embodiment 3

[0081] Flexible transparent conductive electrodes with low surface roughness are fabricated by the following method:

[0082] S0: Clean the substrate: ultrasonically clean the substrate in isopropanol, absolute ethanol, and deionized water for 15 minutes, and then dry the substrate with an air gun; place it in a plasma cleaning machine for hydrophilic treatment, For hydrophilic treatment, the plasma cleaning machine cleans for 100s, and the power of the plasma cleaning machine is 220W;

[0083] S1: coating the cracking material egg white sol on the substrate to make a sacrificial layer, and gradually cracking the sacrificial layer under the heating conditions of 70°C and holding time for 10 minutes to form a crack template;

[0084] S2: Place the substrate covered with the cracked template in a magnetron sputtering device to deposit metallic silver. After the deposition is completed, place it in absolute ethanol, ultrasonically clean it for 30s, and then wash it with deionized...

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Abstract

The invention discloses a preparation method of a flexible transparent conductive electrode with low surface roughness. The preparation method comprises the steps of depositing a metal network electrode on a substrate by adopting a cracking template method, forming a metal coating on the deposited metal network electrode through electroplating, performing plasma treatment, and infiltrating by using a c-PI precursor solution; and after c-PI is subjected to heating and heat preservation to form a film, stripping the c-PI film from the substrate in a hot bath to complete lossless transfer, so as to obtain the flexible transparent conductive electrode with low surface roughness. The flexible transparent conductive electrode prepared through the method has the performance of high transmittance, the surface roughness is within 10 nm, and the requirements of thin film photoelectric devices such as perovskite solar cells are completely met.

Description

technical field [0001] The invention belongs to the technical field of transparent conductive electrodes, and in particular relates to a method for preparing a flexible transparent conductive electrode with low surface roughness. Background technique [0002] Transparent conductive electrode means that the light transmittance in the visible spectrum range (400-800 nanometers) is greater than 80%, and the resistivity is lower than 10 -3 The Ω·cm thin-film electrode is an important part of optoelectronic devices and equipment, and its applications include organic light-emitting diodes (OLEDs), smart windows, solar cells, electronic paper, etc. [0003] The earliest transparent conductive electrode preparation technology originated in 1907, using sputtering and high-temperature oxidation to prepare CdO thin films. With the change of the times, transparent conductive electrode technology shows an increasingly rapid development trend. According to data, the market value of tran...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01B5/14H01B13/00H01L51/44
CPCH01B5/14H01B13/0026H10K30/82Y02E10/549
Inventor 高进伟尹钰鑫
Owner SOUTH CHINA NORMAL UNIVERSITY
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