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High-entropy metal glass protective coating and preparation method thereof

A technology of metallic glass and protective coating, which is applied in the direction of metal material coating process, coating, measuring distance, etc., and can solve problems such as enhancement

Active Publication Date: 2021-05-18
ZHENGZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Research has found that the performance of materials can be improved by mixing different components. The mixed product can average the properties of various components, but sometimes there will be enhanced or new properties

Method used

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  • High-entropy metal glass protective coating and preparation method thereof
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  • High-entropy metal glass protective coating and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Choose a sticking area of ​​2 cm2 Al target material of single crystal silicon wafer, the bonding area is 2 cm 2 The Zr-Fe-Nb-Cr combination target of single crystal silicon wafer was used as the sputtering target, and the single crystal silicon wafer was used as the coating substrate, and ultrasonic treatment was performed with acetone, alcohol, and deionized water for 20 minutes in sequence, and then a high-purity Blow dry with a nitrogen air gun for later use; when the vacuum degree of the chamber reaches 5×10 -4 It begins to deposit when it is about mbar, and the area will be 2 cm 2 The Al target of the single crystal silicon wafer is connected to the target position connected to the direct current (DC) power supply, and the area of ​​the Al target is 2 cm 2 The Zr-Fe-Nb-Cr combination target of single crystal silicon wafer is connected to the target position connected with the radio frequency (RF) power supply.

[0033] When the air pressure in the chamber reache...

Embodiment 2

[0036] Choose a paste area of ​​3 cm 2 Al target material of single crystal silicon wafer, the attachment area is 3 cm 2 The Zr-Ta-Nb-Cr combination target of single crystal silicon wafer was used as the sputtering target, and the single crystal silicon wafer was used as the coating substrate, which was ultrasonically treated with acetone, alcohol, and deionized water for 20 minutes, and then treated with high-purity Blow dry with a nitrogen air gun for later use; when the vacuum degree of the chamber reaches 5×10 -4 Deposition begins at around mbar. Will stick with an area of ​​3 cm 2 The Al target material of the single crystal silicon wafer is connected to the target position connected with the direct current (DC) power supply. Will stick with an area of ​​3 cm 2 The Zr-Ta-Nb-Cr combination target of single crystal silicon wafer is connected to the target position connected with the radio frequency (RF) power supply.

[0037] The air pressure in the chamber reaches 5×1...

Embodiment 3

[0040] Choose a sticking area of ​​4 cm 2 Al target material of single crystal silicon wafer, the bonding area is 4 cm 2 The Zr-Fe-Nb-Cr combination target of single crystal silicon wafer was used as the sputtering target, and the single crystal silicon wafer was used as the coating substrate, and ultrasonic treatment was performed with acetone, alcohol, and deionized water for 20 minutes in sequence, and then a high-purity Blow dry with a nitrogen air gun for later use; when the vacuum degree of the chamber reaches 5×10 -4 Deposition begins at around mbar. Will stick with an area of ​​4 cm 2 The Al target material of the single crystal silicon wafer is connected to the target position connected with the direct current (DC) power supply. Will stick with an area of ​​4 cm 2 The Zr-Fe-Nb-Cr combination target of single crystal silicon wafer is connected to the target position connected with the radio frequency (RF) power supply.

[0041] The air pressure in the chamber reac...

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Abstract

The invention provides a high-entropy metal glass protective coating and a preparation method. A zirconium-based multi-element target material is cut to form a sputtering target material, aluminum is independently used as one sputtering target material, monocrystalline silicon is correspondingly attached to the sputtering target material and the aluminum target material, and fine regulation and control of components of the high-entropy metal glass protective coating are carried out by controlling the exposed areas of the different target materials. A high-vacuum single-chamber three-target magnetron sputtering system is used for preparing the coating, and the coating prepared through the technology is uniform in component, compact in structure and good in film-substrate binding force. In addition, the Zr-Fe-Nb-Cr-Al-Si-Mo-Ti-Ta (a mixture of five or six components) high-entropy metal glass protective coating prepared by the method has excellent oxidation resistance and good corrosion resistance, can be applied to cladding materials of reactor elements and other fuel assembly structural components, and prolongs the service life.

Description

technical field [0001] The invention relates to the field of protective coatings, in particular to a high-entropy metallic glass protective coating and a preparation method. Background technique [0002] At present, the cladding materials used in nuclear reactors are subjected to extremely harsh working conditions: the interior is subjected to fission products, the exterior is subjected to coolant corrosion, temperature, and pressure, and is subject to strong neutron radiation and coolant erosion, vibration, and internal stress. Due to the effects of thermal cycle (opening and shutdown) stress and fuel swelling, it needs to be replaced every 12 months, which is a high-consumable item. Current commercial zirconium alloy cladding materials are routinely serviced without any protection. For cladding materials, it is critical to moderate the oxidation kinetics of the cladding to reduce heat generation and hydrogen evolution. In 2011, a dehydration accident occurred in Fukushim...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/14G21C3/07
CPCC23C14/352C23C14/14G21C3/07Y02E30/30
Inventor 曹国钦姚航航胡俊华邵国胜田佳佳裴书博
Owner ZHENGZHOU UNIV