Diffusion welding method for cobalt target and copper-zinc alloy back plate
A diffusion welding and target technology, applied in the field of diffusion welding of cobalt target and copper-zinc alloy backplate, can solve the problems of high energy consumption, low efficiency, complicated preparation, etc., to expand the contact area, avoid welds, enhance The effect of welding bond strength
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Embodiment 1
[0060] This embodiment provides a method for diffusion welding of a cobalt target and a copper-zinc alloy backplane, such as figure 1 Shown, described diffusion welding method comprises the steps:
[0061] (1) Prepare a circular cobalt target 1 with a purity of 5N and a diameter of 430 mm. On the welding surface of the cobalt target 1, first use a white corundum grinding wheel to complete the polishing process, and then use vacuum magnetron sputtering to plate titanium Film 2, the thickness of the titanium film 2 is controlled to be 4.5 μm, the current of the vacuum magnetron sputtering is 20A, the bias voltage is 100V, the temperature is 120°C, and the time is 4.5h; C46400 copper with grooves is prepared Zinc alloy back plate 3, the bottom surface of the groove is ground with a white corundum grinding wheel to complete the polishing process, and the roundness and assembly dimensional tolerance of the groove are monitored to ensure a 430mm circular cobalt target 1 It can just...
Embodiment 2
[0066] This embodiment provides a method for diffusion welding of a cobalt target and a copper-zinc alloy backplane, such as figure 2 As shown, in addition to adding thread treatment to the welding surface of the cobalt target in step (1), other conditions are exactly the same as in Example 1, and the details are as follows:
[0067] (1) Prepare a round cobalt target material 1 with a purity of 5N and a diameter of 430mm. On the welding surface of the cobalt target material 1, first use a white corundum grinding wheel to complete the polishing process, and then use milling for thread processing. In the threads obtained by the above thread processing, the pitch between two adjacent thread protrusions is 0.45mm, and the thread depth of the threads is 0.15mm, and then vacuum magnetron sputtering titanium coating 2 is used to control the titanium film The thickness of 2 is 4.5 μm, the current of the vacuum magnetron sputtering is 20A, the bias voltage is 100V, the temperature is ...
Embodiment 3
[0070] This embodiment provides a method for diffusion welding of a cobalt target and a copper-zinc alloy backplane, except that the thickness of the titanium film in step (1) is replaced by 3 μm from 4.5 μm, and other conditions are exactly the same as in Example 1.
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