Artificial sensory neuron structure based on multi-side gate synaptic device and preparation method thereof
A synaptic device, multi-side gate technology, applied in neural learning methods, neural architecture, biological neural network models, etc., to achieve the effect of reducing device energy consumption
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[0037] The preparation method of the above-mentioned artificial sensory neuron structure based on the multi-side gate synapse device is as follows: Figure 5 , including the following steps:
[0038] (1) Preparation of piezoelectric nanogenerator:
[0039] ① Spin-coating a piezoelectric material 3 on a substrate 1 covered with a bottom electrode 2 as a functional layer of a piezoelectric nanogenerator;
[0040] ② Depositing an upper electrode 4 on the functional layer obtained in step ① to obtain a piezoelectric nanogenerator;
[0041] (2) Preparation of synaptic devices
[0042] ③ Spin-coating an electrolyte material on the substrate 5 covered with the bottom electrode 6 as the gate dielectric 8 of the synaptic device;
[0043] ④ Depositing an oxide semiconductor on the surface of the gate dielectric 8 as the channel layer 9;
[0044] ⑤ Depositing source-drain electrodes 11, 12 and planar side gates 10 on the surface of the channel layer 9 to obtain a synaptic device;
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Embodiment
[0048] To prepare the artificial sensory neuron structure based on the multi-side gate synaptic device of the present invention, the steps are as follows:
[0049] (1) Preparation of piezoelectric nanogenerators
[0050] Step 1, on the cleaned substrate covered with the bottom electrode, first coat a layer of polyvinylidene fluoride-trifluoroethylene solution with a mass fraction of 15%, pre-spin the glue at a speed of 600r / min for 20s, and then spin it at 900r / min Spin the glue at a speed of min for 40 seconds, and dry it at 80°C for 10 minutes; after performing this operation again, anneal the sample at 135°C for 3 hours; the whole experiment is carried out in a glove box filled with nitrogen;
[0051] Step 2, using thermal evaporation equipment, in a vacuum lower than 10 -4 Under the condition of Pa, aluminum metal is vapor-deposited as the upper electrode, with a thickness of about 30nm; the area range of the upper electrode is controlled by a mask.
[0052] (2) Preparat...
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