Method for eliminating thin film stress
A thin-film stress and thin-film technology, applied in the field of conformal optical components, can solve problems such as film cracking, affecting laser system performance, plastic deformation, etc., and achieve the effect of increasing types
Pending Publication Date: 2021-06-18
DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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Abstract
The invention relates to a method for eliminating a thin film stress. A double-ion-beam sputter coating technology is adopted, and after thin film plating is completed on an optical substrate, a series of annealing heat treatment are carried out, thermodynamic characteristics of a coating material are combined, and annealing heat treatment parameters such as process conditions of an annealing temperature, annealing time, annealing times, a heating/cooling rate and the like are controlled so as to implement stress control. According to the obtained experimental phenomenon, a set of complete thin film stress elimination process flow and theoretical system is established by combining theoretical guidance. By using the method, the thin film stress can be macroscopically regulated and controlled on the premise of ensuring good optical characteristics of a thin film. The method can provide theoretical guidance for an optical element shape preserving technology, and can provide samples for production of complex optical thin films, high-light optical elements and the like.
Application Domain
Vacuum evaporation coatingSputtering coating +1
Technology Topic
PhysicsThin membrane +11
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PUM
Property | Measurement | Unit |
Thickness | 1.0 ~ 5.0 | nm |
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