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CeO2 nano-particles for chemical mechanical polishing and preparation method of CeO2 nano-particles

A nanoparticle and chemical-mechanical technology, applied in nanotechnology for materials and surface science, preparation/processing of rare earth metal compounds, nanotechnology, etc., can solve the problem of rough particle shape, long processing time, complex preparation process, etc. problems, to achieve the effect of cheap raw materials, short production cycle and simple process

Pending Publication Date: 2021-06-29
SHAANXI UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Patent CN106587131A discloses a CeO with a size of about 50nm prepared by a sol-gel method 2 The method of nano powder, but the preparation process of this method is complicated, the processing time is long and after two calcinations, the shape of the particles is rough
Patent CN104176759A discloses a kind of CeCl 3 For cerium source, NaNO 3 Cube-shaped nano-CeO was prepared in molten salt system with NaF 2 Particles, this method can obtain powders with uniform size, but the particles with sharp edges and corners are not suitable for polishing process

Method used

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  • CeO2 nano-particles for chemical mechanical polishing and preparation method of CeO2 nano-particles
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  • CeO2 nano-particles for chemical mechanical polishing and preparation method of CeO2 nano-particles

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] A kind of CeO used for chemical mechanical polishing of the present invention 2 The preparation method of nanoparticles comprises the following specific steps:

[0027] Step 1: Weigh 1.3026g (3mmol) of cerium nitrate hexahydrate, 1.2749g (15mmol) of sodium nitrate, and 0.8766g (15mmol) of sodium chloride respectively, grind and mix to obtain a mixture.

[0028] Step 2: Pour 3mmol of the mixture in step 1 into 15ml of absolute ethanol and mix, stir magnetically for 30min at a speed of 600r / min, pour it into a crucible, and dry it in a drying oven at 60°C for 4h to obtain Mix the salt.

[0029] Step 3: Put the mixed salt in step 2 together with the crucible in a muffle furnace, raise the temperature from room temperature to 800°C at a rate of 5°C / min and keep it warm for 3 hours, cool down to 500°C at a rate of 5°C / min and then cool naturally .

[0030] Step 4: Take out the reaction product in step 3, place the reaction product in a beaker on a magnetic stirrer, stir a...

Embodiment 2

[0034] A kind of CeO used for chemical mechanical polishing of the present invention 2 The preparation method of nanoparticles comprises the following specific steps:

[0035] Step 1: Weigh 1.3026g (3mmol) of cerium nitrate hexahydrate, 1.5156g (15mmol) of potassium nitrate, and 1.1183g (15mmol) of potassium chloride, respectively, grind and mix to obtain a mixture.

[0036] Step 2: Pour 3mmol of the mixture in step 1 into 18ml of absolute ethanol and mix, stir magnetically for 30min at a speed of 500r / min, pour it into a crucible, and dry it in a drying oven at 60°C for 4h to obtain Mix the salt.

[0037] Step 3: Put the mixed salt in step 2 together with the crucible in a muffle furnace, raise the temperature from room temperature to 700°C at a rate of 5°C / min and keep it for 3 hours, cool down to 500°C at a rate of 5°C / min and then cool naturally.

[0038] Step 4: Take out the reaction product in step 3, place the reaction product in a beaker on a magnetic stirrer, stir a...

Embodiment 3

[0042] A kind of CeO used for chemical mechanical polishing of the present invention 2The preparation method of nanoparticles comprises the following specific steps:

[0043] Step 1: Weigh 1.3026g (3mmol) of cerium nitrate hexahydrate, 2.63g (45mmol) of sodium chloride, and 5.59g (75mmol) of potassium chloride, grind and mix to obtain a mixture.

[0044] Step 2: Pour 3mmol of the mixture in step 1 into 20ml of absolute ethanol and mix, stir magnetically for 30min at a speed of 500r / min, pour it into a crucible, and dry it in a drying oven at 70°C for 3h to obtain Mix the salt.

[0045] Step 3: Put the mixed salt in step 2 together with the crucible in a muffle furnace, raise the temperature from room temperature to 900°C at a rate of 5°C / min and keep it for 3 hours, cool down to 500°C at a rate of 5°C / min and then cool naturally.

[0046] Step 4: Take out the reaction product in step 3, place the reaction product in a beaker on a magnetic stirrer, stir at 50-80° C. for 30-60...

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Abstract

The invention discloses CeO2 nanoparticles for chemical mechanical polishing and a preparation method thereof, and the preparation method comprises the following steps: step 1, grinding and mixing Ce(NO3)3.6H2O and a molten salt system according to a molar ratio of 1:(10-40) to obtain a mixture; step 2, pouring the mixture in the step 1 into absolute ethyl alcohol, uniformly conducting stirring, pouring the system into a crucible, and conducting drying in a drying oven to obtain mixed salt; step 3, placing the mixed salt in the step 2 and the crucible in a muffle furnace, conducting heating to the baking temperature of a molten salt system from the room temperature at the heating rate of 5 DEG C / min, keeping the temperature for 2-4 hours, naturally conducting cooling, taking out a reaction product, and conducting washing to obtain a white precipitate; and step 4, pouring the white precipitate obtained in the step 3 into a centrifugal tube and conducting centrifugal washing in a centrifugal machine, and then conducting drying and grinding to obtain CeO2 nano powder. The preparation method has the characteristics of cheap selected raw materials, simple preparation process and short production period; and the CeO2 nano-powder prepared by the method has the advantages of uniform size distribution and good dispersity.

Description

technical field [0001] The invention relates to the field of nanomaterial preparation, in particular to a CeO used for chemical mechanical polishing 2 Nanoparticles and methods for their preparation. Background technique [0002] Chemical Mechanical Polishing (CMP) is an ultra-precision processing technology that uses chemical and mechanical interactions to achieve atomic-level flattening of the material surface. It has important applications in the fields of precision optics, aerospace, and integrated circuit manufacturing. Rare earth polishing powder is one of the most important applications of rare earth raw materials, especially CeO 2 Nanoabrasives are widely used due to their high reactivity, appropriate mechanical properties, and relative cheapness, especially for SiO 2 Because of its high polishing efficiency, it is widely used in the polishing of high-quality materials. The morphology, size and size distribution of abrasive particles are all important parameters th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01F17/235C01F17/10C09G1/02B82Y30/00B82Y40/00
CPCC01F17/235C01F17/10C09G1/02B82Y30/00B82Y40/00C01P2002/72C01P2004/03C01P2004/32C01P2004/64C01P2004/62
Inventor 许宁马家辉刘琦杨舒琦
Owner SHAANXI UNIV OF SCI & TECH
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