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MoS2/TiO2/Si pyramid array photoelectric catalyst and preparation method thereof

A pyramid and catalyst technology, applied in the field of nanomaterials, can solve the problems of unfavorable catalyst recycling, secondary pollution of water environment, complex and cumbersome treatment process, etc., and achieve the effect of promoting high-speed conduction, improving absorption efficiency, and reducing recombination probability.

Inactive Publication Date: 2021-07-30
HEFEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Physical methods such as adsorption and filtration have complex and cumbersome treatment processes, and the treatment results are not satisfactory. They may also cause secondary pollution to the environment due to improper treatment. Chemical methods such as photoelectric catalysis have attracted widespread attention due to their advantages such as simple treatment process and environmental friendliness.
[0003] However, since most photocatalysts are in the form of powder particles, it is difficult to recycle and reuse them in the catalytic process, which is not conducive to the recycling of catalysts, and may cause secondary pollution of the water environment.

Method used

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  • MoS2/TiO2/Si pyramid array photoelectric catalyst and preparation method thereof
  • MoS2/TiO2/Si pyramid array photoelectric catalyst and preparation method thereof
  • MoS2/TiO2/Si pyramid array photoelectric catalyst and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] (1) Weigh 3g of KOH, 20mL of IPA (isopropanol) and 80mL of deionized water to prepare an alkaline etching solution. Immerse the pretreated silicon wafer in the etching solution, the etching temperature is 80°C, and the holding time is 2h, then rinse the surface of the etched silicon wafer with deionized water, and put it in a vacuum drying oven for drying treatment , to obtain a pyramidal silicon array for use;

[0032] (2) TiO 2 Put the ceramic target and pyramid-shaped silicon substrate into the magnetron sputtering equipment, adjust the sputtering power to 100W, the working pressure to 0.5Pa, and the sputtering time to 10min. After the sputtering is completed, the silicon wafer is ready for use;

[0033] (3) Add 0.4g of Na 2 MoO 4 2H 2 O, 0.38g of C 6 h 5 CH 2 SSCH 2 C 6 h 5 Mix well with 60mL of deionized water, then transfer to a 100mL autoclave for hydrothermal reaction, wherein the hydrothermal temperature is 220°C, and the hydrothermal time is 18h, to ...

Embodiment 2

[0039] (1) Weigh 3g of KOH, 20mL of IPA (isopropanol) and 80mL of deionized water to prepare an alkaline etching solution. Immerse the pretreated silicon wafer in the etching solution, the etching temperature is 80°C, and the holding time is 2h, then rinse the surface of the etched silicon wafer with deionized water, and put it in a vacuum drying oven for drying treatment , to obtain a pyramidal silicon array for use;

[0040] (2) Add 0.4g of Na 2 MoO 4 2H 2 O, 0.38g of C 6 h 5 CH 2 SSCH 2 C 6 h 5 Mix well with 60mL of deionized water, then transfer to a 100mL autoclave for hydrothermal reaction, wherein the hydrothermal temperature is 220°C, and the hydrothermal time is 18h, to obtain MoS 2 suspension;

[0041] (3) MoS 2 The suspension was washed and centrifuged three times with deionized water and absolute ethanol, and dried in a vacuum oven for 24 hours before use;

[0042] (4) Take 100mg MoS 2 Powder and pour into 10mL N-methylpyrrolidone organic solvent to co...

Embodiment 3

[0046] (1) Weigh 3g of KOH, 20mL of IPA (isopropanol) and 80mL of deionized water to prepare an alkaline etching solution. Immerse the pretreated silicon wafer in the etching solution, the etching temperature is 80°C, and the holding time is 2h, then rinse the surface of the etched silicon wafer with deionized water, and put it in a vacuum drying oven for drying treatment , to obtain a pyramidal silicon array for use;

[0047] (2) Simulating sewage to investigate the performance of Si pyramid array photocatalysts

[0048] In the CHI660D electrochemical workstation, 100mL of ciprofloxacin with a concentration of 10mg / L was simulated as water source and 0.5MNa 2 SO 4 The electrolyte was added to a three-electrode electrolytic cell for photocatalytic experiments. Si pyramid array photocatalyst is used as the working electrode, Pt is used as the counter electrode, Ag / AgCl is used as the reference electrode, a xenon lamp light source with a power of 300W and a filter with a cut-...

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Abstract

The invention discloses a MoS2 / TiO2 / Si pyramid array photoelectric catalyst. The MoS2 / TiO2 / Si pyramid array photoelectric catalyst is composed of MoS2 nanoparticles, a TiO2 film and a silicon pyramid array. The invention has the following beneficial effects: the pyramid array structure enhances the scattering probability of incident light, and can improve the absorption efficiency of the catalyst substrate to visible light; a layer of TiO2 film is plated through magnetron sputtering, so that a compact protection layer can be formed on the surface of the silicon pyramid array, chemical corrosion of silicon in the photoelectrocatalysis process is effectively prevented, and the chemical stability of the silicon is improved; MoS2 nanoparticles are loaded on the surface of a silicon pyramid array through hydrothermal, spin-coating and calcining methods, and the MoS2 nanoparticles are used as a cocatalyst, so that a large number of reaction active sites can be provided, and the efficiency of photoelectrocatalytic degradation of organic pollutants can be effectively improved; and the MoS2 / TiO2 / Si pyramid array photoelectric catalyst is a blocky solid catalyst, and compared with a traditional powder catalyst, the MoS2 / TiO2 / Si pyramid array photoelectric catalyst is easier to recycle.

Description

technical field [0001] The invention relates to the technical field of nanomaterials, specifically a MoS 2 / TiO 2 / Si pyramid array photocatalyst and preparation method. Background technique [0002] Nowadays, in the fields of medical treatment and animal husbandry, a large amount of sewage discharge gradually affects people's daily life. While calling for the reduction of sewage discharge, human beings also take corresponding measures to treat sewage, such as through adsorption, filtration, photoelectric catalysis and other treatment methods . Physical methods such as adsorption and filtration have complex and cumbersome treatment processes, and the treatment results are not satisfactory. They may also cause secondary pollution to the environment due to improper treatment. Chemical methods such as photoelectric catalysis have attracted widespread attention due to their advantages such as simple treatment process and environmental friendliness. . [0003] However, since ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J27/051B01J35/00B01J37/02B01J37/10C02F1/30C02F1/461
CPCB01J27/051B01J37/10B01J37/0215C02F1/30C02F1/46109C02F2001/46142C02F2305/10B01J35/33B01J35/39
Inventor 吕珺陈铭吴玉程徐光青杨泽鹏鲍智勇
Owner HEFEI UNIV OF TECH
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