Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Microstructure glass substrate and preparation method thereof

A technology of glass substrate and microstructure, which is applied in the manufacture of final products, sustainable manufacturing/processing, electrical components, etc. It can solve the problems of affecting the efficiency of photon photoelectric emission materials, affecting the spectral sensitivity of photoelectric conversion, and the large difference in optical constants. , to achieve the effect of increasing spectral transmittance, improving spectral sensitivity, and increasing light transmittance

Active Publication Date: 2021-07-30
CHINA BUILDING MATERIALS ACAD
View PDF3 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is an interface between the photon exit surface of the glass substrate and the photoemission material, and the optical constants are quite different. Photons will be refracted and reflected on the interface, which will affect the efficiency of photons entering the photoemission material.
[0003] Traditional substrates are mostly quartz glass and borosilicate glass. There is a sudden change in the optical constant at the interface between the photon exit surface of the substrate and the photoemissive material, which will inevitably bring reflection loss; the reflection loss and stray light that will inevitably occur at the edge of the substrate, Affect the photoelectric conversion spectral sensitivity
In the field of solar cells, glass substrates are processed into textured structures or pyramid-shaped grooves. This type of method is formed during the glass melting process. The size is relatively rough and not universal. It is difficult to achieve the required interface loss reduction. Effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Microstructure glass substrate and preparation method thereof
  • Microstructure glass substrate and preparation method thereof
  • Microstructure glass substrate and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0076] An embodiment of the present invention also proposes a method for preparing a microstructured glass substrate, which includes the following steps:

[0077] (1) pretreating the glass base layer, the glass base layer comprising a photon incident surface and a photon exit surface;

[0078] The pretreatment includes: deionized water rolling brush, dish brush cleaning, ultrasonic cleaning, air drying, hot air drying.

[0079] (2) In the direction extending from the photon exit surface to the photon incident surface, laser etching is carried out on the glass base layer, and several grooves in the first direction and some grooves in the second direction are etched out. The grooves cross each other to form a grating groove structure distributed in a grid pattern;

[0080] In some embodiments, the etching result of the grating groove structure is as follows image 3 As shown, the laser first marks the groove 111 in the first direction, and marks the groove 112 in the second di...

Embodiment 1

[0104] A method for preparing a microstructured glass substrate, specifically comprising the steps of:

[0105] (1) Pretreatment of the glass base layer: the square quartz glass base layer is cleaned by deionized water rolling brush, disk brush, ultrasonic cleaning, air drying, and hot air drying;

[0106] (2) Preparation of grating groove structure: In the direction extending from the photon exit surface to the photon incident surface, an infrared femtosecond laser is used for laser etching to draw lines on the square quartz glass substrate layer, firstly, along the first direction. Draw the groove in the first direction, and then draw the groove in the second direction according to the orthogonal direction. As shown in Figure 3, the filled part is the groove, and the blank part is the unmarked position; The depth, width and spacing are the same, wherein the groove width W=400nm, the spacing Δ=350nm, and the depth H=250-270nm; the laser etching and scribing adopts an infrared...

Embodiment 2

[0113] A method for preparing a microstructured glass substrate, specifically comprising the steps of:

[0114] (1) Pretreatment: the square quartz glass base layer is cleaned by deionized water rolling brush, disk brush, ultrasonic cleaning, air drying, and hot air drying;

[0115] (2) Preparation of SiO 2 Gradient refractive index coating: Alternately coat sol A and sol B on the photon incident surface of the pretreated square quartz glass substrate layer by dipping and pulling method, specifically, immerse in sol A first, and the pulling speed is 1mm / s, after the coating is complete, stand at 50°C for 10 minutes, then immerse in sol B, the pulling speed is 0.5mm / s, after the coating is complete, dip at 50°C for 10 minutes, so alternately. Each coating of A and B is a coating cycle. After 50 coating cycles, the quartz glass substrate layer is placed in an oven for heat treatment. The heat treatment steps and process play a decisive role in the gradual structure and adhesio...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
widthaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to a microstructure glass substrate and a preparation method thereof. The microstructure glass substrate comprises a glass substrate layer and a photoelectric emission material layer, and the glass substrate layer is provided with grating groove structures distributed in a grid shape; the grating groove structure is formed by mutually crossing a plurality of grooves in a first direction and a plurality of grooves in a second direction, openings of the grooves face the photon emergent surface, and the grooves are filled with oxide film layers. The size of the grooves and the thickness of the photoelectric emission material layer meet the following relation: W*(delta+W)=1000*D, W is the width of the grooves, delta is the distance between two adjacent grooves, and D is the thickness of the photoelectric emission material layer. The emergent surface of the glass substrate is subjected to microstructure processing to form a grating with a special material structure, so that the photon propagation path is increased, and the spectral sensitivity is improved.

Description

technical field [0001] The invention relates to the field of photoelectric conversion, in particular to a microstructure glass substrate and a preparation method thereof. Background technique [0002] Photoelectric conversion is the basic link for photomultiplier tubes, photodiodes, and solar cells to realize their functions. Glass substrates have become an important material for receiving and transmitting photons because of their essential properties of spectral transmission. Divided into a photon incident surface and a photon exit surface, the photoelectric emission material is deposited on the photon exit surface of the substrate. Photoelectric conversion, the generated electrons are emitted from the other surface of the photoemissive material. In order to achieve more outgoing electrons, more photons need to pass through the substrate to reach the photoelectric emission material, and fully generate photoelectric conversion. However, there is an interface between the ph...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/0236H01L31/0216H01L31/18
CPCH01L31/02366H01L31/02168H01L31/18Y02P70/50
Inventor 贾金升余刚曹振博刘辉吕学良郑京明李自金李开宇孙勇洪升
Owner CHINA BUILDING MATERIALS ACAD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com