Deep ultraviolet electro-catalysis assisted magnetorheological elastomer leveling device and method

A magnetorheological elastomer, deep ultraviolet technology, applied in the direction of grinding device, grinding drive device, working carrier, etc., can solve the problems of difficult to control the processing quality stably, low yield rate, weakened device performance, etc.

Pending Publication Date: 2021-09-14
NANHUA UNIV
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Problems solved by technology

[0005] Although chemical mechanical polishing can effectively reduce the surface roughness, the distribution of abrasives is unstable and requires normal pressure, which can easily induce lattice defects in the subsurface layer of gallium oxide materials, weakening device performa

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  • Deep ultraviolet electro-catalysis assisted magnetorheological elastomer leveling device and method
  • Deep ultraviolet electro-catalysis assisted magnetorheological elastomer leveling device and method
  • Deep ultraviolet electro-catalysis assisted magnetorheological elastomer leveling device and method

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[0065] The present invention will be described in detail below with reference to the accompanying drawings and in conjunction with the embodiments. It should be noted that the embodiments of the present invention and the features of the embodiments may be combined with each other under the condition of no conflict. For the convenience of description, the words "up", "down", "left" and "right" appear in the following text, which only means that the directions of up, down, left and right are consistent with the drawings themselves, and do not limit the structure.

[0066] A device for deep ultraviolet catalytic-assisted magnetorheological polishing of gallium oxide crystals, see figure 1 , including deep ultraviolet light source 1, tool shaft 2, tool shaft motor 3, magnetorheological elastomer polishing tool head 4, brush 5, wire 6, vertical guide 7, horizontal guide 8, polishing disc 9, spindle 10, gear Box 11 , spindle motor 12 , clamp 14 , nozzle 15 . The deep ultraviolet l...

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Abstract

The invention discloses a deep ultraviolet electro-catalysis assisted magnetorheological elastomer leveling device and method. A polishing device comprises a polishing disc and a first driving mechanism; a magnetorheological elastomer polishing mechanism and a nozzle are arranged above the polishing disc; a plurality of light source grooves are formed in the upper surface of the polishing disc, deep ultraviolet light sources are arranged in the light source grooves, and a gallium oxide crystal clamping mechanism is arranged above the deep ultraviolet light sources; the nozzle is arranged at the lateral upper portion of the clamping mechanism; the magnetorheological elastomer polishing mechanism comprises a tool shaft, a polishing tool head and a second driving mechanism; and the tool shaft is connected with the polishing disc through a wire and an electric brush. According to the deep ultraviolet electro-catalysis assisted magnetorheological elastomer leveling device and method, a gallium oxide wafer is subjected to efficient, ultra-smooth and lossless polishing through the polishing device, so that a lossless surface with sub-nano-scale roughness can be obtained.

Description

technical field [0001] The invention relates to a gallium oxide crystal deep ultraviolet electrocatalysis assisted magnetorheological elastomer flattening device and method, belonging to the technical field of ultra-precision processing of semiconductor materials. Background technique [0002] With the development of application requirements in the fields of semiconductor lighting, high-power power electronic devices, lasers and detectors, gallium oxide (Ga 2 o 3 ) as the representative of the fourth-generation ultra-wide bandgap semiconductor materials have received extensive attention. [0003] Generally speaking, an ultra-smooth and non-destructive surface is a necessary condition for improving the performance of semiconductor devices, and qualified gallium oxide wafers must undergo processes such as slicing, thinning (grinding), and flat polishing, among which the final flat polishing is to improve surface flatness and reduce The surface roughness and damaged layer are...

Claims

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Application Information

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IPC IPC(8): B24B37/04B24B37/10B24B37/14B24B37/30B24B37/34B24B47/12B24B47/16
CPCB24B37/044B24B37/10B24B37/30B24B37/34B24B47/12B24B47/16B24B37/14
Inventor 王永强陈扬帆花乐乐黄超唐赛
Owner NANHUA UNIV
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