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Method for improving coating uniformity of release agent by using nano coating

A technology of nano-coating and mold release agent, which is applied in the direction of coating, metal material coating process, sputtering plating, etc. Reduced precision and other issues, to achieve the effect of simple implementation, optimized demolding quality, and good uniformity

Pending Publication Date: 2021-09-17
JIMEI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Potassium dichromate solution is a common release agent in the industry to assist electroforming demoulding, but it will appear uneven during the coating process on the surface of the mold with structure, which will cause mold electroforming during the demoulding process. Difficult demoulding or local damage to the microstructure of the mold surface after demoulding, resulting in a decrease in the precision of the mold surface and damage to the mandrel at the same time
The main reason is that the surface of the metal mandrel has poor hydrophilicity, which leads to the distribution of potassium dichromate solution on the surface of the mold in the form of droplets. In addition, the existence of the surface structure only forms a local anti-adhesion effect

Method used

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  • Method for improving coating uniformity of release agent by using nano coating
  • Method for improving coating uniformity of release agent by using nano coating
  • Method for improving coating uniformity of release agent by using nano coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Preparation of potassium dichromate release agent solution: according to figure 1 Medium lens structure surface area, weigh 5g of potassium dichromate, temperature 20°C, add 100mL of deionized water into the beaker, stir well, and let stand for 1h.

[0022] Pretreatment of the copper mold: activate the copper mold with acetic acid, degrease with acetone, rinse with deionized water, and air dry.

[0023] The production of Cr coating: put the cleaned copper mold into the sputtering chamber of the magnetron sputtering instrument (the model can be VTC-600-3HD), close the valve, open the chiller and the control panel, and start the mechanical pump. Vacuumize, adjust the power of the DC power supply to 150W, the time is 15s, adjust the heating temperature of the control panel substrate to 35°C, the rotational speed of the sample stage to 12rpm, the argon flow rate to 35sccm, and use the quartz crystal film thickness monitor attached to the magnetron sputtering instrument (Qu...

Embodiment 2

[0026] Preparation of potassium dichromate release agent solution: according to figure 1 Medium lens structure surface area, weigh 8g of potassium dichromate, temperature 25°C, add 100mL of deionized water into the beaker, stir well, and let stand for 1h.

[0027] Pretreatment of the copper mold: activate the copper mold with acetic acid, degrease with acetone, rinse with deionized water, and air dry.

[0028] Production of Cr coating: Put the cleaned copper mold into the sputtering chamber of the magnetron sputtering instrument (model VTC-600-3HD), close the valve, open the chiller and control panel, and start the mechanical pump for vacuuming , adjust the power of the DC power supply to 200W, the time to 18s, adjust the heating temperature of the control panel substrate to 40°C, the rotational speed of the sample stage to 16rpm, and the argon flow rate to 40sccm, and use the quartz crystal film thickness monitor (Quartz Crystal Microbalance, referred to as QCM, can use the ...

Embodiment 3

[0031] Preparation of potassium dichromate release agent solution: according to figure 1 Medium lens structure surface area, weigh 10g of potassium dichromate, temperature 30°C, add 100mL of deionized water into the beaker, stir well, and let stand for 1h.

[0032] Pretreatment of the copper mold: activate the copper mold with acetic acid, degrease with acetone, rinse with deionized water, and air dry.

[0033] Production of Cr coating: Put the cleaned copper mold into the sputtering chamber of the magnetron sputtering instrument (model VTC-600-3HD), close the valve, open the chiller and control panel, and start the mechanical pump for vacuuming , adjust the power of the DC power supply to 250W, the time to 20s, adjust the substrate heating temperature of the control panel to 45°C, the rotational speed of the sample stage to 20rpm, and the argon gas flow rate to 45sccm, and use the quartz crystal film thickness monitor (Quartz Crystal Microbalance, QCM for short, model EQ-TM1...

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Abstract

The invention discloses a method for improving the coating uniformity of a release agent by using a nano coating, and relates to the technical field of coatings and industrial manufacturing. The method comprises the following steps that (1), a potassium dichromate release agent solution is prepared, wherein deionized water is added into a beaker, potassium dichromate powder is added into the beaker, and stirring is conducted; and (2), a Cr coating is manufactured, wherein a cleaned core mold is fixed to a sputtering bin rotating table, a bin door is closed, a circulating cooling-water machine and a mechanical pump are started, vacuumizing is conducted on a sputtering bin, a molecular pump is started after the required vacuum degree is reached, a power supply is switched on for sputtering after argon is introduced, and the thickness of a deposited film is monitored by utilizing a film thickness gauge. The nano-thickness Cr film is deposited on the surface of the core mold, the surface is modified, and the surface energy of the core mold is improved, so that the potassium dichromate solution is favorably attached to the surface of a copper mold, the coating uniformity is realized, more favorable conditions are provided for electroforming demolding of the core mold, and the surface quality of a casting is improved; and the coating time of the release agent can be shortened, and the uniformity of the Cr coating manufactured through the sputtering method is good.

Description

technical field [0001] The invention relates to the technical field of coating and industrial manufacturing, in particular to a method for improving the coating uniformity of a release agent by utilizing a nano-coating. Background technique [0002] The complex shape of the surface structure of the metal mold is usually obtained by using the precision electroforming process. Mold surface accuracy depends on electroforming release quality. During the demoulding process of electroforming, the excessive bonding force between the core mold and the replica will cause damage to the functional structure of the mold surface. Therefore, it is necessary to coat a layer of release agent on the surface of the core mold for demoulding before electroforming. Potassium dichromate solution is a common release agent in the industry to assist electroforming demoulding, but it will appear uneven during the coating process on the surface of the mold with structure, which will cause mold electr...

Claims

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Application Information

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IPC IPC(8): C25D1/22C23C14/16C23C14/35
CPCC25D1/22C23C14/165C23C14/35
Inventor 杨光李月
Owner JIMEI UNIV
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