ReS2-based three-dimensional SERS substrate and preparation method and application thereof
A substrate and three-dimensional technology, applied in the field of ReS2-based three-dimensional SERS substrate and its preparation, can solve the problems of weak interaction between composite materials and substrates, difficulty in meeting detection needs, poor substrate uniformity, etc., to achieve improved sensitivity, low cost, The effect of prolonging life
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[0036] The preparation method of described three-dimensional SERS substrate, comprises the following steps:
[0037] Evaporate a layer of Au film on the substrate;
[0038] Mix ammonium perrhenate, hydroxylamine hydrochloride and L-cysteine in deionized water to obtain a precursor solution;
[0039] The Au / ReS coated substrate was obtained by heating the substrate evaporated with the Au film and the precursor solution. 2 Composite nanosheet substrate;
[0040] Coated with Au / ReS 2 A layer of Ag thin film is vapor-deposited on the substrate of the composite nanosheets to obtain a SERS substrate with a composite structure of Au / ReS2 / Ag.
[0041] Wherein, the evaporation can adopt vacuum evaporation coating method, magnetron sputtering coating method or ion coating method.
Embodiment 1
[0043] This embodiment provides a method for preparing a ReS2-based three-dimensional SERS substrate, which specifically includes the following steps:
[0044] (1) Cleaning of the substrate:
[0045] For a substrate made of single crystal silicon material, first put the substrate into acetone and ultrasonically clean it in an ultrasonic machine for fifteen minutes; then put the substrate into ethanol and ultrasonically clean it in an ultrasonic machine for fifteen minutes; finally put the substrate into The sheet was further put into deionized water and ultrasonically cleaned in an ultrasonic machine for fifteen minutes to obtain a clean substrate. The substrate is made of pyramidal silicon.
[0046] (2) Preparation of gold film:
[0047] Put the clean substrate obtained by cleaning in step (1) into a vacuum evaporation coating equipment. The evaporation source is a gold rake with a purity of 99.99%. After vacuuming to 8×10-6 Torr (Torr), the rate of the current is controlle...
Embodiment 2
[0057] This embodiment provides a method for preparing a ReS2-based three-dimensional SERS substrate, which specifically includes the following steps:
[0058] (1) Cleaning of the substrate:
[0059] For a substrate made of single crystal silicon material, first put the substrate into acetone and ultrasonically clean it in an ultrasonic machine for fifteen minutes; then put the substrate into ethanol and ultrasonically clean it in an ultrasonic machine for fifteen minutes; finally put the substrate into The sheet was further put into deionized water and ultrasonically cleaned in an ultrasonic machine for fifteen minutes to obtain a clean substrate. The substrate is made of pyramidal silicon.
[0060] (2) Preparation of gold film:
[0061] Put the clean substrate obtained by cleaning in step (1) into a vacuum evaporation coating equipment. The evaporation source is a gold rake with a purity of 99.99%. After vacuuming to 8×10-6 Torr (Torr), the rate of the current is controlle...
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